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    Radiation reduction exposure apparatus and method of manufacturing semiconductor device
    1.
    发明授权
    Radiation reduction exposure apparatus and method of manufacturing semiconductor device 失效
    减光曝光装置及半导体装置的制造方法

    公开(公告)号：US6014421A

    公开(公告)日：2000-01-11

    申请号：US847404

    申请日：1997-04-24

    申请人： Yuji Chiba ,  Masami Tsukamoto

    发明人： Yuji Chiba ,  Masami Tsukamoto

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/70233 ,  G03F7/70283 ,  G03F7/703 ,  G03F7/70358 ,  G03F7/70708 ,  G03F7/70725

    摘要： An X-ray reduction exposure apparatus which provides a preferable image forming system in an entire mask surface area of a reflection type mask, can reduce curvature of the field and astigmatism of the transfer image even in scan exposure and, therefore, can obtain high transfer precision, and the apparatus contributes to the manufacture of a semiconductor element having high reliability. The X-ray reduction exposure apparatus has, as a characteristic feature, a drive mechanism for driving a mask scan stage substantially along the curvature surface of the mask. This drive mechanism is constituted by a main drive section (linear motor or the like) linearly driven in a direction corresponding to the moving direction of a mask scan stage and a sub-drive section (actuator or the like) driven perpendicularly to the drive direction, otherwise, constituted by a main drive section and a guide having a shape which is the same as the curvature surface shape of the mask.

    摘要翻译： 在反射型掩模的整个掩模表面区域中提供优选的图像形成系统的X射线减少曝光装置即使在扫描曝光中也可以减小转印图像的曲率和像散，因此可以获得高转印 并且该装置有助于制造具有高可靠性的半导体元件。 作为特征，X射线减少曝光装置具有用于基本上沿着掩模的曲率表面驱动掩模扫描台的驱动机构。 该驱动机构由与驱动方向垂直驱动的荫罩扫描台和副驱动部（致动器等）的移动方向对应的方向直线驱动的主驱动部（直线电机等）构成， 否则由主驱动部分和具有与掩模的曲率表面形状相同的形状的引导件构成。

    X-ray illumination optical system and x-ray reduction exposure apparatus
    2.
    发明授权
    X-ray illumination optical system and x-ray reduction exposure apparatus 失效
    X射线照射光学系统和X射线减少曝光装置

    公开(公告)号：US06504896B2

    公开(公告)日：2003-01-07

    申请号：US08917373

    申请日：1997-08-26

    申请人： Akira Miyake ,  Masami Tsukamoto

    发明人： Akira Miyake ,  Masami Tsukamoto

    IPC分类号： G21K500

    CPC分类号： G03F7/70058 ,  G21K1/06

    摘要： An X-ray illumination optical system includes a reflection type integrator, having cylindrical surfaces, for reflecting an X-ray beam, and a concave mirror, including a rotational parabolic surface mirror, for reflecting the X-ray beam reflected by the integrator and for illuminating an object with the X-ray beam.

    摘要翻译： X射线照明光学系统包括具有用于反射X射线束的圆柱面的反射型积分器和包括旋转抛物面镜的凹面镜，用于反射由积分器反射的X射线束，并且 用X射线束照射物体。

    X-ray reduction exposure apparatus and device manufacturing method using the same
    3.
    发明授权
    X-ray reduction exposure apparatus and device manufacturing method using the same 失效
    X射线减少曝光装置及其制造方法

