公开(公告)号：US12032043B2

公开(公告)日：2024-07-09

申请号：US17499513

申请日：2021-10-12

Applicant: SHOWA DENKO K.K.

Inventor： Sho Tonegawa ,  Akira Sakawaki ,  Yasumasa Watanabe ,  Daizo Endo ,  Tomoyuki Noguchi ,  Yuta Miyamoto

IPC: G01R33/06 ,  H01L43/02 ,  H01L43/12 ,  H10N50/01 ,  H10N50/80

CPC classification number: G01R33/063 ,  H10N50/01 ,  H10N50/80

Abstract: In a magnetic sensor using a magnetic impedance effect, sensitivity is improved as compared to the case where a width of a sensitive element in the short direction is equal from one end to the other end in the longitudinal direction. The magnetic sensor includes: a non-magnetic substrate; and a sensitive element that is provided on the substrate, composed of a soft magnetic material, having a longitudinal direction and a short direction, provided with uniaxial magnetic anisotropy in a direction crossing the longitudinal direction, having a width at a center portion in the longitudinal direction that is smaller compared to a width at each of both end portions in the longitudinal direction, and sensing a magnetic field by a magnetic impedance effect.

公开(公告)号：US20220128634A1

公开(公告)日：2022-04-28

申请号：US17499513

申请日：2021-10-12

Applicant: SHOWA DENKO K.K.

Inventor： Sho TONEGAWA ,  Akira Sakawaki ,  Yasumasa Watanabe ,  Daizo Endo ,  Tomoyuki Noguchi ,  Yuta Miyamoto

IPC: G01R33/06 ,  H01L43/12 ,  H01L43/02

Abstract: In a magnetic sensor using a magnetic impedance effect, sensitivity is improved as compared to the case where a width of a sensitive element in the short direction is equal from one end to the other end in the longitudinal direction. The magnetic sensor includes: a non-magnetic substrate; and a sensitive element that is provided on the substrate, composed of a soft magnetic material, having a longitudinal direction and a short direction, provided with uniaxial magnetic anisotropy in a direction crossing the longitudinal direction, having a width at a center portion in the longitudinal direction that is smaller compared to a width at each of both end portions in the longitudinal direction, and sensing a magnetic field by a magnetic impedance effect.

公开(公告)号：US08790525B2

公开(公告)日：2014-07-29

申请号：US13742657

申请日：2013-01-16

Applicant: Showa Denko K.K.

Inventor： Makoto Hiwatari ,  Akira Yamane ,  Tomoo Shige ,  Akira Sakawaki

IPC: B44C1/22 ,  G11B5/84 ,  G11B5/855 ,  G11B5/31 ,  H01L21/311

CPC classification number: G11B5/84 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/855 ,  H01L21/31116 ,  Y10T29/49046 ,  Y10T29/49048

Abstract: A method of manufacturing a magnetic recording medium is provided. The method includes: forming a magnetic layer 2 on a non-magnetic substrate 1; forming a mask layer 3 on the magnetic layer 2; forming a resist layer 4 which is patterned into a predetermined shape on the mask layer 3; patterning the mask layer 3 into a shape corresponding to the resist layer 4 using the resist layer 4; patterning the magnetic layer 2 into a shape corresponding to the mask layer 3 using the patterned mask layer 3; and removing the mask layer 3 that remains on the magnetic layer 2 by reactive plasma etching. The reactive plasma etching is performed under an atmosphere containing an organic compound having at least one kind or plural kinds of functional groups selected from a hydroxyl group, a carbonyl group, a hydroxy carbonyl group, an alkoxy group, and an ether group.

Abstract translation: 提供一种制造磁记录介质的方法。 该方法包括：在非磁性基板1上形成磁性层2; 在磁性层2上形成掩模层3; 在掩模层3上形成图案化为规定形状的抗蚀剂层4; 使用抗蚀剂层4将掩模层3图案化成与抗蚀剂层4相对应的形状; 使用图案化掩模层3将磁性层2图案化成与掩模层3相对应的形状; 以及通过反应性等离子体蚀刻去除残留在磁性层2上的掩模层3。 活性等离子体蚀刻在含有选自羟基，羰基，羟基羰基，烷氧基和醚基中的至少一种或多种官能团的有机化合物的气氛下进行。