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公开(公告)号：US20100203447A1
公开(公告)日：2010-08-12
申请号：US12701592
申请日：2010-02-07
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译： 辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。 树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。
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公开(公告)号：US07046474B2
公开(公告)日：2006-05-16
申请号：US10957011
申请日：2004-09-30
摘要： Embodiments of the invention prevent the magnetic head from dropping to the magnetic disk when it is retracted. If the power supply Vcc to the drive is interrupted, a power supply voltage detecting section detects that the power supply to the drive is interrupted. A control section sets switches to the ON state in order to discharge the charged retract capacitor and supply the discharge current to a voice coil. The control section retains the switches in the ON state for a period which is determined based on the discharge period specifying control data stored in a register and the count signal from a counter. A voice coil motor, to which the current is supplied, turns the actuator in the unloading direction to retract the actuator to the ramp.
摘要翻译： 本发明的实施例防止当磁头收回时磁头掉落到磁盘上。 如果驱动器的电源Vcc中断，则电源电压检测部检测到驱动器的电源被中断。 控制部将开关置于ON状态，以便对充电的收缩电容器进行放电，并将放电电流提供给音圈。 控制部分将开关保持在基于存储在寄存器中的放电周期指定控制数据和来自计数器的计数信号确定的周期。 提供电流的音圈电动机沿着卸载方向转动致动器，以将致动器缩回到斜坡。
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公开(公告)号：US20050262678A1
公开(公告)日：2005-12-01
申请号：US11141988
申请日：2005-05-31
申请人： Tatsuo Hayakawa , Takanori Kawakami
发明人： Tatsuo Hayakawa , Takanori Kawakami
CPC分类号： G11B33/121 , Y10T29/5363
摘要： Embodiments of the invention provide a retaining ring attaching device capable of improving assembling efficiency and a data storage device fabricating method. In one embodiment, a C ring attaching device included in a hard disk drive assembling apparatus expands a C ring, puts the expanded C ring on a pivot, and contracts the C ring on the pivot. The C ring attaching device moves chuck arms holding the C ring such that the C ring is moved so that a gap in the C ring moves away from the pivot while the C ring is being contracted.
摘要翻译： 本发明的实施例提供一种能够提高组装效率的保持环附接装置和数据存储装置的制造方法。 在一个实施例中，包括在硬盘驱动器组装装置中的C环连接装置扩展C环，将扩展的C环放在枢轴上，并将C形环收缩在枢轴上。 C环安装装置移动夹持C环的夹持臂，使得C环移动，使得C环中的间隙在C环收缩时从枢轴移开。
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14.发明授权Radiation-sensitive resin composition, polymer, and method for forming resist pattern 有权辐射敏感性树脂组合物，聚合物和形成抗蚀剂图案的方法公开(公告)号：US08815490B2
公开(公告)日：2014-08-26
申请号：US13309573
申请日：2011-12-02
CPC分类号： C08F20/26 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
摘要翻译： 辐射敏感性树脂组合物包括第一聚合物，第二聚合物和辐射敏感性酸产生剂。 第一聚合物包括由式（1）表示的重复单元。 第二聚合物包括酸不稳定基团，并且通过酸的作用解离，使得碱溶解度通过所述酸不稳定基团的解离而给出。 R1表示氢原子，甲基或三氟甲基。 R2表示具有1-20个碳原子的单键或二价直链，支链或环状，饱和或不饱和的烃基。 X表示氟原子取代的亚甲基或具有2-20个碳原子的直链或支链的氟代亚烷基。 R3表示氢原子或一价有机基团。
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公开(公告)号：US08802348B2
公开(公告)日：2014-08-12
申请号：US12701592
申请日：2010-02-07
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译： 辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。 树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。
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16.发明申请RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT 审中-公开辐射敏感性树脂组合物，形成抗性图案的方法，有机酸和酸产生剂公开(公告)号：US20130244185A9
公开(公告)日：2013-09-19
申请号：US13615842
申请日：2012-09-14
IPC分类号： C07C321/10 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R1—X—R2—(R3)n (I) —R31-G-R13 (x)
摘要翻译： 辐射敏感性树脂组合物包括通过用放射线照射产生有机酸的酸产生剂。 有机酸具有环状烃基和包含可被酸或碱裂解以产生极性基团的键的有机基团。 有机酸优选由下式（I）表示。 Z表示有机酸基。 R1表示烷二基，其中由R1表示的烷二基的一部分或全部氢原子任选被氟原子取代。 X表示单键O，OCO，COO，CO，SO 3或SO 2。 R2表示环状烃基。 R3表示具有由下式（x）表示的官能团的一价有机基团。 n为1〜3的整数。Z-R1-X-R2-（R3）n（I）-R31-G-R13（x）
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公开(公告)号：US08084188B2
公开(公告)日：2011-12-27
申请号：US12557529
申请日：2009-09-11
申请人： Noboru Otsuka , Takanori Kawakami
发明人： Noboru Otsuka , Takanori Kawakami
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.
