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公开(公告)号：US10991913B2
公开(公告)日：2021-04-27
申请号：US16199848
申请日：2018-11-26
发明人： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
摘要： Provided are an encapsulating structure, an organic light-emitting display device including the encapsulating structure, and a method of manufacturing the same. The encapsulating structure includes a first barrier layer including a first inorganic layer having a first thickness; a plasma polymer layer on the first inorganic layer, the plasma polymer layer having a second thickness smaller than or equal to the first thickness; and a second barrier layer including at least one second inorganic layer on the plasma polymer layer. The at least one second inorganic layer has a third thickness, and the third thickness is smaller than or equal to the second thickness.
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2.发明申请公开(公告)号：US20180366688A1
公开(公告)日：2018-12-20
申请号：US16111037
申请日：2018-08-23
发明人： Choelmin Jang , Dongkyun Ko , Inkyo Kim , Sukwon Jung , Nam Ha , Myungsoo Huh
CPC分类号： H01L51/56 , C23C16/4412 , C23C16/45551 , C23C16/45563 , C23C16/54 , H01L51/0097 , H01L51/5253 , H01L51/5256
摘要： An apparatus and method for manufacturing a display apparatus includes: a chamber; a first nozzle unit at the chamber, the first nozzle unit configured to deposit an organic layer or an inorganic layer on a substrate; a second nozzle unit at the chamber, the second nozzle unit configured to deposit the organic layer or the inorganic layer on a substrate and the second nozzle unit being linearly aligned with the first nozzle unit in a first direction; and an injection nozzle unit between the first nozzle unit and the second nozzle unit, the injection nozzle unit configured to inject a first gas in the chamber toward the substrate.
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公开(公告)号：US20230012818A1
公开(公告)日：2023-01-19
申请号：US17951111
申请日：2022-09-23
发明人： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC分类号： C23C16/54 , H01J37/32 , C23C16/455
摘要： A deposition apparatus including a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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4.发明授权公开(公告)号：US11075059B2
公开(公告)日：2021-07-27
申请号：US16239874
申请日：2019-01-04
发明人： Junggon Kim , Sunghun Key , Choelmin Jang , Myungsoo Huh
IPC分类号： H01J37/32 , C23C16/455
摘要： A deposition apparatus includes a deposition gas supply unit including an opening and closing valve. The deposition gas supply unit is configured to selectively supply a source gas or a mixture gas into a chamber. A cleaning gas supply unit is configured to supply a cleaning gas into the chamber. A deposition head includes a first deposition head including a first nozzle configured to supply the source gas and the cleaning gas and a second deposition head including a second nozzle configured to supply the source gas, the mixture gas, and the cleaning gas. An exhaust unit is configured to discharge the cleaning gas and remaining source and mixture gases from the chamber. A cleaning gas valve unit is configured to be selectively opened and closed to supply the cleaning gas to at least any one of the first deposition head and the second deposition head.
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公开(公告)号：US20190203359A1
公开(公告)日：2019-07-04
申请号：US16122755
申请日：2018-09-05
发明人： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC分类号： C23C16/54 , C23C16/455 , H01J37/32
CPC分类号： C23C16/54 , C23C16/45519 , C23C16/45544 , H01J37/3244
摘要： A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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公开(公告)号：US20160097124A1
公开(公告)日：2016-04-07
申请号：US14793562
申请日：2015-07-07
发明人： Myungsoo Huh , Dongkyun Ko , Choelmin Jang , Sungchul Kim , Inkyo Kim , Cheollae Roh
IPC分类号： C23C16/455 , C23C16/50
CPC分类号： C23C16/50 , C23C16/45563 , C23C16/54 , H01J37/3244 , H01J37/32449 , H01J37/32752 , H01J37/32899 , H01L51/5256
摘要： An apparatus and a method of manufacturing a display apparatus are disclosed. In one aspect, the apparatus includes a chamber and an inorganic layer forming nozzle unit formed in the chamber and configured to form at least one inorganic layer. The apparatus also includes an organic layer forming nozzle unit formed in the chamber and configured to form at least one organic layer, wherein the organic layer forming nozzle unit is arranged substantially in line with the inorganic layer forming nozzle unit. The apparatus further includes a separating nozzle unit formed between the inorganic layer forming nozzle unit and the organic layer forming nozzle unit and configured to spray an inert gas.
