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公开(公告)号：US20210395074A1
公开(公告)日：2021-12-23
申请号：US17287389
申请日：2019-12-13
Applicant: Robert Bosch GmbH
Inventor： Hans Artmann , Christoph Hermes , Heribert Weber , Jochen Reinmuth , Peter Schmollngruber , Thomas Friedrich
Abstract: A micromechanical component, whose diaphragm is supported and has support structures on its inner diaphragm side. Each of the support structures includes a first and second edge element structure, and at least one intermediate element structure positioned between the first and second edge element structures. For each of the support structures, a plane of symmetry is definable, with respect to which at least the first edge element structure of the respective support structure and the second edge element structure of the respective support structure are specularly symmetric. In each of support structures, a first maximum dimension of its first edge element structure perpendicular to its plane of symmetry and a second maximum dimension of its second edge element structure perpendicular to its plane of symmetry are greater than the maximum dimension of its intermediate element structure perpendicular to its plane of symmetry.
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公开(公告)号：US20210219058A1
公开(公告)日：2021-07-15
申请号：US17147310
申请日：2021-01-12
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Andreas Scheurle , Christoph Hermes , Peter Schmollngruber , Thomas Friedrich
Abstract: A micromechanical component for a sensor device or microphone device. The component includes a diaphragm support structure with a diaphragm, a cavity formed in the diaphragm support structure and adjoined by a diaphragm inner side, and a separating trench structured through the surface of the diaphragm support structure and extends to the cavity and completely frames the diaphragm, and that is sealed off media-tight and/or air-tight using at least one separating trench closure material. An etching channel is formed in the diaphragm support structure, separately from the separating trench, and extends from its first etching channel end section to its second etching channel end section. The first etching channel end section opens into the cavity, and the second etching channel end section is sealed off media-tight and/or air-tight using at least one etching channel closure structure formed on an outer partial surface of the surface of the diaphragm support structure.
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公开(公告)号：US11933689B2
公开(公告)日：2024-03-19
申请号：US17420953
申请日：2020-03-26
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Christoph Hermes , Hans Artmann , Peter Schmollngruber , Thomas Friedrich , Volkmar Senz
CPC classification number: G01L9/12 , G01L19/0061 , G01L19/0618
Abstract: A sensor device having a first counter electrode extending under an intermediate carrier, and having a first distance between the intermediate carrier and the first counter electrode being modifiable by the pressure on the movable region, and the first counter electrode encompassing, under the intermediate carrier, at least one electrically separated region that is disposed below a spacing element and includes at least a lateral extent of the spacing element.
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公开(公告)号：US20230416079A1
公开(公告)日：2023-12-28
申请号：US18337942
申请日：2023-06-20
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Peter Schmollngruber
CPC classification number: B81B7/02 , B81C1/00166 , G01L1/2262 , B81B2201/0257 , B81B2203/0127 , B81B2203/0307 , B81B2203/0315 , B81B2203/04 , B81C2201/014
Abstract: A micromechanical component for a sensor and/or microphone device. The component has an adjustable first actuator electrode suspended on a regionally deformable first layer, a first stator electrode fastened so that a first measuring signal is able to be tapped with regard to a first voltage or capacitance applied between the first actuator electrode and the first stator electrode, and a second actuator electrode, so that a second measuring signal is able to be tapped with regard to a second voltage or capacitance applied between the second actuator electrode and the first stator electrode or between the second actuator electrode and the second stator electrode. The second actuator electrode is situated in an adjustable manner on a side of the first actuator electrode facing away from the first layer in that the second actuator electrode is suspended on the first actuator electrode and/or an at least regionally deformable second layer.
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公开(公告)号：US20230304881A1
公开(公告)日：2023-09-28
申请号：US18044099
申请日：2021-10-06
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Andreas Scheurle , Joachim Fritz , Peter Schmollngruber , Sophielouise Mach , Thomas Friedrich
CPC classification number: G01L9/0048 , B81B3/007 , B81B2201/0264 , B81B2203/0127 , B81B2203/0307
Abstract: A micromechanical component. The micromechanical component includes: a membrane; the membrane includes at least one reinforcement structure of a geometrically defined shape, which reinforces the membrane in a defined manner, in the region of at least one anchor structure and/or in the region of at least one connecting structure.
