HIGH TEMPERATURE RESISTANT SOLID STATE PRESSURE SENSOR
    11.
    发明申请
    HIGH TEMPERATURE RESISTANT SOLID STATE PRESSURE SENSOR 有权
    耐高温固体压力传感器

    公开(公告)号:US20100155866A1

    公开(公告)日:2010-06-24

    申请号:US12579123

    申请日:2009-10-14

    Abstract: A harsh environment transducer including a substrate having a first surface and a second surface, wherein the second surface is in communication with the environment. The transducer includes a device layer sensor means located on the substrate for measuring a parameter associated with the environment. The sensor means including a single crystal semiconductor material having a thickness of less than about 0.5 microns. The transducer further includes an output contact located on the substrate and in electrical communication with the sensor means. The transducer includes a package having an internal package space and a port for communication with the environment. The package receives the substrate in the internal package space such that the first surface of the substrate is substantially isolated from the environment and the second surface of the substrate is substantially exposed to the environment through the port. The transducer further includes a connecting component coupled to the package and a wire electrically connecting the connecting component and the output contact such that an output of the sensor means can be communicated. An external surface of the wire is substantially platinum, and an external surface of at least one of the output contact and the connecting component is substantially platinum.

    Abstract translation: 一种恶劣环境换能器,包括具有第一表面和第二表面的基底,其中第二表面与环境连通。 换能器包括位于基板上的用于测量与环境有关的参数的装置层传感器装置。 传感器装置包括厚度小于约0.5微米的单晶半导体材料。 换能器还包括位于基板上并与传感器装置电连通的输出触点。 换能器包括具有内部封装空间和用于与环境通信的端口的封装。 该封装在内部封装空间中接收衬底,使得衬底的第一表面基本上与环境隔离,并且衬底的第二表面基本上通过端口暴露于环境。 传感器还包括耦合到封装件的连接部件和将连接部件和输出触头电连接的导线,使得传感器装置的输出可以被传送。 导线的外表面基本上是铂,并且输出触点和连接部件中的至少一个的外表面基本上是铂。

    Method of manufacture of a semiconductor structure
    13.
    发明授权
    Method of manufacture of a semiconductor structure 失效
    半导体结构的制造方法

    公开(公告)号:US06773951B2

    公开(公告)日:2004-08-10

    申请号:US10278611

    申请日:2002-10-23

    CPC classification number: H01L21/76254 H01L21/7602 Y10S438/931

    Abstract: A method of preparing a semiconductor structure comprises: (a) providing a first material comprising (i) a first wafer comprising silicon, (ii) at least one SiC conversion layer obtained by converting a portion of the silicon to SiC, (iii) at least one layer of non-indigenous SiC applied to the conversion layer, and (iv) at least one oxide layer applied to the non-indigenous SiC layer; (b) implanting ions in a region of the non-indigenous SiC layer, thereby establishing an implant region therein which defines a first portion of the non-indigenous SiC layer and a second portion of the non-indigenous SiC layer; (c) providing at least one additional material comprising (i) a second wafer comprising silicon, and (ii) an oxide layer applied to a face of the second wafer; (d) bonding the oxide layer of the first material and oxide layer of the material to provide an assembly of the first material and second material; and (e) separating at the implant region the second portion of the non-indigenous SiC layer from the first portion of the non-indigenous SiC layer to provide. The resultant semiconductor structure comprises a base wafer which may be a Si wafer, an insulating oxide layer which may be SiO2 adjacent to the base wafer, and an active top layer of non-indigenous SiC. The semiconductor structure may be used to fabricate integrated electronics, pressure sensors, temperature sensors or other instrumentation which may be used in high temperature environments such as aircraft engines.

