-
公开(公告)号：US09751980B2
公开(公告)日：2017-09-05
申请号：US14209735
申请日：2014-03-13
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jean-Francois Morizur , Paul Dean Sybert , James Franklin Hoover , Peter Johnson , Thomas L. Evans , Amanda Marie Flores
Abstract: Photoactive additives, such as cross-linkable polycarbonate resins, are disclosed. The additive is formed from the reaction of a monohydroxybenzophenone, a dihydroxybenzophenone, a diol chain extender, and one or more linker moieties having functional groups that react with the phenolic groups on the other ingredients. If desired, a secondary linker moiety and/or an end-capping agent can be used. When added to a base polymeric resin, the photoactive additive permits crosslinking when exposed to ultraviolet light.
-
公开(公告)号：US20140272691A1
公开(公告)日：2014-09-18
申请号：US14211862
申请日：2014-03-14
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jordi Calveras , Jean-Francois Morizur , Paul Dean Sybert
IPC: G03F7/027
CPC classification number: G03F7/027 , C08G64/0216 , C08G64/14 , C08G64/1616 , C08L69/00 , C08L101/00
Abstract: Photoactive additives are disclosed. The additive includes a benzophenone having at least one substituent that comprises a divalent linker and a linking group, wherein the linking group is a carboxyl group, ester group, or acid halide group. The additive can be a polymer, an oligomer, or a compound. When added to a base polymeric resin, the photoactive additive permits crosslinking upon exposure to ultraviolet light.
Abstract translation: 公开了光敏添加剂。 添加剂包括具有至少一个取代基的二苯甲酮，该取代基包含二价接头和连接基团，其中连接基团是羧基，酯基或酰基卤基团。 添加剂可以是聚合物，低聚物或化合物。 当添加到基础聚合物树脂中时，光活性添加剂允许在暴露于紫外光下进行交联。
-
公开(公告)号：US20140272347A1
公开(公告)日：2014-09-18
申请号：US14211552
申请日：2014-03-14
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Kwan Hongladarom , Jean-Francois Morizur , Paul Dean Sybert
CPC classification number: C08G64/42 , B29C48/022 , B32B27/365 , C08G64/14 , C08G64/24 , C08L69/00 , Y10T428/2495 , Y10T428/269 , Y10T428/31507 , C08L101/00
Abstract: Thin walled products having good scratch resistance are disclosed, as are processes for making such products (e.g. films, sheets, and thin walled articles). The product includes a thin layer formed from (A) a cross-linkable polycarbonate resin having endcaps derived from a monohydroxybenzophenone; and (B) if desired, a base polymeric resin. When exposed to ultraviolet light, crosslinking will occur in the layer with the cross-linkable polycarbonate resin, enhancing the scratch resistance properties of the thin layer and the overall product.
Abstract translation: 公开了具有良好耐划伤性的薄壁产品，以及制造这种产品（例如薄膜，薄片和薄壁制品）的方法。 该产品包括由（A）具有源自单羟基二苯甲酮的端帽的可交联聚碳酸酯树脂形成的薄层; 和（B）如果需要，可以使用基础聚合物树脂。 当暴露于紫外线下时，在交联聚碳酸酯树脂的层中将发生交联，提高薄层和整个产品的耐划伤性。
-
公开(公告)号：US20140179844A1
公开(公告)日：2014-06-26
申请号：US14137002
申请日：2013-12-20
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jean-Francois Morizur , Paul Dean Sybert
CPC classification number: C08G64/14 , B05D3/067 , B29C35/08 , B29C35/0805 , B29C45/0001 , B29C2035/0827 , B29K2069/00 , B29K2105/0026 , B29K2105/24 , B29K2269/00 , C08G64/045 , C08G64/24 , C08G67/00 , C08J3/28 , C08J7/123 , C08J2369/00 , C08J2469/00 , C08K5/3475 , C08K5/42 , C08K5/52 , C08K5/5393 , C08K5/549 , C08L69/00 , C08L2201/02 , C08L2205/02 , C08L2205/025 , C08L2312/06
Abstract: Disclosed herein are compositions including a cross-linked polycarbonate. The cross-linked polycarbonate may be derived from a polycarbonate having about 0.5 mol % to about 5 mol % endcap groups derived from a monohydroxybenzophenone. A plaque including the composition can achieve a UL94 5VA rating. Also disclosed herein are articles including the compositions, methods of using the compositions, and processes for preparing the compositions.
-
公开(公告)号：US20140179821A1
公开(公告)日：2014-06-26
申请号：US14137292
申请日：2013-12-20
Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
Inventor： Jean-Francois Morizur , Paul Dean Sybert
IPC: C08L69/00
CPC classification number: C08G64/1666 , C08G64/14 , C08G79/04 , C08L69/00 , C08L2205/03 , C08L83/10 , C08L23/0884 , C08L67/02 , C08L25/06 , C08L33/12 , C08L51/04 , C08L55/02
Abstract: Polymeric blends having improved flame retardance properties and good ductility at low temperatures are disclosed. The blend is formed from (A) a photoactive additive containing a photoactive group derived from a monofunctional benzophenone; and (B) a polymer resin which is different from the photoactive additive. The additive can be a compound, oligomer, or polymer. When exposed to ultraviolet light, crosslinking will occur between the photoactive additive and the polymer resin, enhancing the chemical resistance and flame retardance while maintaining ductility.