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Patent Agency Ranking
公开(公告)号：US20220396477A1
公开(公告)日：2022-12-15
申请号：US17776354
申请日：2021-01-12
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Andreas Scheurle , Christoph Hermes , Peter Schmollngruber , Thomas Friedrich
Abstract: A micromechanical component for a sensor device or microphone device. The micromechanical component includes a diaphragm with a diaphragm inner side to which an electrode structure is directly or indirectly connected; and a cavity that is formed at least in a volume that is exposed by at least one removed area of at least one sacrificial layer. At least one residual area made of at least one electrically insulating sacrificial layer material of the at least one sacrificial layer is also present at the micromechanical component, and including at least one insulation area made of at least one electrically insulating material that is not the same as the electrically insulating sacrificial layer material. The electrode structure is electrically insulated from the diaphragm, and/or the at least one residual area of the at least one sacrificial layer is delimited from the cavity, using the at least one insulation area.
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公开(公告)号：US20220090975A1
公开(公告)日：2022-03-24
申请号：US17420953
申请日：2020-03-26
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Christoph Hermes , Hans Artmann , Peter Schmollngruber , Thomas Friedrich , Volkmar Senz
Abstract: A sensor device. The sensor device includes: a substrate; an electrical insulation layer on the substrate; an edge structure disposed on the electrical insulation layer and that delimits an internal region above the substrate; a membrane anchored on the edge structure and at least partly spanning the internal region, the membrane encompassing in the internal region a region movable by a pressure; a first intermediate carrier that extends in the movable region below the membrane and is electrically and mechanically connected to the membrane by contact points, and encompasses at least one spacing element that extends from the intermediate carrier toward the substrate; and a first counter electrode on the electrical insulation layer, the first counter electrode extending under the intermediate carrier, and a first distance between the intermediate carrier and the first counter electrode being modifiable by the pressure on the movable region.
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公开(公告)号：US20210215559A1
公开(公告)日：2021-07-15
申请号：US16972588
申请日：2019-06-28
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Peter Schmollngruber
Abstract: A micromechanical pressure sensor device and a corresponding manufacturing method. The micromechanical pressure sensor device is equipped with a sensor substrate; a diaphragm system that is anchored in the sensor substrate and that includes a first diaphragm and a second diaphragm situated spaced apart therefrom, which are circumferentially connected to one another in an edge area and enclose a reference pressure in an interior space formed in between; and a plate-shaped electrode that is suspended in the interior space and that is situated spaced apart from the first diaphragm and from the second diaphragm and forms a first capacitor with the first diaphragm and forms a second capacitor with the second diaphragm. The first diaphragm and the second diaphragm are designed in such a way that they are deformable toward one another when acted on by an external pressure.
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公开(公告)号：US20240400377A1
公开(公告)日：2024-12-05
申请号：US18699690
申请日：2022-10-19
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Peter Schmollngruber , Sophielouise Mach
Abstract: A micromechanical component for a sensor or microphone device. The micromechanical component includes an actuator electrode, which is adjustably arranged on and/or in a cavity and is made of silicon, and a stator electrode, which is arranged in the cavity and is made of silicon and which is secured to an insulating layer. A vacuum or at least one gas is provided in the cavity, wherein the insulating layer delimits the cavity at least on the stator electrode side facing away from the actuator electrode, and the stator electrode is secured to the insulating layer via at least one support structure which protrudes through the insulating layer and is made of silicon such that at least one intermediate gap with a vacuum or the at least one gas of the cavity is provided between the stator electrode and the insulating layer.
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公开(公告)号：US20240359975A1
公开(公告)日：2024-10-31
申请号：US18635111
申请日：2024-04-15
Applicant: Robert Bosch GmbH
Inventor： Heribert Weber , Franziska Rohlfing , Peter Schmollngruber , Sophielouise Mach
IPC: B81C1/00
CPC classification number: B81C1/00793
Abstract: A method for producing a particle protection element. The method include: providing a substrate; applying a first silicon dioxide layer to a surface of the substrate and structuring the first SiO2 layer, a height of a later plurality of media passage structures of the particle protection element, which form a filter function with respect to penetrating particles, can be set based on a thickness of the first SiO2 layer; depositing a first polysilicon layer onto a surface of the first silicon dioxide layer and/or of the substrate, and structuring the first poly-Si layer for forming a later at least one first channel structure; and forming a later at least one second channel structure on the rear side of the substrate, wherein the later first channel structure and/or the later media passage structures and/or the later second channel structure are connectable with regard to a media flow.
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