    Abstract translation: 制备半导体结构的方法包括:(a)提供第一材料,其包括(i)包含硅的第一晶片,(ii)通过将硅的一部分转化为SiC而获得的至少一个SiC转换层,(iii) 至少一层非原生SiC施加到转化层,和(iv)施加到非本征SiC层的至少一个氧化物层;(b)在非本征SiC层的区域中注入离子,从而建立 其中限定非本地SiC层的第一部分和非本征SiC层的第二部分的植入区域;(c)提供至少一种附加材料,其包括(i)包含硅的第二晶片和(ii) )施加到所述第二晶片的表面的氧化物层;(d)将所述第一材料的氧化物层和所述材料的氧化物层粘合以提供所述第一材料和第二材料的组合; 和(e)在植入区域处分离非本地SiC层的第二部分与非本征SiC层的第一部分以提供。 所得的半导体结构包括可以是Si晶片的基底晶片,可以与基底晶片相邻的SiO 2的绝缘氧化物层和非本征SiC的有源顶层。 半导体结构可用于制造集成的电子设备,压力传感器,温度传感器或其他可用于诸如飞机发动机的高温环境中的仪器。

    Method of preparing a semiconductor using ion implantation in a SiC layer
    14.
    发明授权
    Method of preparing a semiconductor using ion implantation in a SiC layer 失效
    在SiC层中使用离子注入制备半导体的方法

    公开(公告)号:US06566158B2

    公开(公告)日:2003-05-20

    申请号:US09932001

    申请日:2001-08-17

    CPC classification number: H01L21/76254 H01L21/7602 Y10S438/931

    Abstract: A method of preparing a semiconductor using ion implantation comprises: (a) providing a first material comprising (i) a first Si wafer, (ii) at least one indigenous SiC layer, (iii) at least one non-indigenous SiC layer applied to the indigenous SiC layer, and (iv) at least one oxide layer applied to the non-indigenous SiC layer; (b) implanting ions in the non-indigenous SiC layer, thereby establishing an implant region which defines first and second portions of the non-indigenous SiC layer; (c) providing another material comprising (i) a second Si wafer, and (ii) an oxide layer applied to a face of the second wafer; (d) providing an assembly by bonding the oxide layers of the first material and the other material; and (e) separating the first and second portions of the non-indigenous SiC layer at the implant region.

    Abstract translation: 使用离子注入制备半导体的方法包括:(a)提供第一材料,其包括(i)第一Si晶片,(ii)至少一个本征SiC层,(iii)至少一个非本征SiC层施加到 本地SiC层,和(iv)施加到非本征SiC层的至少一个氧化物层;(b)在非本征SiC层中注入离子,由此建立植入区域,其限定非本征SiC层的第一和第二部分, - 本土SiC层;(c)提供另外的材料,其包括(i)第二硅晶片,和(ii)施加到所述第二晶片的表面的氧化物层;(d)通过将所述第一晶片的氧化物层 材料和其他材料; 和(e)在植入区域处分离非本征SiC层的第一和第二部分。

    METHOD FOR MAKING A TRANSDUCER
    17.
    发明申请
    METHOD FOR MAKING A TRANSDUCER 有权
    制造传感器的方法

    公开(公告)号:US20090203163A1

    公开(公告)日:2009-08-13

    申请号:US12426310

    申请日:2009-04-20

    Abstract: A method for forming a transducer including the step of providing a semiconductor-on-insulator wafer including first and second semiconductor layers separated by an electrically insulating layer. The method further includes depositing or growing a piezoelectric film or piezoresistive film on the wafer, depositing or growing an electrically conductive material on the piezoelectric or piezoresistive film to form at least one electrode, and depositing or growing a bonding layer including an electrical connection portion that is located on or is electrically coupled to the electrode. The method further includes the step of providing a ceramic substrate having a bonding layer located thereon, the bonding layer including an electrical connection portion and being patterned in a manner to generally match the bonding layer of the semiconductor-on-insulator wafer. The method also includes causing the bonding layer of the semiconductor-on-insulator wafer and the bonding layer of the substrate to bond together to thereby mechanically and electrically couple the semiconductor-on-insulator wafer and the substrate to form the transducer, wherein the electrical connection portions of the bonding layers of the semiconductor-on-insulator wafer and the substrate are fluidly isolated from the surrounding environment by the bonding layers.

