摘要:
The invention relates to a vapour-deposition material for the production of optical layers of high refractive index which comprises titanium oxide and ytterbium oxide in a molar ratio of from 4:1 to 1:4, to a process for the preparation thereof, and to the use thereof.
摘要:
Process for the production of hydrophobic layers on optical substrates which have an alkaline earth metal fluoride or alkali metal fluoride layer as the outermost layer or consist of alkaline earth metal fluorides or alkali metal fluorides, by thermal vapor deposition with polyfluorohydrocarbons in a high vacuum.
摘要:
The invention relates to a vapour-deposition material for the production of optical layers of high refractive index which comprises titanium oxide and gadolinium oxide and/or dysprosium oxide, to a process for the preparation thereof, and to the use thereof.
摘要:
The invention relates to a vapour-deposition material for the production of optical layers of high refractive index which comprises titanium oxide and gadolinium oxide and/or dysprosium oxide, to a process for the preparation thereof, and to the use thereof.
摘要:
A vapor-deposition material for the production of high-refractive-index optical layers of titanium oxide, titanium and lanthanum oxide under reduced pressure comprising a sintered mixture having the composition TiOx+z*La2O3, where x=1.5 to 1.8 and z=10 to 65% by weight, based on the total weight of the mixture. The constituents of the mixture are in the range of 10 to 65% by weight of lanthanum oxide, 38 to 74% by weight of titanium oxide and 2 to 7% by weight of titanium.
摘要翻译:一种用于在减压下生产氧化钛,钛和氧化镧的高折射率光学层的气相沉积材料,包括具有TiO x + z * La 2 O 3组成的烧结混合物,其中x = 1.5至1.8和z = 10 至65重量%,基于混合物的总重量。 混合物的成分在10至65重量%的氧化镧,38至74重量%的氧化钛和2至7重量%的钛的范围内。
摘要:
The invention relates to a vapor-deposition material for the production of optical coatings of medium refractive index by deposition-coating of substrates in vacuo. The material is a compound of the formula La.sub.1-x Al.sub.1+x O.sub.3 where x=0 to 0.84.
摘要:
The invention relates to a vapor-deposition material for the production of high-refraction optical coatings by coating substrates in vacuo. The material is a compound of the formula La.sub.2 TiO.sub.7-x where x=from 0.3 to 0.7.