摘要翻译： 辐射敏感性树脂组合物包括含酸解离基团的树脂，辐射敏感性酸产生剂和溶剂。 含酸解离基的树脂包括含有重复单元的共聚物。 修饰单元包括含量大于共聚物中重复单元总量的约55摩尔％的酸解离基团的重复单元。 含酸解离基的树脂中的共聚物的含量为含酸解离基的树脂的总量的约90质量％以上。
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公开(公告)号：US20050078404A1
公开(公告)日：2005-04-14
申请号：US10957011
申请日：2004-09-30
摘要： Embodiments of the invention prevent the magnetic head from dropping to the magnetic disk when it is retracted. If the power supply Vcc to the drive is interrupted, a power supply voltage detecting section detects that the power supply to the drive is interrupted. A control section sets switches to the ON state in order to discharge the charged retract capacitor and supply the discharge current to a voice coil. The control section retains the switches in the ON state for a period which is determined based on the discharge period specifying control data stored in a register and the count signal from a counter. A voice coil motor, to which the current is supplied, turns the actuator in the unloading direction to retract the actuator to the ramp.
摘要翻译： 本发明的实施例防止当磁头收回时磁头掉落到磁盘上。 如果驱动器的电源Vcc中断，则电源电压检测部检测到驱动器的电源被中断。 控制部将开关置于ON状态，以便对充电的收缩电容器进行放电，并将放电电流提供给音圈。 控制部分将开关保持在基于存储在寄存器中的放电周期指定控制数据和来自计数器的计数信号确定的周期。 提供电流的音圈电动机沿着卸载方向转动致动器，以将致动器缩回到斜坡。
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19.发明授权Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer 有权辐射敏感性树脂组合物，形成抗蚀剂图案的方法，化合物和聚合物公开(公告)号：US08535871B2
公开(公告)日：2013-09-17
申请号：US13325056
申请日：2011-12-14
申请人： Yuusuke Asano , Takanori Kawakami
发明人： Yuusuke Asano , Takanori Kawakami
CPC分类号： C08F20/22 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.
摘要翻译： 辐射敏感性树脂组合物包括第一聚合物，其包含具有酸不稳定基团的重复单元，并且在酸不稳定基团解离时变得碱溶性，并且具有辐射敏感性的酸产生剂。 酸不稳定基具有通式（1）所示的结构。 R1表示甲基等，R2表示形成环状结构的烃基，R3表示氟原子等，R4表示碳原子，n1表示1〜7的整数。
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20.发明申请RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT 审中-公开辐射敏感性树脂组合物，形成抗性图案的方法，有机酸和酸产生剂公开(公告)号：US20130065186A1
公开(公告)日：2013-03-14
申请号：US13615842
申请日：2012-09-14
IPC分类号： C07C321/10 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R1—X—R2—(R3)n (I) —R31-G-R13 (x)
摘要翻译： 辐射敏感性树脂组合物包括通过用放射线照射产生有机酸的酸产生剂。 有机酸具有环状烃基和包含可被酸或碱裂解以产生极性基团的键的有机基团。 有机酸优选由下式（I）表示。 Z表示有机酸基。 R2表示烷二基，其中由R1表示的烷二基的一部分或全部氢原子任选被氟原子取代。 X表示单键O，OCO，COO，CO，SO 3或SO 2。 R2表示环状烃基。 R3表示具有由下式（x）表示的官能团的一价有机基团。 n为1〜3的整数。Z-R1-X-R2-（R3）n（I）-R31-G-R13（x）
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