Abstract:
Processes for increasing the chemical resistance of a surface of a formed article are disclosed. The formed article is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a monofunctional benzophenone. The surface of the formed article is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed.
Abstract:
A composition comprising: a first polycarbonate comprising a poly(siloxane-carbonate); a second polycarbonate different from the first polycarbonate; and optionally, a third polycarbonate different from the first and second polycarbonate; wherein the first polycarbonate is present in an amount effective to provide the siloxane units of in the first polycarbonate in an amount of at least 0.3 wt %, and the second polycarbonate is present in an amount effective to provide the bromine of the second polycarbonate in an amount of at least 7.8 wt %; and further wherein an article molded from the composition has an OSU integrated 2 minute heat release test value of less than 65 kW-min/m2 and a peak heat release rate of less than 65 kW/m2, and an E662 smoke test Dmax value of less than 200.
Abstract:
Processes for increasing the chemical resistance of a surface of a formed product are disclosed. The formed product is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a dihydroxybenzophenone. The surface of the formed product is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed.
Abstract:
Different interfacial processes for producing photoactive additives are disclosed. Generally, the photoactive additives are formed from a photoactive moiety, a first linker moiety, and a diol chain extender. The resulting additives can be crosslinked with other polymers upon exposure to UV radiation.
Abstract:
Photoactive additives are disclosed. Such additives are polymers or oligomers that contain UV-active groups (such as ketone groups) and contain polysiloxane blocks as well. When added to a base polymeric resin and used in molding, this structure promotes migration of the additive to the surface. Crosslinking occurs upon exposure to ultraviolet light.
Abstract:
Disclosed herein are compositions including a cross-linked polycarbonate. The cross-linked polycarbonate may be derived from a polycarbonate having about 0.5 mol % to about 5 mol % endcap groups derived from a monohydroxybenzophenone. A plaque including the composition can achieve a UL94 5VA rating. Also disclosed herein are articles including the compositions, methods of using the compositions, and processes for preparing the compositions.
Abstract:
Photoactive additives are disclosed. The additive is formed from the reaction of a dihydroxybenzophenone, one or more linker moieties having functional groups that react with the phenolic groups, a diol chain extender, and an end-capping agent. If desired, a secondary linker moiety can be used. When added to a base polymeric resin, the photoactive additive permits crosslinking when exposed to ultraviolet light.
Abstract:
Photoactive additives are disclosed. Such additives are polymers or oligomers that contain UV-active groups (such as ketone groups) and contain polysiloxane blocks as well. When added to a base polymeric resin and used in molding, this structure promotes migration of the additive to the surface. Crosslinking occurs upon exposure to ultraviolet light.
Abstract:
Processes for increasing the chemical resistance of a surface of a formed article are disclosed. The formed article is produced from a polymeric composition comprising a photoactive additive containing photoactive groups derived from a monofunctional benzophenone. The surface of the formed article is then exposed to ultraviolet light to cause crosslinking of the photoactive additive and produce a crosslinked surface. The crosslinking enhances the chemical resistance of the surface. Various means for controlling the depth of the crosslinking are also discussed.
Abstract:
Different interfacial processes for producing photoactive additives are disclosed. Generally, the photoactive additives are cross-linkable polycarbonate resins formed from a dihydroxybenzophenone, a first linker moiety, a diol chain extender, and an end-capping agent. The resulting additives can be crosslinked with other polymers upon exposure to UV radiation.