    公开(公告)号：US5995582A

    公开(公告)日：1999-11-30

    申请号：US835721

    申请日：1997-04-10

    申请人： Shigeru Terashima ,  Masami Tsukamoto

    发明人： Shigeru Terashima ,  Masami Tsukamoto

    IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F7/70891 ,  G21K1/06

    摘要： A deflection mirror is disposed before an X-ray mask so as to reflect an X-ray beam and to project it to the X-ray mask. The X-ray mask is disposed opposed to a wafer with a distance D therebetween, and the X-ray beam reflected by the X-ray mask is projected onto the wafer through a reduction projection optical system. The deflecting mirror is disposed, in an example, at a position satisfying a relation D>L>d/(tan .delta.1+tan .delta.2) where L is the distance from the X-ray mask to an edge of the deflection mirror closer to the path of the X-ray beam reflected by the X-ray mask, d is the width of irradiation of the X-ray beam upon the X-ray mask, and .delta.1 and .delta.2 are incidence angles of the X-ray beam at upper and lower edges of the irradiation width d, respectively, upon the X-ray mask. This assures a compact structure wherein, even when a wafer of a large diameter is used, illumination light to the mask is not intercepted.

    摘要翻译： 偏转镜设置在X射线掩模之前，以便反射X射线束并将其投影到X射线掩模。 X射线掩模与其间具有距离D的晶片相对设置，并且由X射线掩模反射的X射线束通过还原投影光学系统投影到晶片上。 偏转镜例如设置在满足关系D> L> d /（tanδ1 +tanδ2）的位置处，其中L是从X射线掩模到偏转镜的边缘的距离更近 到由X射线掩模反射的X射线束的路径，d是X射线掩模上的X射线束的照射宽度，δ1和δ2是X射线的入射角 在X射线掩模上分别照射宽度d的上边缘和下边缘。 这确保了紧凑的结构，其中即使当使用大直径的晶片时，不遮挡对掩模的照明光。

    X-ray illumination optical system and x-ray reduction exposure apparatus
    5.
    发明申请
    X-ray illumination optical system and x-ray reduction exposure apparatus 有权
    X射线照射光学系统和X射线减少曝光装置

    公开(公告)号：US20050031072A1

    公开(公告)日：2005-02-10

    申请号：US10930746

    申请日：2004-09-01

    申请人： Akira Miyake ,  Masami Tsukamoto

    发明人： Akira Miyake ,  Masami Tsukamoto

    IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F7/70058 ,  G21K1/06

    摘要： An illumination optical system for illuminating a surface to be illuminated. The illumination optical system includes a mirror having a surface effective to shape X-rays from a source into X-rays having an arcuate sectional shape, and an optical system for illuminating the surface to be illuminated, with the X-rays having an arcuate sectional shape from the mirror and in an oblique direction with respect to that surface.

    摘要翻译： 一种用于照射要被照明的表面的照明光学系统。 照明光学系统包括具有有效地将来自源的X射线成形为具有弓形截面形状的X射线的表面的反射镜，以及用于照射被照射的表面的光学系统，其中X射线具有弓形截面 形状，并且相对于该表面倾斜。

    X-ray illumination optical system and X-ray reduction exposure apparatus
    6.
    发明授权
    X-ray illumination optical system and X-ray reduction exposure apparatus 失效
    X射线照射光学系统和X射线照射装置

    公开(公告)号：US06834098B2

    公开(公告)日：2004-12-21

    申请号：US10119707

    申请日：2002-04-11

    申请人： Akira Miyake ,  Masami Tsukamoto

    发明人： Akira Miyake ,  Masami Tsukamoto

    IPC分类号： G21K500

    CPC分类号： G03F7/70058 ,  G21K1/06

    摘要： An X-ray illumination optical system for an X-ray reduction projection exposure apparatus includes an oblique projection reflection integrator having a reflection surface provided by a plurality of small cylindrical surfaces arrayed in parallel, to perform Koehler illumination of a region of arcuate shape. It enables X-ray illumination of only an arcuate region and reduces loss of light quantity and exposure time.

