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公开(公告)号：US20200241353A1
公开(公告)日：2020-07-30
申请号：US16777176
申请日：2020-01-30
Applicant: SAMSUNG ELECTRONICS CO., LTD. , THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY
Inventor： Sunghoon LEE , Mark L. BRONGERSMA , Brandon BORN
IPC: G02F1/1335 , G02B5/18 , G02B5/30 , G02B27/01
Abstract: Provided are a grating device, a screen including the grating device, a method of manufacturing the screen, and a display apparatus including the screen. The grating device includes a transparent substrate and a diffraction grating arranged on the transparent substrate, the diffraction grating includes a plurality of meta-diffraction patterns, and each meta-diffraction pattern has a curved shape with a center of curvature provided in a direction parallel to the substrate. The screen includes a first polarizer, a second polarizer arranged next to the first polarizer, and a diffraction grating that is transparent to polarized light that has passed through the second polarizer and reflects polarized light having a polarization direction perpendicular to the polarized light, wherein the diffraction grating includes a plurality of meta-diffraction patterns, each meta-diffraction pattern having a curved shape with a center of curvature positioned in a travelling direction of incident light.
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公开(公告)号：US20190035157A1
公开(公告)日：2019-01-31
申请号：US16046033
申请日：2018-07-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaeseung CHUNG , Dongouk KIM , Joonyong PARK , Geeyoung SUNG , Bongsu SHIN , Sunghoon LEE , Hongseok LEE
Abstract: Provided are head-up display apparatuses and operating methods thereof. The head-up display apparatus simultaneously outputs a plurality of object images on different regions from each other on a screen, generates, by using an optical characteristic, depth information with respect to the object images to sequentially change depth information of at least two of the object images, and converges the object images having depth information and the reality environment into a single region by changing at least one of an optical path of the object images having the depth information and an optical path of the reality environment.
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公开(公告)号：US20180188439A1
公开(公告)日：2018-07-05
申请号：US15860202
申请日：2018-01-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dongouk KIM , Joonyong PARK , Jaeseung CHUNG , Alexander V. MOROZOV , Bongsu SHIN , Jihyun BAE , Seokho SONG , Dongsik SHIM , Sunghoon LEE
IPC: F21V8/00
CPC classification number: G02B6/0038 , G02B6/0055 , G02B6/0061 , G02B6/0068
Abstract: Provided are a directional backlight unit and an image display apparatus including the same. The directional backlight unit includes at least one light source, a light guide plate arranged at a side of the at least one light source and configured to guide light emitted from the at least one light source by total reflection, a plurality of diffraction gratings arranged in a pattern at a surface of the light guide plate and configured to diffract the light and to emit the light diffracted by the plurality of diffraction gratings at a predetermined angle from a front surface; and a mirror arranged at a rear surface of the light guide plate and configured to reflect the light diffracted by the plurality of diffraction gratings toward the light guide plate, the rear surface of the light guide plate being opposite to the front surface of the light guide plate.
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公开(公告)号：US20180113242A1
公开(公告)日：2018-04-26
申请号：US15646836
申请日：2017-07-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sunghoon LEE , Joonyong PARK , Dongouk KIM , Jihyun BAE , Bongsu SHIN , Dongsik SHIM , Jaeseung CHUNG
IPC: G02B5/30
Abstract: A method for manufacturing a pattern structure includes preparing a wafer that has a plurality of fine patterns, generating a first trench by processing the wafer from a first surface to a first depth, and generating a second trench connected to the first trench by processing the wafer from a second surface which is opposite to the first surface to a second depth, thereby cutting the wafer.
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15.发明申请公开(公告)号：US20170205554A1
公开(公告)日：2017-07-20
申请号：US15351950
申请日：2016-11-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seogwoo HONG , Dongsik SHIM , Dongouk KIM , Hyunjoon KIM , Joonyong PARK , Jihyun BAE , Bongsu SHIN , Sunghoon LEE , Jaeseung CHUNG
CPC classification number: G02B6/0031 , B29C65/48 , B29L2031/3475 , G02B6/0038 , G02B6/0065 , G02B6/0068 , G02B6/0088 , G02B27/22 , H04N13/32 , H04N13/39 , H04N2213/001
Abstract: A display apparatus including a directional backlight unit and a method of assembling the display apparatus are disclosed. The display apparatus includes an auxiliary structure coupled to an input coupler and a switch panel module.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20170052312A1
公开(公告)日：2017-02-23
申请号：US15154343
申请日：2016-05-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Taesung JUNG , Dongouk KIM , Joonyong PARK , Jihyun BAE , Bongsu SHIN , Sunghoon LEE , Jaeseung CHUNG , Alexander V. MOROZOV
CPC classification number: G02B6/0068 , G02B6/0036 , G02B6/0058 , G02B6/0065 , G02B27/2214
