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34 条记录 (耗时 0.025 秒)

    Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
    17.
    发明授权
    Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus 失效
    掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法

    公开(公告)号：US5544213A

    公开(公告)日：1996-08-06

    申请号：US343961

    申请日：1994-11-17

    申请人： Yuji Chiba ,  Shinichi Hara

    发明人： Yuji Chiba ,  Shinichi Hara

    IPC分类号： G03F1/66 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F1/22 ,  G03F7/707 ,  G21K1/06

    摘要： V-shaped linear groove portions are formed at regular intervals and at three positions (with 120.degree. pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.

    摘要翻译： V形线状槽部以规定的间隔，在与环状支撑框架同心的三个位置（120度的间距）上形成为沿径向延伸的X射线掩模。 另一方面，在掩模卡盘上的三个位置配置作为突出部的各自具有球形前端的安装件。 通过接合相应的V形直线槽部分和突出部分，将掩模在三个位置保持在掩模卡盘上。

    Exposure apparatus and device manufacturing method using the same
    18.
    发明授权
    Exposure apparatus and device manufacturing method using the same 失效
    曝光装置及其制造方法

    公开(公告)号：US5930324A

    公开(公告)日：1999-07-27

    申请号：US831867

    申请日：1997-04-02

    申请人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

    发明人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30

    CPC分类号： G03F7/702 ,  G03F7/70691 ,  G03F7/70841 ,  G03F9/7015

    摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.

    摘要翻译： 一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件， 由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态 测量部分相对于辐射光的光轴。

    Elevator supervisory system for managing operating condition data
    19.
    发明授权
    Elevator supervisory system for managing operating condition data 失效
    电梯监控系统，用于管理运行状态数据

    公开(公告)号：US07575103B2

    公开(公告)日：2009-08-18

    申请号：US10574606

    申请日：2004-08-11

    申请人： Yuji Chiba

    发明人： Yuji Chiba

    IPC分类号： B66B1/34

    CPC分类号： B66B5/0012

    摘要： An elevator supervisory system capable of managing abnormality data, operating condition data and car interior video data in association with one another, so that this data can be displayed in association with one another upon the occurrence of an abnormality.

    摘要翻译： 一种能够彼此相关联地管理异常数据，操作条件数据和汽车内部视频数据的电梯监控系统，使得可以在发生异常时相关联地显示该数据。

    Radiation reduction exposure apparatus and method of manufacturing semiconductor device
    20.
    发明授权
    Radiation reduction exposure apparatus and method of manufacturing semiconductor device 失效
    减光曝光装置及半导体装置的制造方法

    公开(公告)号：US6014421A

    公开(公告)日：2000-01-11

    申请号：US847404

    申请日：1997-04-24

    申请人： Yuji Chiba ,  Masami Tsukamoto

    发明人： Yuji Chiba ,  Masami Tsukamoto

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/70233 ,  G03F7/70283 ,  G03F7/703 ,  G03F7/70358 ,  G03F7/70708 ,  G03F7/70725

    摘要： An X-ray reduction exposure apparatus which provides a preferable image forming system in an entire mask surface area of a reflection type mask, can reduce curvature of the field and astigmatism of the transfer image even in scan exposure and, therefore, can obtain high transfer precision, and the apparatus contributes to the manufacture of a semiconductor element having high reliability. The X-ray reduction exposure apparatus has, as a characteristic feature, a drive mechanism for driving a mask scan stage substantially along the curvature surface of the mask. This drive mechanism is constituted by a main drive section (linear motor or the like) linearly driven in a direction corresponding to the moving direction of a mask scan stage and a sub-drive section (actuator or the like) driven perpendicularly to the drive direction, otherwise, constituted by a main drive section and a guide having a shape which is the same as the curvature surface shape of the mask.

    摘要翻译： 在反射型掩模的整个掩模表面区域中提供优选的图像形成系统的X射线减少曝光装置即使在扫描曝光中也可以减小转印图像的曲率和像散，因此可以获得高转印 并且该装置有助于制造具有高可靠性的半导体元件。 作为特征，X射线减少曝光装置具有用于基本上沿着掩模的曲率表面驱动掩模扫描台的驱动机构。 该驱动机构由与驱动方向垂直驱动的荫罩扫描台和副驱动部（致动器等）的移动方向对应的方向直线驱动的主驱动部（直线电机等）构成， 否则由主驱动部分和具有与掩模的曲率表面形状相同的形状的引导件构成。