    摘要翻译： 用于X射线折射投影曝光装置的X射线照射光学系统包括：倾斜投影反射积分器，具有由平行排列的多个小圆柱面提供的反射面，以进行弓形区域的科勒照明。 它能够仅对弓形区域进行X射线照射，并减少光量和曝光时间的损失。

    Laminating film and lamination process using the same
    7.
    发明授权
    Laminating film and lamination process using the same 失效
    层压膜和层压工艺使用相同

    公开(公告)号：US06802925B2

    公开(公告)日：2004-10-12

    申请号：US10230220

    申请日：2002-08-29

    申请人： Masaya Kobayashi ,  Toru Nagata ,  Kenji Suzuki ,  Masami Tsukamoto

    发明人： Masaya Kobayashi ,  Toru Nagata ,  Kenji Suzuki ,  Masami Tsukamoto

    IPC分类号： B32B3120

    CPC分类号： B41M7/0027 ,  B41M5/46 ,  Y10S428/914 ,  Y10T428/24802 ,  Y10T428/265 ,  Y10T428/2813 ,  Y10T428/2848

    摘要： The present invention provides a laminating film which has a thin base material processable with a low energy and a protection layer capable of giving a high optical density and a high glossiness to a printed image by lamination, and to provide a process for lamination with the laminating film. The laminating film of the present invention comprises a base material, and an image protection layer formed on the base material and having at least an adhesion layer capable of adhering to an image surface, wherein the base material has a thickness ranging from 1.5 to 6.0 &mgr;m and has an arithmetic average roughness (Ra) of not more than 50 nm and a ten point height of roughness profile (Rz) ranging from 1200 nm to 2000 nm according to JIS B0601.

    摘要翻译： 本发明提供一种层压膜，其具有能够以低能量加工的薄基材和能够通过层压赋予印刷图像高的光密度和高光泽度的保护层，并提供与层压 电影。 本发明的层压膜包括基材和形成在基材上的图像保护层，并且至少具有能够附着到图像表面的粘合层，其中基材的厚度为1.5-6.0μm 并且根据JIS B0601具有不大于50nm的算术平均粗糙度（Ra）和在1200nm至2000nm范围内的十点高度的粗糙度轮廓（Rz）。

    X-ray projection exposure apparatus and a device manufacturing method
    8.
    发明授权
    X-ray projection exposure apparatus and a device manufacturing method 失效

    公开(公告)号：US06084938A

    公开(公告)日：2000-07-04

    申请号：US813349

    申请日：1997-03-07

    申请人： Shinichi Hara ,  Masami Tsukamoto

    发明人： Shinichi Hara ,  Masami Tsukamoto

    IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K5/10 ,  H01L21/027 ,  H01L21/683 ,  G21K5/00

    CPC分类号： G03F7/70708 ,  G03F7/70875 ,  G21K5/10

    摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

    Reflection type mask structure and exposure apparatus using the same
    9.
    发明授权
    Reflection type mask structure and exposure apparatus using the same 失效
    反射型掩模结构和使用其的曝光装置

    公开(公告)号：US5889758A

    公开(公告)日：1999-03-30

    申请号：US801463

    申请日：1997-02-18

    申请人： Hiroshi Maehara ,  Masami Tsukamoto

    发明人： Hiroshi Maehara ,  Masami Tsukamoto

    IPC分类号： G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/24 ,  G03F1/60 ,  H01L21/0278

    摘要： A reflection type X-ray mask structure includes an X-ray absorptive material pattern, an X-ray reflective multilayered film for reflecting X-rays, and a supporting substrate for supporting the X-ray reflective multilayered film, wherein an X-ray reflectivity of a portion other than a pattern region is lower than that of the pattern region. With this reflection type X-ray mask structure, step-and-repeat exposure or step-and-scan exposure with a semiconductor exposure apparatus does not cause undesirable multiple exposure at a boundary portion between juxtaposed exposure regions on a wafer.

    摘要翻译： 反射型X射线掩模结构包括X射线吸收材料图案，用于反射X射线的X射线反射多层膜和用于支撑X射线反射多层膜的支撑衬底，其中X射线反射率 的图案区域以外的部分低于图案区域。 利用该反射型X射线掩模结构，利用半导体曝光装置的分步重复曝光或步进扫描曝光不会在晶片上并置的曝光区域之间的边界部分产生不期望的多次曝光。