Abstract: A curved backlight unit is provided. The backlight unit includes a curved light guide plate having a curvature, a first light source configured to provide a first illumination light to a first surface of the curved light guide plate, an array of a plurality of different grating elements disposed on a second surface of the curved light guide plate and configured to allow the first illumination light to exit the curved light guide plate from the second surface, and a second light source configured to provide a second illumination light to a third surface facing the second surface of the curved light guide plate. The curved light guide plate includes a first area configured to allow the second illumination light to exist at a first intensity and a second area configured to allow the second illumination light to exist at a second intensity that is less than the first intensity
Abstract translation: 提供了一个弯曲的背光单元。 背光单元包括具有曲率的弯曲导光板，第一光源被配置为向弯曲导光板的第一表面提供第一照明光，设置在第二表面的多个不同光栅元件的阵列 所述弯曲导光板被配置为允许所述第一照明光从所述第二表面离开所述弯曲导光板，以及第二光源，被配置为向与所述弯曲光导的第二表面相对的第三表面提供第二照明光 盘子。 弯曲的导光板包括第一区域，其被配置为允许第二照明光以第一强度存在，第二区域被配置为允许第二照明光以小于第一强度的第二强度存在
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公开(公告)号：US20170000358A1
公开(公告)日：2017-01-05
申请号：US15200293
申请日：2016-07-01
Inventor： Jihyun BAE , Nae-Eung LEE , Doil KIM , Thanh Tien NGUYEN , Sunghoon LEE , Sanghun JEON
IPC: A61B5/0205 , G01K7/16 , G01L9/00
CPC classification number: H01L29/78 , A61B5/01 , A61B5/02055 , A61B5/02108 , A61B5/02444 , A61B5/0245 , A61B5/6802 , A61B2562/0247 , A61B2562/0276 , A61B2562/028 , A61B2562/046 , A61B2562/125 , G01K7/01 , G01K7/16 , G01L9/0098 , G01L19/0092
Abstract: A flexible bimodal sensor includes a gate electrode; a flexible substrate; a source electrode disposed on the flexible substrate; a drain electrode disposed on the flexible substrate apart from the source electrode; a channel layer disposed on the source electrode and the drain electrode and a portion of the flexible substrate between the source electrode and the drain electrode; and a gate insulating layer comprising a plurality of protrusions, the gate insulating layer being disposed on the channel layer and arranged between the channel layer and the gate electrode. The drain electrode outputs a current signal simultaneously indicating a temperature value and a pressure value sensed by the flexible bimodal sensor.
Abstract translation: 柔性双模传感器包括栅电极; 柔性基板; 设置在柔性基板上的源电极; 设置在与源电极分开的柔性基板上的漏电极; 设置在源电极和漏电极上的沟道层以及在源电极和漏极之间的柔性基板的一部分; 以及包括多个突起的栅极绝缘层，所述栅极绝缘层设置在所述沟道层上并且布置在所述沟道层和所述栅电极之间。 漏极电极同时输出表示由柔性双峰传感器感测的温度值和压力值的电流信号。
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公开(公告)号：US20200249384A1
公开(公告)日：2020-08-06
申请号：US16858129
申请日：2020-04-24
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sunghoon LEE , Joonyong PARK , Dongouk KIM , Jihyun BAE , Bongsu SHIN , Dongsik SHIM , Jaeseung CHUNG
Abstract: A method for manufacturing a pattern structure includes preparing a wafer that has a plurality of fine patterns, generating a first trench by processing the wafer from a first surface to a first depth, and generating a second trench connected to the first trench by processing the wafer from a second surface which is opposite to the first surface to a second depth, thereby cutting the wafer.
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公开(公告)号：US20190113802A1
公开(公告)日：2019-04-18
申请号：US16103406
申请日：2018-08-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kanghee WON , Young KIM , Hoon SONG , Sunil KIM , Jungkwuen AN , Sunghoon LEE , Hongseok LEE , Chilsung CHOI
IPC: G02F1/1335 , G02F1/13363
Abstract: A beam deflector includes a first wavelength selective polarizer configured to convert a polarization state of light in a first wavelength band into a first polarization state, a first liquid crystal deflector including liquid crystal molecules and an optical path change surface to deflect light incident from the first wavelength selective polarizer, and a controller configured to control the first liquid crystal deflector to adjust an angle of the first optical path change surface.
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公开(公告)号：US20170219747A1
公开(公告)日：2017-08-03
申请号：US15337648
申请日：2016-10-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sunghoon LEE , Jaeseung CHUNG , Dongouk KIM , Hyunjoon KIM , Joonyong PARK , Jihyun BAE , Bongsu SHIN , Dongsik SHIM , Seogwoo HONG
IPC: G02B5/18 , F21V8/00 , G02F1/1335
CPC classification number: G02B5/1852 , B23K26/0006 , B23K26/364 , B23K26/38 , B23K26/402 , B23K26/53 , B23K2101/40 , B23K2103/54 , B23K2103/56 , G02B5/18 , G02B5/3058 , G02B6/0038 , G02F1/133512 , G02F1/133528 , G02F1/133606 , G02F2001/133548 , G02F2001/133607 , G03F7/0002 , G03F7/0007
Abstract: A method of manufacturing a pattern structure is provided. The method includes forming a fine pattern on a wafer, cutting the wafer by irradiating the wafer with a laser while changing a focal depth of the laser, thereby forming a unit pattern structure having a fine pattern, and bonding cutting surfaces of at least two unit pattern structures. The cutting of the wafer comprises moving a focal position of the laser in a horizontal direction and changing the focal depth of the laser, such that the unit pattern structure has a cutting surface profile in which a first surface of the unit pattern structure on which the fine pattern is formed protrudes, in a direction substantially parallel to the first surface, from a second surface of the unit pattern structure that is opposite to the first surface.
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