公开(公告)号：US06572759B1

公开(公告)日：2003-06-03

申请号：US09913028

申请日：2001-08-09

Applicant: Tatsuya Nishimura ,  Roberto Masahiro Serikawa ,  Oingquan Su ,  Masahiro Isaka ,  Takashi Usui

Inventor： Tatsuya Nishimura ,  Roberto Masahiro Serikawa ,  Oingquan Su ,  Masahiro Isaka ,  Takashi Usui

IPC: C02F1461

CPC classification number: C02F1/4672 ,  B01D53/32 ,  B01D53/77 ,  B01J3/04 ,  B01J10/00 ,  B01J19/18 ,  B01J19/26 ,  B01J2219/00054 ,  B01J2219/00058 ,  B01J2219/00063 ,  B01J2219/00069 ,  B01J2219/00087 ,  B01J2219/00099 ,  B01J2219/00103 ,  B01J2219/00132 ,  B01J2219/00135 ,  B01J2219/00155 ,  B01J2219/00157 ,  B01J2219/00159 ,  B01J2219/00162 ,  B01J2219/00164 ,  B01J2219/00182 ,  B01J2219/083 ,  B01J2219/0884 ,  B01J2219/185 ,  B01J2219/30207 ,  B01J2219/30223 ,  C02F1/02 ,  C02F1/025 ,  C02F1/461 ,  C02F1/46104 ,  C02F1/46114 ,  C02F1/467 ,  C02F1/74 ,  C02F2001/46133 ,  C02F2101/36 ,  C02F2103/18 ,  C02F2103/28 ,  C02F2201/4612 ,  C02F2201/46155 ,  C02F2301/066 ,  C02F2301/08

Abstract: An object of the present invention is to provide a process and an apparatus for treating an aqueous medium at low running costs with a decreased electricity required for hydrothermal electrolytic reaction. The present invention proposes a two-step process comprising a first step of performing a conventional hydrothermal reaction or a conventional electrolytic reaction prior to hydrothermal electrolytic reaction to degrade readily degradable substances or ammonia or various electrolytically degradable organics and then a second step of performing hydrothermal electrolytic reaction to degrade the remaining organics, whereby the electricity consumed by hydrothermal electrolytic reaction in the second step can be greatly reduced.

Abstract translation: 本发明的目的是提供一种以低运行成本处理水性介质的方法和装置，其中水热电解反应所需的电量降低。 本发明提出了一种两步法，其包括在水热电解反应之前进行常规水热反应或常规电解反应以降解易降解物质或氨或各种电解可降解有机物的第一步骤，然后进行水热电解 使其余的有机物发生反应，可以大大降低第二工序中的水热电解反应消耗的电量。

公开(公告)号：US5854702A

公开(公告)日：1998-12-29

申请号：US694343

申请日：1996-08-08

Applicant: Tomohisa Ishikawa ,  Katsuhiko Hakomori ,  Tatsuya Nishimura

Inventor： Tomohisa Ishikawa ,  Katsuhiko Hakomori ,  Tatsuya Nishimura

IPC: H04B10/40 ,  H01S5/068 ,  H04B10/079 ,  H04B10/272 ,  H04B10/50 ,  H04B10/564 ,  H04B10/60 ,  H04B10/67 ,  H04B10/69 ,  H04B10/00

CPC classification number: H04B10/40 ,  H04B10/0795

Abstract: An optical module includes a photodiode disposed in front of a laser diode with an offset from an optical axis of the laser diode, for monitoring the power of an optical beam emitted from the laser diode in a forward direction. The optical module further achieves switching between a transmission mode and a reception mode in response to a drive current supplied to the laser diode.

