公开(公告)号：US20240101751A1

公开(公告)日：2024-03-28

申请号：US18274188

申请日：2022-01-27

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Kazuishi FUKUDA ,  Takayoshi KAWASAKI

IPC: C08G18/48 ,  B24B37/24 ,  C08G18/76 ,  C08L29/04

CPC classification number: C08G18/4883 ,  B24B37/24 ,  C08G18/7621 ,  C08L29/04

Abstract: The hollow microballoon of the invention includes a resin produced by polymerizing a polymerizing composition that contains a cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof and a polymerizable monomer other than the cyclic molecule having at least three side chains with a polymerizable functional group introduced into the terminal thereof. According to the invention, there are provided hollow microballoon capable of imparting not only polishing characteristics but also excellent durability to a CMP polishing pad using the hollow microballoon.

公开(公告)号：US20230365739A1

公开(公告)日：2023-11-16

申请号：US18019153

申请日：2021-08-04

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Kazuishi FUKUDA ,  Takayoshi KAWASAKI

IPC: C08G18/42 ,  C08G18/12 ,  B24B37/22 ,  B24B37/24 ,  C09K9/02 ,  C08G18/64 ,  C08K7/22 ,  C08G18/08 ,  C08G18/32

CPC classification number: C08G18/42 ,  C08G18/12 ,  B24B37/22 ,  B24B37/24 ,  C09K9/02 ,  C08G18/64 ,  C08K7/22 ,  C08G18/14 ,  C08G18/3243 ,  C08K2201/003 ,  C08G2101/00

Abstract: The present invention relates to a curable composition containing (A) a side chain-containing cyclic molecule in which three or more side chains each having a polymerizable functional group introduced at a terminal are introduced ((A) cyclic polyfunctional monomer), and (B) a polymerizable monomer having a polymerizable functional group polymerizable with the side chain-containing cyclic molecule ((B) another polymerizable monomer). The present invention provides a curable composition from which a cured article having high abrasion resistance and enabling exhibition of excellent mechanical properties and photochromic properties is obtained. In particular, the present invention can provide a curable composition from which a cured article suitable for use as a polishing pad or a photochromic spectacle lens can be obtained.

公开(公告)号：US20230265053A1

公开(公告)日：2023-08-24

申请号：US17927182

申请日：2021-05-27

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Takayoshi KAWASAKI

IPC: C07C309/18 ,  C07D233/58 ,  C08G18/38 ,  C08G18/08 ,  C08G18/10 ,  B24B37/24

CPC classification number: C07C309/18 ,  B24B37/24 ,  C07D233/58 ,  C08G18/10 ,  C08G18/0828 ,  C08G18/3857

Abstract: The polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt of the present invention is a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt having at least two active hydrogen groups in a molecule, and the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt has a quaternary ammonium salt skeleton of the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that includes an imidazole skeleton. According to the present invention, a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that is excellent in solubility and dispersibility in a polyurethane (urea) resin raw material, and a high effect of the hydrophilization of a polyurethane (urea) resin can be provided.

公开(公告)号：US20210070790A1

公开(公告)日：2021-03-11

申请号：US16980466

申请日：2019-03-14

Applicant: TOKUYAMA CORPORATION

Inventor： Takayoshi KAWASAKI ,  Junji MOMODA ,  Tomohiro KAWAMURA ,  Mayumi KISHI ,  Michihito NAKATANI

IPC: C07F9/94 ,  C08F220/06 ,  C08F212/08

Abstract: A bismuth compound which is little toxic, insoluble in a monomer, usable for optical purpose and used as a substitute for a lead compound, in which a phosphoric acid ester having a (meth)acrylic group(s) is bonded to bismuth, and a method of producing the bismuth compound by reacting bismuth (meth)acrylate or bismuth subsalicylate with a phosphoric acid ester having a (meth)acrylic group(s) and carrying out dehydration.

公开(公告)号：US20190263961A1

公开(公告)日：2019-08-29

申请号：US16344599

申请日：2017-11-16

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Takayoshi KAWASAKI ,  Junji MOMODA ,  Mitsuki TOCHI

IPC: C08G18/64 ,  C08G83/00 ,  C08G18/76 ,  C08G18/10 ,  C08G18/32

Abstract: To provide a urethane resin for sliding members which has high abrasion resistance and is considered that crosslinking points are uniformly dispersed so that molecular motion is suitably possible. Particularly, to provide the urethane resin can be advantageously used as a polishing pad.There is provided the urethane resin for polishing is obtained by polymerizing a polymerizable composition comprising (A) a polyrotaxane having a composite molecular structure formed by an axial molecule and a plurality of cyclic molecules clathrating the axial molecule and side chains having an active hydrogen group introduced into at least some of the cyclic molecules and (B) a polyiso(thio)cyanate compound.

公开(公告)号：US20230390890A1

公开(公告)日：2023-12-07

申请号：US18022700

申请日：2021-08-20

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Takayoshi KAWASAKI

IPC: B24B37/24 ,  C09G1/02 ,  C08G18/10 ,  C08G18/32 ,  C08J9/32

CPC classification number: B24B37/24 ,  C09G1/02 ,  C08G18/10 ,  C08J2205/10 ,  C08G18/3228 ,  C08J9/32 ,  C08G18/3206

Abstract: A microballoon according to the present invention contains, in a surface layer of the microballoon, a polymerizable functional group having reactivity with an iso(thio)cyanate group, and the microballoon has a particle diameter of 10 μm to 200 μm. When the microballoon according to the present invention is used in a CMP polishing pad, excellent polishing characteristics and excellent durability of the polishing pad can be exhibited.

公开(公告)号：US20230211454A1

公开(公告)日：2023-07-06

申请号：US17927669

申请日：2021-05-27

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Takayoshi KAWASAKI ,  Junji MOMODA ,  Mitsuki TOCHI

IPC: B24B37/22 ,  B24B37/24

CPC classification number: B24B37/22 ,  B24B37/24

Abstract: The CMP laminated polishing pad of the present invention includes at least a polishing layer and an under layer, wherein the under layer contains a resin obtained by polymerizing a polymerizable composition containing: (A) a polyrotaxane monomer having at least two polymerizable functional groups in a molecule; and (B) a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in a molecule. According to the present invention, a polishing pad having not only good wear resistance but also excellent polishing characteristics (high polishing rate, low scratch property, and high flatness) can be provided.

公开(公告)号：US20230151179A1

公开(公告)日：2023-05-18

申请号：US17915006

申请日：2021-03-31

Applicant: TOKUYAMA CORPORATION

Inventor： Yasutomo SHIMIZU ,  Takayoshi KAWASAKI

IPC: C08J9/32 ,  C08J9/00 ,  C08L75/02 ,  B24B37/24

CPC classification number: C08J9/32 ,  C08J9/0061 ,  C08L75/02 ,  B24B37/24 ,  C08J2375/02 ,  C08J2423/08 ,  C08J2461/28 ,  C08L2203/14 ,  C08L2205/03 ,  C08L2205/20

Abstract: The hollow microballoons for CMP polishing pad of the invention are formed of at least one resin selected from the group consisting of a melamine resin, a urea resin and an amide resin and have an average particle size of 1 to 100 μm. According to the invention, there can be provided hollow microballoons for CMP polishing pad, which, when used in CMP polishing pad, exhibit excellent polishing characteristics, and can stably produce CMP polishing pad even in production of CMP polishing pad.