Processes for enhancing flame retardance and chemical resistance of polymers
    13.
    发明授权
    Processes for enhancing flame retardance and chemical resistance of polymers 有权
    提高聚合物的阻燃性和耐化学性的方法

    公开(公告)号:US09587078B2

    公开(公告)日:2017-03-07

    申请号:US14212385

    申请日:2014-03-14

    CPC classification number: C08J7/123 C08G64/14 C08L69/00 C08L101/00

    Abstract: Processes for increasing the chemical resistance of a surface of a formed product are disclosed. The formed product is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a dihydroxybenzophenone. The surface of the formed product is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed.

    Abstract translation: 公开了用于提高成形产品的表面的耐化学性的方法。 形成的产品由包含含有衍生自二羟基二苯甲酮的光活性基团的光活性添加剂的聚合物组合物制备。 然后将形成的产品的表面暴露于紫外线以引起光活性添加剂的交联并产生交联表面。 交联增强了表面的耐化学性。 还讨论了用于控制交联深度的各种手段。

    PHOTOACTIVE ADDITIVES CONTAINING SILOXANE
    15.
    发明申请
    PHOTOACTIVE ADDITIVES CONTAINING SILOXANE 有权
    含有硅氧烷的光学添加剂

    公开(公告)号:US20140275314A1

    公开(公告)日:2014-09-18

    申请号:US14214018

    申请日:2014-03-14

    Abstract: Photoactive additives are disclosed. Such additives are polymers or oligomers that contain UV-active groups (such as ketone groups) and contain polysiloxane blocks as well. When added to a base polymeric resin and used in molding, this structure promotes migration of the additive to the surface. Crosslinking occurs upon exposure to ultraviolet light.

    Abstract translation: 公开了光敏添加剂。 这些添加剂是含有UV-活性基团(如酮基)并含有聚硅氧烷嵌段的聚合物或低聚物。 当添加到基础聚合物树脂中并用于模制时,该结构促进添加剂向表面的迁移。 暴露于紫外线时会发生交联。

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