Automated selection of x-ray reflectometry measurement locations
    11.
    发明申请
    Automated selection of x-ray reflectometry measurement locations 有权
    自动选择x射线反射测量位置

    公开(公告)号:US20090074141A1

    公开(公告)日:2009-03-19

    申请号:US12232259

    申请日:2008-09-12

    CPC分类号: G01N23/201 G01N2223/052

    摘要: A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.

    摘要翻译: 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置,用X射线照射每个位置处的表面,并测量X射线的角度分布, 响应于光束从表面发射,以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质指数,表示在各个位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置,并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    MATERIAL ANALYSIS USING MULTIPLE X-RAY REFLECTOMETRY MODELS
    12.
    发明申请
    MATERIAL ANALYSIS USING MULTIPLE X-RAY REFLECTOMETRY MODELS 有权
    使用多个X射线反射光谱模型的材料分析

    公开(公告)号:US20060188062A1

    公开(公告)日:2006-08-24

    申请号:US11065737

    申请日:2005-02-24

    IPC分类号: G01T1/36 G01N23/20

    CPC分类号: G01N23/20

    摘要: A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.

    摘要翻译: 用于检查样品的方法包括用X射线照射样品,测量响应于光束从样品发射的X射线的分布,从而产生X射线谱,并且应用多 对光谱进行分析,以确定样品的模拟模型的一个或多个物理性质。 多步分析包括频谱分析频谱,以便通过从由一个或多个特征频率确定的初始条件开始的迭代优化过程来确定一个或多个特征频率并将模拟模型拟合到频谱中。

    Material analysis using multiple X-ray reflectometry models
    16.
    发明授权
    Material analysis using multiple X-ray reflectometry models 有权
    使用多个X射线反射测量模型的材料分析

    公开(公告)号:US07103142B1

    公开(公告)日:2006-09-05

    申请号:US11065737

    申请日:2005-02-24

    IPC分类号: G01T1/36

    CPC分类号: G01N23/20

    摘要: A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.

    摘要翻译: 用于检查样品的方法包括用X射线照射样品,测量响应于光束从样品发射的X射线的分布,从而产生X射线谱,并且应用多 对光谱进行分析,以确定样品的模拟模型的一个或多个物理性质。 多步分析包括频谱分析频谱,以便通过从由一个或多个特征频率确定的初始条件开始的迭代优化过程来确定一个或多个特征频率并将模拟模型拟合到频谱中。

    X-ray reflectometry of thin film layers with enhanced accuracy
    17.
    发明申请
    X-ray reflectometry of thin film layers with enhanced accuracy 有权
    提高精度的薄膜层的X射线反射测量

    公开(公告)号:US20060153333A1

    公开(公告)日:2006-07-13

    申请号:US11297837

    申请日:2005-12-07

    IPC分类号: G01B15/02

    CPC分类号: G01B15/02 G01N23/20

    摘要: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.

    摘要翻译: 一种用于检查包括具有已知反射性的第一层和在第一层上形成的第二层的样品的方法。 该方法包括将辐射引导到样品的表面并感测从表面反射的辐射,以产生作为相对于表面的仰角的函数的反射信号。 在反射信号中识别由于来自第一层的辐射的反射的特征。 响应于所识别的特征和第一层的已知反射特性来校准反射信号。 分析校准的反射信号以确定第二层的特性。 还公开了其他增强的检查方法。

    X-ray reflectometry of thin film layers with enhanced accuracy

    公开(公告)号:US07062013B2

    公开(公告)日:2006-06-13

    申请号:US10689314

    申请日:2003-10-20

    IPC分类号: G01T1/36

    CPC分类号: G01B15/02 G01N23/20

    摘要: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.