Display apparatus and method of manufacturing the same

    公开(公告)号:US10361263B2

    公开(公告)日:2019-07-23

    申请号:US15949614

    申请日:2018-04-10

    Abstract: Provided is a display apparatus. The display apparatus includes a base substrate, a first transistor disposed on the base substrate and including a first semiconductor layer including a first layer and a second layer disposed to come into contact with a first layer and including a compound made of at least two materials of a Group IV elements, a first control electrode overlapping the first semiconductor layer, a first input electrode connected to the first semiconductor layer, and a first output electrode connected to the first semiconductor layer, a second transistor and an organic light emitting diode.

    INKJET PRINTING DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

    公开(公告)号:US20230219343A1

    公开(公告)日:2023-07-13

    申请号:US17963810

    申请日:2022-10-11

    CPC classification number: B41J2/145 B41M3/003 B41J2/16505

    Abstract: An inkjet printing device includes a chamber having an imaginary centerline that divides a length of the chamber in the first direction into two halves, and a plurality of inkjet nozzles coupled to the chamber and receiving ink from the chamber, the inkjet nozzles being arranged in a plurality of columns along a first direction. The inkjet nozzles include a center column nozzle disposed adjacent to the centerline of the chamber and an outer column nozzle disposed farther from the centerline than the center column nozzle. The chamber includes a bump portion disposed farther from the centerline than the outer column nozzle, the bump portion including a bump on an inner surface of the chamber.

    Deposition apparatus including cleaning gas valve unit and deposition method including the same

    公开(公告)号:US11075059B2

    公开(公告)日:2021-07-27

    申请号:US16239874

    申请日:2019-01-04

    Abstract: A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.

    APPARATUS AND METHOD FOR MANUFACTURING DISPLAY APPARATUS

    公开(公告)号:US20200024724A1

    公开(公告)日:2020-01-23

    申请号:US16354006

    申请日:2019-03-14

    Abstract: An apparatus for manufacturing a display apparatus includes a chamber configured to accommodate a first display substrate and a second display substrate therein, a deposition source positioned in the chamber and comprising a plurality of crucibles configured to move and supply at least two deposition materials to the first display substrate or the second display substrate, a mask assembly arranged between the first display substrate or the second display substrate and the deposition source, and a shutter portion arranged between the mask assembly and the deposition source and configured to control an amount of the at least two deposition materials supplied from the plurality of crucibles.

    APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS

    公开(公告)号:US20190211445A1

    公开(公告)日:2019-07-11

    申请号:US16160757

    申请日:2018-10-15

    CPC classification number: C23C16/4405 C23C16/46

    Abstract: An apparatus for manufacturing a display apparatus includes: a chamber; a head unit configured to supply a process gas and a cleaning gas to an inside of the chamber; which has a storage space where the process gas or the cleaning gas is temporarily stored, and including a nozzle connected to the storage space and configured to guide the process gas or the cleaning gas from the storage space to the inside of the chamber; a susceptor unit arranged to face the head unit and on which a substrate is placeable; a cleaning gas supply unit connected to the head unit and configured to plasmarize the cleaning gas and supply the cleaning gas that is plasmarized to the head unit; and a cleaning gas ejection unit connected to the cleaning gas supply unit and configured to supply the cleaning gas to at least two portions of the storage space.

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