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    THERMAL CHEMICAL VAPOR DEPOSITION COATING
    1.
    发明申请
    THERMAL CHEMICAL VAPOR DEPOSITION COATING 审中-公开

    公开(公告)号：US20180258529A1

    公开(公告)日：2018-09-13

    申请号：US15755962

    申请日：2016-08-31

    Applicant: SILCOTEK CORP.

    Inventor： Thomas F. VEZZA ,  James B. MATTZELA ,  Gary A. BARONE ,  William David GROVE ,  Paul H. SILVIS

    IPC: C23C16/455 ,  C23C16/24

    CPC classification number: C23C16/45523 ,  C23C16/045 ,  C23C16/24

    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.

    ARTICLE INCLUDING A COATING AND PROCESS INCLUDING AN ARTICLE WITH A COATING
    2.
    发明申请
    ARTICLE INCLUDING A COATING AND PROCESS INCLUDING AN ARTICLE WITH A COATING 审中-公开
    包括涂料和包括涂料在内的工艺的文章

    公开(公告)号：US20160289824A1

    公开(公告)日：2016-10-06

    申请号：US14675795

    申请日：2015-04-01

    Applicant: SILCOTEK CORP.

    Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

    IPC: C23C16/44 ,  C22C21/08 ,  C23C16/02

    CPC classification number: C23C16/44 ,  C22C21/08 ,  C23C16/0209

    Abstract: An article including a coating and a process including an article with a coating are disclosed. The article includes an aluminum-containing substrate including, by weight, at least 95% aluminum, and a coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C. The process includes transporting fluid along a coated and stabilized surface positioned on an aluminum-containing substrate.

    Abstract translation: 公开了一种包括涂层和包括具有涂层的制品的工艺的制品。 该制品包括含铝基材，其包含至少95重量％的铝，以及在含铝基材上的涂层和稳定化表面，涂覆和稳定的表面通过热化学气相沉积在小于 600℃。该方法包括沿着位于含铝基底上的涂覆和稳定的表面输送流体。

    INDUSTRIAL EQUIPMENT ARTICLE
    4.
    发明申请
    INDUSTRIAL EQUIPMENT ARTICLE 有权

    公开(公告)号：US20220186040A1

    公开(公告)日：2022-06-16

    申请号：US17684860

    申请日：2022-03-02

    Applicant: SILCOTEK CORP.

    Inventor： David A. SMITH ,  Min YUAN ,  James B. MATTZELA ,  Paul H. SILVIS

    IPC: C09D5/16 ,  C23C16/44 ,  C23C16/56 ,  C23C16/02 ,  C23C16/30

    Abstract: Industrial equipment articles and thermal chemical vapor coated articles are disclosed. The articles include a coating on a substrate of the industrial equipment article, the coating including silicon, carbon, and hydrogen. The industrial equipment article requires resistance to protein adsorption. The industrial equipment article was heated during application of the coating to a temperature of between 300 degrees C. and 600 degrees C. The thermal chemical vapor coated article includes a coating on the thermal chemical vapor coated article, the coating formed by thermal decomposition, oxidation, then functionalization. The thermal chemical vapor coated article is industrial equipment requiring resistance to protein adsorption. The coating is resistant to the protein adsorption and is on a substrate heated during the thermal decomposition.

    COATED ARTICLE
    5.
    发明申请
    COATED ARTICLE 审中-公开

    公开(公告)号：US20190032201A1

    公开(公告)日：2019-01-31

    申请号：US15683399

    申请日：2017-08-22

    Applicant: SILCOTEK CORP.

    Inventor： David A. SMITH ,  James B. MATTZELA ,  Paul H. SILVIS ,  Gary A. BARONE

    IPC: C23C16/32 ,  C23C16/56 ,  C23C8/10 ,  B05D1/00

    CPC classification number: C23C16/325 ,  B05D1/60 ,  B05D2202/15 ,  C23C8/10 ,  C23C16/56 ,  Y10T428/24802

    Abstract: The present invention relates to a coated article. The coated article includes a first layer, a second layer, and a diffusion region between the first layer and the second layer. The first layer has a first atomic concentration of C, a first atomic concentration of Si, and a first atomic concentration of O. The second layer has a first atomic concentration of Fe, a first atomic concentration of Cr, and a first atomic concentration of Ni. The diffusion region has a second atomic concentration of the C, a second atomic concentration of the Si, a second atomic concentration of the O, a second atomic concentration of the Fe, a second atomic concentration of the Cr, and a second atomic concentration of the Ni. All of the atomic concentrations are based upon Auger Electron Spectroscopy.

    THERMAL CHEMICAL VAPOR DEPOSITION COATED PRODUCT AND PROCESS OF USING A THERMAL VAPOR DEPOSITION COATED PRODUCT
    8.
    发明申请
    THERMAL CHEMICAL VAPOR DEPOSITION COATED PRODUCT AND PROCESS OF USING A THERMAL VAPOR DEPOSITION COATED PRODUCT 审中-公开
    热塑性蒸气沉积涂层产品及使用热蒸气沉积涂层产品的方法

    公开(公告)号：US20160289585A1

    公开(公告)日：2016-10-06

    申请号：US14675823

    申请日：2015-04-01

    Applicant: SILCOTEK CORP.

    Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

    IPC: C10M105/76 ,  C23C16/44 ,  C23C16/30

    CPC classification number: C10M105/76 ,  C10M2227/045 ,  C10N2230/06 ,  C10N2250/14 ,  C10N2260/04 ,  C23C16/325 ,  C23C16/56

    Abstract: Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material.

    Abstract translation: 公开了热化学气相沉积涂覆产品和这些产品的用途。 热化学气相沉积涂覆产品包括螺纹基底和在螺纹基底上的润滑涂层，该润滑涂层的摩擦系数在0.05和0.58之间，并且是热化学气相沉积。 一种方法包括使热化学气相沉积涂覆的产品与具有配合螺纹的材料接合，并在与材料接合的同时向热化学气相沉积涂覆的产品施加压力。

    CHEMICAL VAPOR DEPOSITION PROCESS AND COATED ARTICLE
    9.
    发明申请
    CHEMICAL VAPOR DEPOSITION PROCESS AND COATED ARTICLE 有权
    化学气相沉积工艺和涂层制品

    公开(公告)号：US20160060763A1

    公开(公告)日：2016-03-03

    申请号：US14821949

    申请日：2015-08-10

    Applicant: SILCOTEK CORP.

    Inventor： Min YUAN ,  David A. SMITH ,  Paul H. SILVIS ,  James B. MATTZELA

    IPC: C23C16/52 ,  C23C16/22

    CPC classification number: C23C16/52 ,  C23C16/22 ,  C23C16/30 ,  C23C16/46 ,  C23C16/56

    Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

    Abstract translation: 公开了一种化学气相沉积工艺和涂覆制品。 化学气相沉积工艺包括将物品定位在化学气相沉积室中，然后将沉积气体以低于沉积气体的热分解温度的分解温度引入化学气相沉积室，然后加热室 达到等于或高于沉积气体的热分解温度的超分解温度，从沉积气体的引入导致在制品的至少一个表面上沉积的涂层。 化学气相沉积工艺保持在0.01psia和200psia的压力范围内和/或沉积气体是二甲基硅烷。 涂覆制品包括经受腐蚀的基材和在基材上沉积的涂层，沉积的涂层具有硅，并具有耐腐蚀性。

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