Abstract translation: 光学模块包括设置在激光二极管的前面，具有偏离激光二极管的光轴的光电二极管，用于监视从激光二极管向前发射的光束的功率。 光模块还响应于提供给激光二极管的驱动电流而实现在传输模式和接收模式之间的切换。

公开(公告)号：US5395474A

公开(公告)日：1995-03-07

申请号：US268547

申请日：1994-07-06

Applicant: Hidenao Suzuki ,  Tatsuya Nishimura ,  Yoshio Hatada

Inventor： Hidenao Suzuki ,  Tatsuya Nishimura ,  Yoshio Hatada

IPC: H01L21/302 ,  H01J37/02 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213 ,  C23F1/02

CPC classification number: H01L21/3065 ,  H01J37/026 ,  H01L21/31116 ,  H01L21/32136

Abstract: A semiconductor wafer etching apparatus is capable of anisotropically etching a large-diameter semiconductor wafer with high accuracy without causing the semiconductor wafer to be charged. First, the apparatus cools the wafer in an atmosphere of a nitrogen or a halogen gas so that the wafer adsorbs and is covered by atoms of the gas. Then, a fast atom beam source of the apparatus generates an electrically neutral fast atom beam of gas atoms or molecules to etch the semiconductor wafer. The etching speed is promoted by an interaction of the adsorbed atoms and the fast atom beam.

Abstract translation: 半导体晶片蚀刻装置能够高精度地各向异性地蚀刻大直径半导体晶片，而不会导致半导体晶片被充电。 首先，该装置在氮气或卤素气体的气氛中冷却晶片，使得晶片吸附并被气体的原子覆盖。 然后，该装置的快速原子束源产生气体原子或分子的电中性的快速原子束以蚀刻半导体晶片。 蚀刻速度通过吸附原子和快原子束的相互作用来促进。

公开(公告)号：US5227700A

公开(公告)日：1993-07-13

申请号：US630323

申请日：1990-12-19

Applicant: Kazutoshi Nagai ,  Tatsuya Nishimura

Inventor： Kazutoshi Nagai ,  Tatsuya Nishimura

IPC: H01J37/06 ,  H01J37/24 ,  H05H9/00

CPC classification number: H05H9/00 ,  H01J37/243

Abstract: An electron accelerator includes a thermal cathode, heated by infrared rays guided by a quartz rod, for emitting electrons, an accelerating section connected to a high voltage power supply, and a vacuum vessel containing the cathode and the acceleration section. The cathode may be heated by laser beam instead of the infrared rays. The current level of an accelerated electron beam is detected to generate a signal proportional to the detected level. The signal is used to adjust the intensity of the rays heating the cathode to prevent the level of electrons emitted from said cathode from fluctuating.

公开(公告)号：US5213335A

公开(公告)日：1993-05-25

申请号：US666875

申请日：1991-03-08

Applicant: Shingo Dote ,  Tatsuya Nishimura

Inventor： Shingo Dote ,  Tatsuya Nishimura

IPC: A63F9/02 ,  A63F9/06 ,  A63F13/04 ,  A63F13/08 ,  F41G3/26 ,  G09B9/00

CPC classification number: A63F13/219 ,  A63F13/04 ,  A63F13/08 ,  A63F13/213 ,  A63F13/245 ,  A63F13/837 ,  A63F9/0291 ,  F41G3/2644 ,  G09B9/006 ,  A63F2009/0626 ,  A63F2009/0627 ,  A63F2300/1062 ,  A63F2300/8076

Abstract: An optical assembly is provided to simulate the emission of a light beam such as a laser, so that it appears to extend a considerable distance from the observer. The optical device can be advantageously integrated with a video game system or a simulated gun, and includes an arrangement of reflecting and semitransparent mirrors that can define a field of view, for example, of a target area, and can superimpose images of a light emitting unit so that a light beam can apparently extend to a target while maintaining a compact configuration.

Abstract translation: 提供光学组件以模拟诸如激光器的光束的发射，使得其似乎从观察者延伸相当长的距离。 光学装置可以有利地与视频游戏系统或模拟枪集成，并且包括可以限定例如目标区域的视场的反射和半透明反射镜的布置，并且可以叠加发光的图像 单元，使得光束可以显着地延伸到目标，同时保持紧凑的构造。