SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD FOR THE SAME

    公开(公告)号:US20250015049A1

    公开(公告)日:2025-01-09

    申请号:US18412447

    申请日:2024-01-12

    Abstract: A semiconductor package includes a redistribution line structure that has a redistribution line layer. A first semiconductor chip is disposed above the redistribution line structure and includes a first region with a first thickness and a second region with a second thickness that is less than the first thickness. A sub-semiconductor package includes a second semiconductor chip and is disposed above the second region of the first semiconductor chip. A silicon through via penetrates the second region of the first semiconductor chip and electrically connects the sub-semiconductor package with the redistribution line structure. A sealant seals at least a portion of each of the first semiconductor chip and the sub-semiconductor package. The sub-semiconductor package is disposed within the second region of the first semiconductor chip.

    HEAT DISSIPATION STRUCTURE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME

    公开(公告)号:US20240321681A1

    公开(公告)日:2024-09-26

    申请号:US18505670

    申请日:2023-11-09

    CPC classification number: H01L23/46 H05K7/20327

    Abstract: Provided is a semiconductor package including a substrate, a first semiconductor device on the substrate, and a heat dissipation structure on the first semiconductor device including a heat dissipation chamber configured to provide an internal space in which a working fluid moves, and a plurality of first isolation walls arranged in the heat dissipation chamber to define a first center channel and a plurality of first vapor channels communicating with each other via the first center channel, wherein each of the plurality of first isolation walls vertically overlaps the first semiconductor device, the first center channel vertically overlaps the first semiconductor device, and each of the plurality of first vapor channels extends from the first center channel in a lateral direction.

    SEMICONDUCTOR DESIGN OPTIMIZATION SYSTEMS AND METHODS OF OPERATION THEREOF

    公开(公告)号:US20240119211A1

    公开(公告)日:2024-04-11

    申请号:US18206278

    申请日:2023-06-06

    CPC classification number: G06F30/392 G06N20/00

    Abstract: A semiconductor design optimization system that includes: a data base configured to store design data, a training data preprocessing unit configured to preprocess the design data and generate training data, a data learning unit configured to generate a physical property prediction model by training using the training data, a physical property prediction unit configured to generate predicted physical property data including information associated with predicted physical property values for each region of a semiconductor device to be fabricated, wherein the physical property prediction unit is configured to input, into the physical property prediction model, input data including information associated with design drawings of the semiconductor device to be fabricated, and a layout generator configured generate a design layout optimized to distribute the predicted physical property values for each region of the semiconductor device to be fabricated by modifying the design drawings based on the predicted physical property data.

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