    Abstract translation: 一种用于形成换能器的方法,包括提供绝缘体上半导体晶片的步骤,该晶片包括由电绝缘层分隔的第一和第二半导体层。 该方法还包括在晶片上沉积或生长压电薄膜或压阻薄膜,在压电或压阻薄膜上沉积或生长导电材料以形成至少一个电极,以及沉积或生长包括电连接部分的粘合层, 位于电极上或与电极电耦合。 该方法还包括提供具有位于其上的结合层的陶瓷基板的步骤,所述接合层包括电连接部分并且以通常匹配绝缘体上半导体晶片的结合层的方式被图案化。 该方法还包括使绝缘体上半导体晶片的接合层和衬底的接合层接合在一起,从而机械地和电耦合绝缘体上半导体晶片和衬底以形成换能器,其中电气 绝缘体上半导体晶片和衬底的结合层的连接部分通过结合层与周围环境流体隔离。

    Pendulous accelerometer with balanced gas damping
    19.
    发明申请
    Pendulous accelerometer with balanced gas damping 有权
    Pendulous加速度计具有均衡的气体阻尼

    公开(公告)号:US20090107238A1

    公开(公告)日:2009-04-30

    申请号:US11978090

    申请日:2007-10-26

    Applicant: Shuwen Guo

    Inventor: Shuwen Guo

    CPC classification number: G01P15/125 G01P15/0802 G01P15/131 G01P2015/0831

    Abstract: A pendulous capacitive accelerometer including a substrate having a substantially planar upper surface with an electrode section, and a sensing plate having a central anchor portion supported on the upper surface of the substrate to define a hinge axis. The sensing plate includes a solid proof mass on a first side of the central anchor portion and a substantially hollow proof mass on a second side of the central anchor portion, providing for reduced overall chip size and balanced gas damping. The solid proof mass has a first lower surface with a first electrode element thereon, and the substantially hollow proof mass has a second lower surface with a second electrode element thereon. Both the solid proof mass and the hollow proof mass have the same capacitive sensing area. The sensing plate rotates about the hinge axis relative to the upper surface of the substrate in response to an acceleration.

    Abstract translation: 一种下摆电容式加速度计,包括具有基本平坦的上表面的基板,具有电极部分,以及感测板,其具有支撑在基板的上表面上以限定铰链轴线的中心锚固部分。 感测板包括在中心锚固部分的第一侧上的固体质量块和在中心锚固部分的第二侧上的基本上中空的质量块,从而提供减小的整体芯片尺寸和平衡的气体阻尼。 固体质量体具有在其上具有第一电极元件的第一下表面,并且基本上中空的质量块具有在其上的第二电极元件的第二下表面。 固体质量块和中空质量块均具有相同的电容感应区域。 感测板响应于加速度相对于基板的上表面围绕铰链轴线旋转。

    Pressure sensor
    20.
    发明授权
    Pressure sensor 有权
    压力传感器

    公开(公告)号:US06928878B1

    公开(公告)日:2005-08-16

    申请号:US10952310

    申请日:2004-09-28

    Abstract: A pressure sensor including a movable component that is configured to move when the pressure sensor is exposed to differential pressure thereacross, and a pressure sensing component located on the movable component. The pressure sensing component includes an electrically conductive electron gas which changes its electrical resistance thereacross upon movement of the movable component. The pressure sensor is configured such that leads can be coupled to the pressure sensing component and the pressure sensing component can output a signal via the leads, the signal being related to a pressure to which the pressure sensor is exposed.

    Abstract translation: 一种压力传感器,包括被构造成当压力传感器暴露于其间的差压时移动的可移动部件以及位于可移动部件上的压力感测部件。 压力感测部件包括导电电子气体,其在可移动部件移动时改变其电阻。 压力传感器被配置为使得引线可以耦合到压力感测部件,并且压力感测部件可以经由引线输出信号,该信号与压力传感器暴露于的压力相关。

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