Piezoelectric substance element, liquid discharge head utilizing the same and optical element
    13.
    发明授权
    Piezoelectric substance element, liquid discharge head utilizing the same and optical element 有权
    压电体元件,利用其的液体排出头和光学元件

    公开(公告)号:US07759845B2

    公开(公告)日:2010-07-20

    申请号:US11683100

    申请日:2007-03-07

    IPC分类号: H01L41/08

    摘要: An optical element satisfactory in transparency and characteristics as an optical modulation element, and a piezoelectric substance element satisfactory in precision and reproducibility as a fine element such as MEMS can be provided. The piezoelectric substance element includes, on a substrate, at least a first electrode, a piezoelectric substance film and a second electrode. The piezoelectric substance film does not contain a layer-structured boundary plane; the crystal phase constituting the piezoelectric substance film comprises at least two of a tetragonal, a rhombohedral, a pseudocubic, an orthorhombic and a monoclinic; and the piezoelectric substance film includes, in a portion in which a change in the composition is within a range of ±2%, a portion where a proportion of the different crystal phases changes gradually in a thickness direction of the film.

    摘要翻译: 可以提供作为光调制元件的透明度和特性令人满意的光学元件,以及作为微细元件如MEMS的精度和再现性良好的压电体元件。 压电体元件在基板上至少包括第一电极,压电体膜和第二电极。 压电体膜不含有层结构的边界面; 构成压电体膜的晶相包含四方晶,菱方,假立方,斜方晶和单斜晶中的至少两种; 并且压电体膜在组成的变化范围为±2%的范围内包括不同结晶相的比例在膜的厚度方向上逐渐变化的部分。

    MANUFACTURING METHOD FOR PIEZOELECTRIC BODY, PIEZOELECTRIC ELEMENT, AND LIQUID DISCHARGE HEAD
    14.
    发明申请
    MANUFACTURING METHOD FOR PIEZOELECTRIC BODY, PIEZOELECTRIC ELEMENT, AND LIQUID DISCHARGE HEAD 有权
    压电体,压电元件和液体放电头的制造方法

    公开(公告)号:US20080012909A1

    公开(公告)日:2008-01-17

    申请号:US11773009

    申请日:2007-07-03

    IPC分类号: B41J2/295 H01L41/08 H01L41/22

    摘要: A method of manufacturing a piezoelectric body, formed from a film made of an ABO3 perovskite oxide crystal epitaxially grown on a substrate, comprises forming a film containing an AOx crystal by using an oxide containing an A element and a B element by heating the substrate to a temperature which is equal to or higher than a temperature at which the AOx crystal is formed, and which is lower than a temperature at which the ABO3 perovskite oxide crystal is formed and changing the film containing the AOx crystal into a film made of the ABO3 perovskite oxide crystal by heating the substrate to a temperature which exceeds a temperature at which the AOx crystal can be present, and which is equal to or higher than a temperature at which the ABO3 perovskite oxide crystal is formed.

    摘要翻译: 制造由在衬底上外延生长的由ABO 3钙钛矿氧化物晶体制成的膜形成的压电体的方法包括通过以下步骤形成包含AO xS晶体的膜: 使用含有A元素和B元素的氧化物,通过将基板加热到等于或高于形成AO xS晶体的温度,并且低于温度 在其上形成ABO 3钙钛矿氧化物晶体,并将含有AO 结晶的膜改变为由ABO 3钙钛矿氧化物制成的膜 通过将衬底加热到​​超过可能存在AO xS晶体的温度的温度,并且其等于或高于ABO 3 形成了钙钛矿型氧化物晶体。

    Piezoelectric element, ink jet head and producing method for piezoelectric element
    17.
    发明授权
    Piezoelectric element, ink jet head and producing method for piezoelectric element 有权
    压电元件,喷墨头和压电元件的制造方法

    公开(公告)号:US07874649B2

    公开(公告)日:2011-01-25

    申请号:US11774145

    申请日:2007-07-06

    IPC分类号: B41J2/045

    摘要: A piezoelectric element comprises a piezoelectric film disposed on a substrate and a pair of electrodes disposed in contact with the piezoelectric film and utilizing a bending mode. The piezoelectric film includes domains constituted of a tetragonal crystal and including an a-domain which is formed by a crystal having a (100) plane parallel to the film surface of the piezoelectric film, the a-domains include an A-domain having a normal axis of (001) plane substantially parallel to a principal bending direction of the piezoelectric film and a B-domain having a normal axis of (001) plane substantially perpendicular to the principal bending direction of the piezoelectric film, and the A-domains have a volume proportion larger than 50 vol % with respect to the sum of the volume of the A-domains and the volume of the B-domains.

