公开(公告)号：US20190254616A1

公开(公告)日：2019-08-22

申请号：US16402887

申请日：2019-05-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00 ,  A61B6/03 ,  H01J35/12 ,  H01J35/08

Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array.The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π or π/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.

公开(公告)号：US10352880B2

公开(公告)日：2019-07-16

申请号：US15605957

申请日：2017-05-26

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Srivatsan Seshadri ,  Alan Francis Lyon ,  David Vine

IPC: G21K7/00 ,  G01N23/04 ,  G01N23/20 ,  A61B6/00 ,  G21K1/02 ,  H01J35/08

Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.

公开(公告)号：US10349908B2

公开(公告)日：2019-07-16

申请号：US14943445

申请日：2015-11-17

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00 ,  A61B6/03 ,  H01J35/08 ,  H01J35/12

Abstract: An x-ray interferometric imaging system includes an x-ray source with a target having a plurality of discrete structures arranged in a periodic pattern. The system further includes a beam-splitting x-ray grating, a stage configured to hold an object to be imaged, and an x-ray detector having a two-dimensional array of x-ray detecting elements. The object is positioned between the beam-splitting x-ray grating and the x-ray detector, the x-ray detector is positioned to detect the x-rays diffracted by the beam-splitting x-ray grating and perturbed by the object to be imaged.

公开(公告)号：US20180144901A1

公开(公告)日：2018-05-24

申请号：US15783855

申请日：2017-10-13

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Charles Reynolds ,  Alan Francis Lyon

IPC: H01J35/10 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  G21K1/06

CPC classification number: G21K1/067 ,  G21K2201/064 ,  H01J35/105 ,  H01J35/108 ,  H01J35/14 ,  H01J35/26 ,  H01J35/30 ,  H01J2235/086 ,  H01J2235/088 ,  H01J2235/1204

Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

公开(公告)号：US09543109B2

公开(公告)日：2017-01-10

申请号：US14999147

申请日：2016-04-01

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: H01J35/08 ,  H01J35/10 ,  H01J35/18 ,  H01J35/14 ,  G21K1/06

CPC classification number: H01J35/106 ,  G21K1/06 ,  H01J35/08 ,  H01J35/12 ,  H01J35/14 ,  H01J35/18 ,  H01J2235/081 ,  H01J2235/086 ,  H01J2235/1204 ,  H01J2235/1291

Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved by aligning discrete x-ray sub-sources, or through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and in turn allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing the accumulation of x-rays from several microstructures to be aligned to appear to have a single origin, also known as “zero-angle” x-ray radiation.

Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过对齐离散x射线子源或通过使用包含与具有高导热性的基底紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这样可以更有效地将热量从X射线产生材料中拉出，并且进而允许以较高电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 微结构的方向允许使用轴上收集角，允许来自若干微结构的X射线的聚集被对准以看起来具有单个原点，也称为“零角”x射线辐射。

公开(公告)号：US20150117599A1

公开(公告)日：2015-04-30

申请号：US14527523

申请日：2014-10-29

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00

CPC classification number: A61B6/484 ,  A61B6/032 ,  A61B6/035 ,  A61B6/4007 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/502 ,  A61B6/508 ,  G21K2207/005 ,  H01J35/08 ,  H01J35/12

Abstract: We disclose an x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, and a means to translate the second grating G2 relative to the detector.In some embodiments, the structures are microstructures with lateral dimensions measured on the order of microns, and with a thickness on the order of one half of the electron penetration depth within the substrate. In some embodiments, the structures are formed within a regular array.

Abstract translation: 我们公开了一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个结构化的x射线子结构相干子源的靶。 该系统还包括分束光栅G1，其形成Talbot干涉图案，其可以是“ 移相光栅和X射线检测器将二维x射线强度转换为电子信号。 该系统还可以包括第二分析器光栅G2，其可以放置在检测器的前面以形成附加的干涉条纹，以及相对于检测器平移第二光栅G2的装置。 在一些实施例中，结构是具有测量的微米量级的横向尺寸并且厚度在衬底内的电子穿透深度的一半的微结构。 在一些实施例中，结构在规则阵列内形成。