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公开(公告)号:US12199002B2
公开(公告)日:2025-01-14
申请号:US17736500
申请日:2022-05-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Taehwan Kim , Kyungsuk Oh , Jaechoon Kim
IPC: H01L21/00 , H01L23/00 , H01L23/367 , H01L23/48 , H01L23/522 , H01L25/04
Abstract: A semiconductor package includes a first semiconductor chip including first through electrodes and having a first hot zone in which the first through electrodes are disposed; a heat redistribution chip disposed on the first semiconductor chip, having a cool zone overlapping the first hot zone in a stacking direction with respect to the first semiconductor chip, and including first heat redistribution through electrodes disposed outside of an outer boundary of the cool zone and electrically connected to the first through electrodes, respectively; a second semiconductor chip disposed on the heat redistribution chip, having a second hot zone overlapping the cool zone in the stacking direction, and including second through electrodes disposed in the second hot zone and electrically connected to the first heat redistribution through electrodes, respectively; and a first thermal barrier layer disposed between the first hot zone and the cool zone, wherein the first through electrodes are electrically connected to the second through electrodes by bypassing the cool zone via the first heat redistribution through electrodes.
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公开(公告)号:US20240321682A1
公开(公告)日:2024-09-26
申请号:US18394575
申请日:2023-12-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jonggyu Lee , Jaechoon Kim , Youngjoon Koh , Taehwan Kim
IPC: H01L23/427 , H01L23/00 , H01L23/528 , H01L25/10 , H10B80/00
CPC classification number: H01L23/473 , H01L23/3677 , H01L23/3733 , H01L23/44 , H01L24/32 , H01L25/18 , H10B80/00 , H01L24/16 , H01L24/73 , H01L2224/16145 , H01L2224/16227 , H01L2224/32245 , H01L2224/73204 , H01L2224/73253 , H01L2924/1431
Abstract: Provided is a semiconductor package including a package substrate, a semiconductor device mounted on the package substrate, and a heat dissipation structure attached onto the semiconductor device, wherein the heat dissipation structure includes a plurality of vapor chambers at different levels in the vertical direction and a plurality of heat pipes extending between the plurality of vapor chambers.
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公开(公告)号:US12009303B2
公开(公告)日:2024-06-11
申请号:US17374713
申请日:2021-07-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaechoon Kim , Seunggeol Ryu , Kyungsuk Oh , Keungbeum Kim , Eonsoo Jang
IPC: H01L23/528 , H01L23/00 , H01L23/36 , H01L23/48 , H01L23/522
CPC classification number: H01L23/5286 , H01L23/36 , H01L23/481 , H01L23/5226 , H01L24/08 , H01L2224/08145
Abstract: An integrated circuit semiconductor device includes a substrate having a first surface and a second surface opposite the first surface; a rail through via passing between the first surface and the second surface of the substrate; a cell-level portion arranged on the first surface and comprising a buried rail connected to the rail through via, a local conductive interconnect, a cell via connected to the local conductive interconnect, and a transistor connected to the local conductive interconnect; a signal wiring-level portion arranged on the cell-level portion and comprising a plurality of upper multi-layer interconnect layers connected to the local conductive interconnect via the cell via and upper vias connecting the upper multi-layer interconnect layers to each other; a dummy substrate arranged on the signal wiring-level portion; a bonding-level portion arranged between the signal wiring-level portion and the dummy substrate and bonding the signal wiring-level portion to the dummy substrate, and comprising a bonding pad connected to the upper via; a power delivery network-level portion arranged under the second surface of the substrate and comprising a plurality of lower multi-layer interconnect layers connected to the rail through via and lower vias connecting the lower multi-layer interconnect layers to each other; and an external connection terminal arranged under the power delivery network-level portion and connected to the lower multi-layer interconnect layers.
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14.
公开(公告)号:US20130321041A1
公开(公告)日:2013-12-05
申请号:US13830651
申请日:2013-03-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jaechoon Kim , SangWook Ju , Eunseok Cho
IPC: H03K3/011
CPC classification number: H03K3/011 , G06F1/203 , G06F1/206 , G06F1/324 , G06F11/3058 , Y02D10/126
Abstract: A method for controlling a temperature of an electronic device which includes a semiconductor chip is provided. The temperature control method includes measuring a temperature of a measurement point using the electronic device, comparing the temperature of the measurement point with a target temperature varying according to a period of time when the semiconductor chip operates using the electronic device, and decreasing a clock frequency of the semiconductor chip using the electronic device when the temperature of the measurement point is higher than the target temperature.