摘要翻译： 公开了一种制造显示装置的装置和方法。 一方面，该装置包括腔室和形成在腔室中并构造成形成至少一个无机层的无机层形成喷嘴单元。 所述设备还包括形成在所述室中并构造成形成至少一个有机层的有机层形成喷嘴单元，其中所述有机层形成喷嘴单元基本上与所述无机层形成喷嘴单元一致。 该装置还包括形成在无机层形成喷嘴单元和有机层形成喷嘴单元之间的分离喷嘴单元，并且构造成喷射惰性气体。
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公开(公告)号：US20230263032A1
公开(公告)日：2023-08-17
申请号：US18306067
申请日：2023-04-24
发明人： SUNHEE LEE , Sunho Kim , Gunhee Kim , Donghwan Shim , Taehoon Yang , Choelmin Jang
IPC分类号： H10K59/40 , H10K50/844
CPC分类号： H10K59/40 , H10K50/844
摘要： A display device includes a display area and a peripheral area. A display layer includes a plurality of display elements arranged thereon. A thin-film encapsulation layer is arranged on the display layer and includes first, second, and third encapsulation layers. The second encapsulation layer is on the first encapsulation layer. The third encapsulation layer is on the second encapsulation layer. A touch sensing layer is arranged on the thin-film encapsulation layer and includes touch electrodes and trace lines. The display area is partially bent about an axis, and the third encapsulation layer is bent along the axis and has a structure in which a first layer and a second layer are alternately stacked. The first layer includes an inorganic insulating material, and the second layer includes a silicon carbon compound material.
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公开(公告)号：US11499232B2
公开(公告)日：2022-11-15
申请号：US16122755
申请日：2018-09-05
发明人： Choelmin Jang , Sunghun Key , Junggon Kim , Myungsoo Huh
IPC分类号： C23C16/54 , C23C16/455 , H01J37/32
摘要： A deposition apparatus and method of deposition are provided. The deposition apparatus includes a gas supply unit, including: a first process gas supply unit blowing a first process gas onto a deposition-target surface; a second process gas supply unit blowing a second process gas different from the first process gas onto the deposition-target surface of the substrate; and air curtain units blocking an area between an area where the process gas is blown and an area where the second process gas is blown, by blowing an inert gas.
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公开(公告)号：US10043998B2
公开(公告)日：2018-08-07
申请号：US15442095
申请日：2017-02-24
发明人： Myungsoo Huh , Sungmin Cho , Dongkyun Ko , Sungchul Kim , Inkyo Kim , Cheollae Roh , Sangjoon Seo , Seungwoo Seo , Choelmin Jang
IPC分类号： H01L51/50 , H01L51/52 , C23C16/455 , H01L51/56 , H01L27/32
摘要： A display apparatus and an apparatus for and method of manufacturing the display apparatus. The display apparatus includes: a substrate; a display unit formed on the substrate; and a thin film encapsulation layer formed on the display unit. The thin film encapsulation layer includes an inorganic layer, and the inorganic layer includes a first sub-inorganic layer including a compound oxide including at least two of aluminum (Al), zinc (Zn), zirconium (Zn), and hafnium (Hf).
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10.发明申请APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS 审中-公开制造显示装置的装置和制造显示装置的方法公开(公告)号：US20160226031A1
公开(公告)日：2016-08-04
申请号：US14929159
申请日：2015-10-30
发明人： Choelmin Jang , Dongkyun Ko , Inkyo Kim , Sukwon Jung , Nam Ha , Myungsoo Huh
CPC分类号： H01L51/56 , C23C16/4412 , C23C16/45551 , C23C16/45563 , C23C16/54 , H01L51/0097 , H01L51/5253 , H01L51/5256
摘要： An apparatus and method for manufacturing a display apparatus includes: a chamber; a first nozzle unit at the chamber, the first nozzle unit configured to deposit an organic layer or an inorganic layer on a substrate; a second nozzle unit at the chamber, the second nozzle unit configured to deposit the organic layer or the inorganic layer on a substrate and the second nozzle unit being linearly aligned with the first nozzle unit in a first direction; and an injection nozzle unit between the first nozzle unit and the second nozzle unit, the injection nozzle unit configured to inject a first gas in the chamber toward the substrate.
摘要翻译： 一种显示装置的制造装置和方法，包括：室; 在所述腔室处的第一喷嘴单元，所述第一喷嘴单元被配置为在基板上沉积有机层或无机层; 所述第二喷嘴单元被配置为将所述有机层或所述无机层沉积在基板上，并且所述第二喷嘴单元在所述第一方向上与所述第一喷嘴单元线性对准; 以及在所述第一喷嘴单元和所述第二喷嘴单元之间的喷嘴单元，所述喷射喷嘴单元被配置为将所述室中的第一气体朝向所述基板喷射。
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