公开(公告)号：US20190136371A1

公开(公告)日：2019-05-09

申请号：US16181512

申请日：2018-11-06

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF

IPC: C23C16/24 ,  C23C16/44 ,  C23C16/02 ,  C23C16/56

Abstract: Article having a molybdenum substrate and an amorphous chemical vapor deposition coating on the molybdenum substrate, processes of using the articles, and processes of producing the articles are disclosed. The articles include a molybdenum substrate and an amorphous chemical vapor deposition coating on the molybdenum substrate. The amorphous chemical vapor deposition coating includes silicon. The processes of using the article include exposing the article to temperatures of greater than 1,200° C. The processes of producing the article include positioning the molybdenum substrate, and applying the amorphous chemical vapor deposition coating on the molybdenum substrate through thermal chemical vapor deposition.

公开(公告)号：US20230074641A1

公开(公告)日：2023-03-09

申请号：US17795081

申请日：2021-01-22

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Martin E. HIGGINS ,  Thomas WINTER

IPC: C23C16/04 ,  C23C16/24 ,  C23C16/26 ,  B01J19/02 ,  C09D5/08 ,  C09D1/00

Abstract: Pharmaceutical manufacturing processes and products are disclosed. A pharmaceutical manufacturing process includes flowing a liquid through a pathway. The liquid contacts a non-polymeric coating on a substrate within the pathway. The substrate is a metal or metallic substrate. A pharmaceutical product is produced by flowing a liquid through a pathway. The liquid contacts a non-polymeric coating on a substrate within the pathway. The substrate is a metal or metallic substrate.

公开(公告)号：US20220073754A1

公开(公告)日：2022-03-10

申请号：US17407902

申请日：2021-08-20

Applicant: SILCOTEK CORP.

Inventor： Patrick DICK ,  David A. SMITH ,  Jesse BISCHOF ,  Ricky EDMISTON

IPC: C09D5/00 ,  A61L27/28 ,  A61L29/08 ,  A61L31/08

Abstract: Medical device products have a coating with NAMSA Class VI certification and properties corresponding to the prior art coatings within U.S. Pat. No. 10,604,660. Medical device processes use the medical device product having a coating with NAMSA Class VI certification and properties corresponding to the prior art coatings within U.S. Pat. No. 10,604,660.

公开(公告)号：US20210170305A1

公开(公告)日：2021-06-10

申请号：US17177770

申请日：2021-02-17

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Lucas D. PATTERSON ,  Gary BARONE ,  Min YUAN ,  David A. SMITH

IPC: B01D15/22 ,  B01D15/20 ,  B01D15/16 ,  G01N30/36 ,  G01N30/56 ,  G01N30/30 ,  G01N30/02

Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof

公开(公告)号：US20210101092A1

公开(公告)日：2021-04-08

申请号：US16971216

申请日：2019-02-22

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Lucas D. PATTERSON ,  Gary BARONE ,  Min YUAN ,  David A. SMITH

IPC: B01D15/22 ,  G01N30/30 ,  G01N30/36 ,  G01N30/56 ,  B01D15/20 ,  B01D15/16

Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.

公开(公告)号：US20210384601A1

公开(公告)日：2021-12-09

申请号：US17328317

申请日：2021-05-24

Applicant: SILCOTEK CORP.

Inventor： Min YUAN ,  Jesse BISCHOF

IPC: H01P3/08 ,  C23C16/24

Abstract: Dielectric coatings, articles having dielectric coatings, and systems including coating having dielectric coatings are disclosed. The dielectric article includes a substrate having hidden surfaces and a dielectric coating on the hidden surfaces of the substrate. The dielectric coating has a bulk resistivity of at least 108 Ω·cm and a thickness of between 30 nanometers and 3,000 nanometers.

公开(公告)号：US20190262745A1

公开(公告)日：2019-08-29

申请号：US16282626

申请日：2019-02-22

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Lucas D. PATTERSON ,  Gary BARONE ,  Min YUAN ,  David A. SMITH

IPC: B01D15/38 ,  G01N30/36 ,  B01D15/22

Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof.

公开(公告)号：US20240117495A1

公开(公告)日：2024-04-11

申请号：US17768249

申请日：2020-10-13

Applicant: SILCOTEK CORP.

Inventor： Geoffrey K. WHITE ,  Nicholas P. DESKEVICH ,  James B. MATTZELA ,  Gary A. BARONE ,  David A. SMITH ,  Pierre A. LECLAIR ,  Min YUAN ,  Jesse BISCHOF

IPC: C23C16/52 ,  C23C16/44 ,  C23C16/455 ,  C23C16/46

CPC classification number: C23C16/52 ,  C23C16/4404 ,  C23C16/45523 ,  C23C16/46

Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.

公开(公告)号：US20190309414A1

公开(公告)日：2019-10-10

申请号：US16379236

申请日：2019-04-09

Applicant: SILCOTEK CORP.

Inventor： Thomas F. VEZZA ,  James B. MATTZELA ,  Gary A. BARONE ,  Jesse BISCHOF ,  David A. SMITH

IPC: C23C16/44

Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.