Abstract translation: 提供了一种用于控制包括半导体芯片的电子设备的温度的方法。 温度控制方法包括使用电子装置测量测量点的温度,将测量点的温度与根据半导体芯片使用电子设备操作的时间段变化的目标温度进行比较,并且降低时钟频率 当测量点的温度高于目标温度时,使用电子器件的半导体芯片。
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公开(公告)号:US20250157930A1
公开(公告)日:2025-05-15
申请号:US19028311
申请日:2025-01-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaechoon Kim , Seunggeol Ryu , Kyungsuk Oh , Keungbeum Kim , Eonsoo Jang
IPC: H01L23/528 , H01L23/00 , H01L23/36 , H01L23/48 , H01L23/522
Abstract: An integrated circuit semiconductor device includes a substrate having a first surface and a second surface opposite the first surface; a rail through via passing between the first surface and the second surface of the substrate; a cell-level portion arranged on the first surface and comprising a buried rail connected to the rail through via, a local conductive interconnect, a cell via connected to the local conductive interconnect, and a transistor connected to the local conductive interconnect; a signal wiring-level portion arranged on the cell-level portion and comprising a plurality of upper multi-layer interconnect layers connected to the local conductive interconnect via the cell via and upper vias connecting the upper multi-layer interconnect layers to each other; a dummy substrate arranged on the signal wiring-level portion; a bonding-level portion arranged between the signal wiring-level portion and the dummy substrate and bonding the signal wiring-level portion to the dummy substrate, and comprising a bonding pad connected to the upper via; a power delivery network-level portion arranged under the second surface of the substrate and comprising a plurality of lower multi-layer interconnect layers connected to the rail through via and lower vias connecting the lower multi-layer interconnect layers to each other; and an external connection terminal arranged under the power delivery network-level portion and connected to the lower multi-layer interconnect layers.
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16.
公开(公告)号:US12243803B2
公开(公告)日:2025-03-04
申请号:US18437385
申请日:2024-02-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seunggeol Ryu , Seokkan Ki , Youngsuk Nam , Jaechoon Kim , Bangweon Lee , Seungtae Hwang
IPC: H01L23/373 , H01L23/473
Abstract: A method of manufacturing a thermal interface material may include mixing fine particles with an acidic solution to remove a first oxide layer from a surface of each of the fine particles, injecting a liquid metal into the acidic solution to remove a second oxide layer from a surface of the liquid metal and for the fine particles from which the first oxide layer is removed in the acidic solution to penetrate into the liquid metal from which the second oxide layer is remove, and extracting the liquid metal including the fine particles therein from the acidic solution.
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公开(公告)号:US20240321681A1
公开(公告)日:2024-09-26
申请号:US18505670
申请日:2023-11-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sunggu Kang , Jaechoon Kim , Sungho Mun , Hwanjoo Park
CPC classification number: H01L23/46 , H05K7/20327
Abstract: Provided is a semiconductor package including a substrate, a first semiconductor device on the substrate, and a heat dissipation structure on the first semiconductor device including a heat dissipation chamber configured to provide an internal space in which a working fluid moves, and a plurality of first isolation walls arranged in the heat dissipation chamber to define a first center channel and a plurality of first vapor channels communicating with each other via the first center channel, wherein each of the plurality of first isolation walls vertically overlaps the first semiconductor device, the first center channel vertically overlaps the first semiconductor device, and each of the plurality of first vapor channels extends from the first center channel in a lateral direction.
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公开(公告)号:US20240290720A1
公开(公告)日:2024-08-29
申请号:US18660550
申请日:2024-05-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaechoon Kim , Seunggeol Ryu , Kyungsuk Oh , Keungbeum Kim , Eonsoo Jang
IPC: H01L23/528 , H01L23/00 , H01L23/36 , H01L23/48 , H01L23/522
CPC classification number: H01L23/5286 , H01L23/36 , H01L23/481 , H01L23/5226 , H01L24/08 , H01L2224/08145
Abstract: An integrated circuit semiconductor device includes a substrate having a first surface and a second surface opposite the first surface; a rail through via passing between the first surface and the second surface of the substrate; a cell-level portion arranged on the first surface and comprising a buried rail connected to the rail through via, a local conductive interconnect, a cell via connected to the local conductive interconnect, and a transistor connected to the local conductive interconnect; a signal wiring-level portion arranged on the cell-level portion and comprising a plurality of upper multi-layer interconnect layers connected to the local conductive interconnect via the cell via and upper vias connecting the upper multi-layer interconnect layers to each other; a dummy substrate arranged on the signal wiring-level portion; a bonding-level portion arranged between the signal wiring-level portion and the dummy substrate and bonding the signal wiring-level portion to the dummy substrate, and comprising a bonding pad connected to the upper via; a power delivery network-level portion arranged under the second surface of the substrate and comprising a plurality of lower multi-layer interconnect layers connected to the rail through via and lower vias connecting the lower multi-layer interconnect layers to each other; and an external connection terminal arranged under the power delivery network-level portion and connected to the lower multi-layer interconnect layers.
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19.
公开(公告)号:US20240186215A1
公开(公告)日:2024-06-06
申请号:US18437385
申请日:2024-02-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seunggeol Ryu , Seokkan Ki , Youngsuk Nam , Jaechoon Kim , Bangweon Lee , Seungtae Hwang
IPC: H01L23/373 , H01L23/473
CPC classification number: H01L23/3736 , H01L23/473
Abstract: A method of manufacturing a thermal interface material may include mixing fine particles with an acidic solution to remove a first oxide layer from a surface of each of the fine particles, injecting a liquid metal into the acidic solution to remove a second oxide layer from a surface of the liquid metal and for the fine particles from which the first oxide layer is removed in the acidic solution to penetrate into the liquid metal from which the second oxide layer is remove, and extracting the liquid metal including the fine particles therein from the acidic solution.
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