    摘要翻译: 压电元件包括​​设置在基板上的压电膜和与压电膜接触设置并利用弯曲模式的一对电极。 该压电薄膜包括由四方晶体构成的并由具有与压电薄膜的膜表面平行的(100)面的晶体形成的a畴的a畴,a畴包括具有正常 基本上平行于压电薄膜的主弯曲方向的(001)面的轴线和与压电薄膜的主弯曲方向垂直的法线轴(001)面的B域,A畴具有 体积比例大于50体积%,相对于A结构域的体积和B结构域的体积的总和。

    Manufacturing method for piezoelectric body, piezoelectric element, and liquid discharge head
    18.
    发明授权
    Manufacturing method for piezoelectric body, piezoelectric element, and liquid discharge head 有权
    压电体,压电元件和排液头的制造方法

    公开(公告)号:US07874648B2

    公开(公告)日:2011-01-25

    申请号:US11773009

    申请日:2007-07-03

    IPC分类号: B41J2/045 H04R17/00

    摘要: A method of manufacturing a piezoelectric body, formed from a film made of an ABO3 perovskite oxide crystal epitaxially grown on a substrate, includes forming a film containing an AOx crystal by using an oxide containing an A element and a B element by heating the substrate to a temperature which is equal to or higher than a temperature at which the AOx crystal is formed, and which is lower than a temperature at which the ABO3 perovskite oxide crystal is formed and changing the film containing the AOx crystal into a film made of the ABO3 perovskite oxide crystal by heating the substrate to a temperature which exceeds a temperature at which the AOx crystal can be present, and which is equal to or higher than a temperature at which the ABO3 perovskite oxide crystal is formed.

    摘要翻译: 由在基板外延生长的由ABO 3钙钛矿型氧化物晶体构成的膜形成的压电体的制造方法包括通过使用含有A元素和B元素的氧化物将基板加热而形成含有AOx晶体的膜, 该温度等于或高于形成AOx晶体的温度,并且低于形成ABO 3钙钛矿氧化物晶体的温度,并将含有AOx晶体的膜改变为由ABO 3制成的膜 通过将基板加热到超过可能存在AO x的温度的温度,并且等于或高于形成ABO 3钙钛矿氧化物晶体的温度的钙钛矿氧化物晶体。

    PIEZOELECTRIC ELEMENT, INK JET HEAD AND PRODUCING METHOD FOR PIEZOELECTRIC ELEMENT
    20.
    发明申请
    PIEZOELECTRIC ELEMENT, INK JET HEAD AND PRODUCING METHOD FOR PIEZOELECTRIC ELEMENT 有权
    压电元件,喷墨头和压电元件的生产方法

    公开(公告)号:US20080012910A1

    公开(公告)日:2008-01-17

    申请号:US11774145

    申请日:2007-07-06

    IPC分类号: B41J2/045 B05D5/12 H01L41/09

    摘要: A piezoelectric element comprises a piezoelectric film disposed on a substrate and a pair of electrodes disposed in contact with the piezoelectric film and utilizing a bending mode. The piezoelectric film includes domains constituted of a tetragonal crystal and including an a-domain which is formed by a crystal having a (100) plane parallel to the film surface of the piezoelectric film, the a-domains include an A-domain having a normal axis of (001) plane substantially parallel to a principal bending direction of the piezoelectric film and a B-domain having a normal axis of (001) plane substantially perpendicular to the principal bending direction of the piezoelectric film, and the A-domains have a volume proportion larger than 50 vol % with respect to the sum of the volume of the A-domains and the volume of the B-domains.

    摘要翻译: 压电元件包括​​设置在基板上的压电膜和与压电膜接触设置并利用弯曲模式的一对电极。 该压电薄膜包括由四方晶体构成的并由具有与压电薄膜的膜表面平行的(100)面的晶体形成的a畴的a畴,A畴包括具有正常的 基本上平行于压电薄膜的主弯曲方向的(001)面的轴线和与压电薄膜的主弯曲方向垂直的法线轴(001)面的B域,A畴具有 体积比例大于50体积%,相对于A结构域的体积和B结构域的体积的总和。