公开(公告)号：US20250081320A1

公开(公告)日：2025-03-06

申请号：US18638916

申请日：2024-04-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae LEE ,  Ohkug KWON ,  Youngduk SUH ,  Sunghyup KIM ,  Jeonggil KIM ,  Yebin NAM ,  Daegeun YOON ,  Seungpyo HONG

IPC: H05G2/00 ,  G03F7/00

Abstract: An extreme ultraviolet (EUV) light generating device includes a vessel having an internal space, a droplet generator generating droplets to be supplied to the internal space, a droplet emitter emitting the droplets generated by the droplet generator to the internal space, a laser light source generating a laser beam to generate EUV light by reaction with the droplets, a condensing mirror adjacent to the laser light source to at least partially surround the laser light source and concentrating EUV light on an intermediate focus (IF), and gas lock nozzles around the IF to respectively constitute rows and ejecting a flow control gas to the internal space, wherein a tilted direction of a gas lock nozzle in at least one of the rows is tilted in a direction consistent with a tilted direction of a sidewall of the vessel with respect to a central axis direction of the internal space.

公开(公告)号：US20230185207A1

公开(公告)日：2023-06-15

申请号：US18164835

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup KIM ,  Ho YU ,  Jeonggil KIM ,  Minseok CHOI

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  H05G2/008 ,  G21K1/06 ,  H05G2/005 ,  G03F7/70891

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US20210059035A1

公开(公告)日：2021-02-25

申请号：US16835708

申请日：2020-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup KIM ,  Ho YU ,  Jeonggil KIM ,  Minseok CHOI

IPC: H05G2/00 ,  G21K1/06 ,  G03F7/20

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US20240121877A1

公开(公告)日：2024-04-11

申请号：US18338789

申请日：2023-06-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae LEE ,  Sunghyup KIM ,  Yebin NAM ,  Daegeun YOON

IPC: H05G2/00 ,  G03F7/00

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008 ,  G21K1/06

Abstract: An extreme ultraviolet light source device includes a chamber having a lower surface on which a condensing mirror is arranged, an intermediate focus, and a side surface between the lower surface and an upper surface a first exhaust port and a second exhaust port on the upper surface and spaced apart from the intermediate focus; a droplet supply adjacent to the side surface of the chamber, and configured to supply a droplet to generate the extreme ultraviolet light into the chamber; a light source configured to generate the extreme ultraviolet light by oscillating a laser; a catch adjacent to the side surface of the chamber, opposite to the droplet supply, and configured to receive the droplet discharged from the droplet supply unit; a first exhaust connected to the first exhaust port; and a second exhaust adjacent to the upper surface of the chamber, and connected to the second exhaust port.

公开(公告)号：US20230238351A1

公开(公告)日：2023-07-27

申请号：US18128449

申请日：2023-03-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jonggu LEE ,  Sunghyup KIM ,  Byungjo KIM ,  Sanghoon LEE ,  Sukwon LEE ,  Sebin CHOI

IPC: H01L23/00 ,  B29C65/30 ,  B29C65/00

CPC classification number: H01L24/75 ,  B29C65/30 ,  B29C66/8185 ,  H01L2224/75502 ,  H01L2224/75745 ,  H01L2224/75252 ,  H01L2224/75984

Abstract: A bonding head for a die bonding apparatus and a die bonding apparatus including the bonding head, the bonding head including a head body; a thermal pressurizer mounted on a lower surface of the head body, the thermal pressurizer being configured to hold and heat at least one die and including a heater having a first heating surface that faces a held surface of the die; and a thermal compensator at an outer region of the die, the thermal compensator extending downwardly from the lower surface of the head body and including at least one thermal compensating block having a second heating surface that emits heat from a heating source therein and that faces a side surface of the die held on the thermal pressurizer.

公开(公告)号：US20230207369A1

公开(公告)日：2023-06-29

申请号：US17893659

申请日：2022-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jonggu LEE ,  Sunghyup KIM ,  Jeongdu KIM ,  Hyeonjin KIM ,  Junghwan KIM

IPC: H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6833 ,  H01L21/68742 ,  H01L21/6875

Abstract: A wafer chuck table includes a center plate having a plurality of first protrusions each having an upper end at least partially defining a first reference plane, segmented plates arranged around the center plate and having a plurality of second protrusions, each having an upper end at least partially defining a second reference plane such that the segmented plates have separate, respective pluralities of second protrusions at least partially defining separate, respective second reference planes, and driving units configured to adjust an inclination angle of the segmented plates with respect to the center plate so that the first reference plane and the separate, respective second reference planes are coplanar.

公开(公告)号：US20230191547A1

公开(公告)日：2023-06-22

申请号：US17940265

申请日：2022-09-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongdu KIM ,  Sunghyup KIM ,  Hyeonjin KIM ,  Jonggu LEE ,  Dongkyeng HAN

IPC: B23Q3/15 ,  H01L21/683

CPC classification number: B23Q3/15 ,  H01L21/6833

Abstract: An apparatus includes a chuck having an upper surface configured to support a substrate; a fixing unit configured to generate chucking force to fix the substrate to the chuck in a first perpendicular direction and applying the chucking force to the substrate; and a controller configured to divide the chuck into a plurality of zones on a plane perpendicular to the first direction, based on reference overlay distribution corresponding to a degree of overlay deterioration when the substrate is fixed to the upper surface of the chuck, and individually control respective magnitudes of the chucking force applied to each of the plurality of zones. The controller is configured to reduce a magnitude of chucking force applied to a zone including a region having a high degree of overlay deterioration, among the plurality of zones, in the reference overlay distribution.

公开(公告)号：US20220113642A1

公开(公告)日：2022-04-14

申请号：US17555985

申请日：2021-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup KIM ,  Ho YU ,  Jeonggil KIM ,  Minseok CHOI

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US20210116802A1

公开(公告)日：2021-04-22

申请号：US16922328

申请日：2020-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinhwan LEE ,  Jeonggil KIM ,  Sunghyup KIM

IPC: G03F1/64

Abstract: A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.