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公开(公告)号：US20210101092A1
公开(公告)日：2021-04-08
申请号：US16971216
申请日：2019-02-22
Applicant: SILCOTEK CORP.
Inventor： Jesse BISCHOF , Lucas D. PATTERSON , Gary BARONE , Min YUAN , David A. SMITH
Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.
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公开(公告)号：US20190003044A1
公开(公告)日：2019-01-03
申请号：US16121994
申请日：2018-09-05
Applicant: SILCOTEK CORP.
Inventor： Min YUAN , James B. MATTZELA , David A. SMITH
IPC: C23C16/34 , C23C16/455 , C23C16/04 , C23C16/30 , C23C16/56
Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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13.发明申请THERMAL CHEMICAL VAPOR DEPOSITION COATED PRODUCT AND PROCESS OF USING A THERMAL VAPOR DEPOSITION COATED PRODUCT 审中-公开热塑性蒸气沉积涂层产品及使用热蒸气沉积涂层产品的方法公开(公告)号：US20160289585A1
公开(公告)日：2016-10-06
申请号：US14675823
申请日：2015-04-01
Applicant: SILCOTEK CORP.
Inventor： James B. MATTZELA , Min YUAN , David A. SMITH , Paul H. SILVIS
IPC: C10M105/76 , C23C16/44 , C23C16/30
CPC classification number: C10M105/76 , C10M2227/045 , C10N2230/06 , C10N2250/14 , C10N2260/04 , C23C16/325 , C23C16/56
Abstract: Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material.
Abstract translation: 公开了热化学气相沉积涂覆产品和这些产品的用途。 热化学气相沉积涂覆产品包括螺纹基底和在螺纹基底上的润滑涂层，该润滑涂层的摩擦系数在0.05和0.58之间，并且是热化学气相沉积。 一种方法包括使热化学气相沉积涂覆的产品与具有配合螺纹的材料接合，并在与材料接合的同时向热化学气相沉积涂覆的产品施加压力。
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公开(公告)号：US20160060763A1
公开(公告)日：2016-03-03
申请号：US14821949
申请日：2015-08-10
Applicant: SILCOTEK CORP.
Inventor： Min YUAN , David A. SMITH , Paul H. SILVIS , James B. MATTZELA
Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.
Abstract translation: 公开了一种化学气相沉积工艺和涂覆制品。 化学气相沉积工艺包括将物品定位在化学气相沉积室中，然后将沉积气体以低于沉积气体的热分解温度的分解温度引入化学气相沉积室，然后加热室 达到等于或高于沉积气体的热分解温度的超分解温度，从沉积气体的引入导致在制品的至少一个表面上沉积的涂层。 化学气相沉积工艺保持在0.01psia和200psia的压力范围内和/或沉积气体是二甲基硅烷。 涂覆制品包括经受腐蚀的基材和在基材上沉积的涂层，沉积的涂层具有硅，并具有耐腐蚀性。
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公开(公告)号：US20220025512A1
公开(公告)日：2022-01-27
申请号：US17297123
申请日：2019-11-29
Applicant: SILCOTEK CORP.
Inventor： Min YUAN
Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethyl silane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.
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Patent Agency Ranking
公开(公告)号：US20210384601A1
公开(公告)日：2021-12-09
申请号：US17328317
申请日：2021-05-24
Applicant: SILCOTEK CORP.
Inventor： Min YUAN , Jesse BISCHOF
Abstract: Dielectric coatings, articles having dielectric coatings, and systems including coating having dielectric coatings are disclosed. The dielectric article includes a substrate having hidden surfaces and a dielectric coating on the hidden surfaces of the substrate. The dielectric coating has a bulk resistivity of at least 108 Ω·cm and a thickness of between 30 nanometers and 3,000 nanometers.
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公开(公告)号：US20210277515A1
公开(公告)日：2021-09-09
申请号：US17330980
申请日：2021-05-26
Applicant: SILCOTEK CORP.
Inventor： Min YUAN
Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethyl silane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.
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公开(公告)号：US20190262745A1
公开(公告)日：2019-08-29
申请号：US16282626
申请日：2019-02-22
Applicant: SILCOTEK CORP.
Inventor： Jesse BISCHOF , Lucas D. PATTERSON , Gary BARONE , Min YUAN , David A. SMITH
Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.
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19.发明申请公开(公告)号：US20190077118A1
公开(公告)日：2019-03-14
申请号：US16129989
申请日：2018-09-13
Applicant: SILCOTEK CORP.
Inventor： Min YUAN
Abstract: Corrosion-resistant coated articles and a thermal chemical vapor deposition coating processes are disclosed. The article includes a metallic material having a first composition including a first iron concentration and a first chromium concentration, the first iron concentration being greater than the first chromium concentration, a surface of the metallic material having a second composition including a second iron concentration and a second chromium concentration, the second chromium concentration being less than the first chromium concentration, an oxide layer on the surface of the metallic material having a third composition including an iron oxide concentration and a chromium oxide concentration, the chromium oxide concentration being greater than the iron oxide concentration and being devoid of precipitates, and a thermal chemical vapor deposition coating on the oxide layer. The process includes producing the article by treating to produce the surface, oxidizing to produce the oxide layer, and applying the coating.
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公开(公告)号：US20170167015A1
公开(公告)日：2017-06-15
申请号：US14970015
申请日：2015-12-15
Applicant: SILCOTEK CORP.
Inventor： Min YUAN , James B. MATTZELA , David A. SMITH
IPC: C23C16/34 , C23C16/455 , C23C16/56 , C23C16/30
CPC classification number: C23C16/345 , C23C16/045 , C23C16/308 , C23C16/45523 , C23C16/45557 , C23C16/56
Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.
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