Abstract translation: 公开了具有改进的阻燃性能和低温下良好延展性的聚合物共混物。 共混物由（A）含有衍生自单官能二苯甲酮的光活性基团的光活性添加剂形成; 和（B）与光活性添加剂不同的聚合物树脂。 添加剂可以是化合物，低聚物或聚合物。 当暴露于紫外线下时，光活性添加剂和聚合物树脂之间会发生交联，提高耐化学性和阻燃性，同时保持延展性。
-
Patent Agency Ranking
6.发明授权公开(公告)号：US09587078B2
公开(公告)日：2017-03-07
申请号：US14212385
申请日：2014-03-14
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jean-Francois Morizur , Paul Dean Sybert , Andrew Frazee , Amanda Marie Flores , Peter Johnson , Thomas L. Evans
CPC classification number: C08J7/123 , C08G64/14 , C08L69/00 , C08L101/00
Abstract: Processes for increasing the chemical resistance of a surface of a formed product are disclosed. The formed product is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a dihydroxybenzophenone. The surface of the formed product is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed.
Abstract translation: 公开了用于提高成形产品的表面的耐化学性的方法。 形成的产品由包含含有衍生自二羟基二苯甲酮的光活性基团的光活性添加剂的聚合物组合物制备。 然后将形成的产品的表面暴露于紫外线以引起光活性添加剂的交联并产生交联表面。 交联增强了表面的耐化学性。 还讨论了用于控制交联深度的各种手段。
-
公开(公告)号：US09045590B2
公开(公告)日：2015-06-02
申请号：US14137208
申请日：2013-12-20
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： James Franklin Hoover , Derek Lake , Jean-Francois Morizur , Paul Dean Sybert
Abstract: Different interfacial processes for producing photoactive additives are disclosed. Generally, the photoactive additives are formed from a photoactive moiety, a first linker moiety, and a diol chain extender. The resulting additives can be crosslinked with other polymers upon exposure to UV radiation.
Abstract translation: 公开了用于制备光活性添加剂的不同界面方法。 通常，光活性添加剂由光活性部分，第一连接体部分和二醇扩链剂形成。 所得添加剂可以在暴露于紫外线辐射下与其它聚合物交联。
-
公开(公告)号：US20140275314A1
公开(公告)日：2014-09-18
申请号：US14214018
申请日：2014-03-14
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jean-Francois Morizur , Paul Dean Sybert
IPC: C08G77/00
Abstract: Photoactive additives are disclosed. Such additives are polymers or oligomers that contain UV-active groups (such as ketone groups) and contain polysiloxane blocks as well. When added to a base polymeric resin and used in molding, this structure promotes migration of the additive to the surface. Crosslinking occurs upon exposure to ultraviolet light.
Abstract translation: 公开了光敏添加剂。 这些添加剂是含有UV-活性基团（如酮基）并含有聚硅氧烷嵌段的聚合物或低聚物。 当添加到基础聚合物树脂中并用于模制时，该结构促进添加剂向表面的迁移。 暴露于紫外线时会发生交联。
-
9.发明申请公开(公告)号：US20140249290A1
公开(公告)日：2014-09-04
申请号：US14352465
申请日：2012-10-18
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jean-Francois Morizur , Himanshu Asthana
CPC classification number: B29C45/76 , B29C45/00 , B29C45/0001 , B29C45/766 , B29C2945/76006 , B29C2945/7604 , B29C2945/7611 , B29C2945/7619 , B29C2945/76224 , B29C2945/76257 , B29C2945/7629 , B29K2069/00 , B29K2995/0016 , B29K2995/0026 , C08G64/00
Abstract: Disclosed are methods for manufacturing molded polymeric articles exhibiting enhanced flame retardant properties. Also disclosed are molded thermoplastic articles manufactured by the disclosed processes and methods.
Abstract translation: 公开的是制造具有增强的阻燃性能的模制聚合物制品的方法。 还公开了通过所公开的方法和方法制造的模制热塑性制品。
-
公开(公告)号：US09110370B2
公开(公告)日：2015-08-18
申请号：US14211862
申请日：2014-03-14
Applicant: SABIC Innovative Plastics IP B.V.
Inventor： Jordi Calveras , Jean-Francois Morizur , Paul Dean Sybert
IPC: C08F2/50 , B29C71/04 , A61L2/08 , A61L24/00 , C08G61/04 , G03F7/027 , C08G64/02 , C08G64/14 , C08G64/16 , C08L69/00
CPC classification number: G03F7/027 , C08G64/0216 , C08G64/14 , C08G64/1616 , C08L69/00 , C08L101/00
Abstract: Photoactive additives are disclosed. The additive includes a benzophenone having at least one substituent that comprises a divalent linker and a linking group, wherein the linking group is a carboxyl group, ester group, or acid halide group. The additive can be a polymer, an oligomer, or a compound. When added to a base polymeric resin, the photoactive additive permits crosslinking upon exposure to ultraviolet light.
Abstract translation: 公开了光敏添加剂。 添加剂包括具有至少一个取代基的二苯甲酮，该取代基包含二价接头和连接基团，其中连接基团是羧基，酯基或酰基卤基团。 添加剂可以是聚合物，低聚物或化合物。 当添加到基础聚合物树脂中时，光活性添加剂允许在暴露于紫外光下进行交联。
-
-
-
-
-
-
-
-
-
Search Results
21
records
(took 0.021 seconds)
