公开(公告)号：US07255771B2

公开(公告)日：2007-08-14

申请号：US10810784

申请日：2004-03-26

申请人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven M. Zuniga

发明人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven M. Zuniga

IPC分类号： B24B29/00

CPC分类号： B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

公开(公告)号：US20060240750A1

公开(公告)日：2006-10-26

申请号：US11407695

申请日：2006-04-19

申请人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

发明人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

IPC分类号： B24B29/00 ,  B24B47/02

CPC分类号： B24B37/32

摘要： A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have matching grooves formed therein to increase the flexibility of the lower ring.

摘要翻译： 描述了具有下环和上环的两部分保持环。 在化学机械抛光期间，下环接触抛光表面。 下环的上表面和下表面具有形成在其中的匹配凹槽，以增加下环的柔性。

公开(公告)号：US06241477B1

公开(公告)日：2001-06-05

申请号：US09383119

申请日：1999-08-25

申请人： Thomas Brezoczky ,  Roger Heyder ,  Robert E. Davenport

发明人： Thomas Brezoczky ,  Roger Heyder ,  Robert E. Davenport

IPC分类号： F04B3702

CPC分类号： F04B37/02 ,  C23C14/564

摘要： An apparatus for removing an undesirable gas in a processing chamber includes one or more getter materials disposed between a process gas inlet and a substrate support member in the processing chamber, and one or more temperature control elements disposed in thermal communication with the one or more getter materials. Preferably, a controller is connected to the one or more temperature control elements to regulate the temperature of the one or more getter materials, and a gas analyzer is disposed within the processing chamber to provide signals to the controller and indicate the presence of undesirable gases. Another aspect of the invention provides a method for removing a gas from a processing chamber comprising pumping the gas using a getter material disposed between a process gas inlet and a substrate support member in the processing chamber, wherein the getter material is activated by a temperature control element disposed in thermal communication with the getter material. Preferably, the method further comprises detecting a presence of the gas within the processing chamber and controlling the pumping of the getter material based on detection of the presence of the gas.

摘要翻译： 一种用于去除处理室中不期望的气体的设备包括一个或多个吸气剂材料，其设置在处理室中的处理气体入口和衬底支撑构件之间，以及一个或多个温度控制元件，其与所述一个或多个吸气剂热连通地设置 材料 优选地，控制器连接到一个或多个温度控制元件以调节一个或多个吸气剂材料的温度，并且气体分析器设置在处理室内以向控制器提供信号并指示不期望的气体的存在。 本发明的另一方面提供了一种用于从处理室除去气体的方法，包括使用设置在处理室中的处理气体入口和基底支撑构件之间的吸气剂材料来泵送气体，其中吸气剂材料通过温度控制 元件设置成与吸气材料热连通。 优选地，该方法还包括检测处理室内的气体的存在并且基于检测到气体的存在来控制吸气剂材料的泵送。

公开(公告)号：US08088299B2

公开(公告)日：2012-01-03

申请号：US12955803

申请日：2010-11-29

申请人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven M. Zuniga

发明人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven M. Zuniga

IPC分类号： C23C16/00 ,  H01L21/00

CPC分类号： B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

公开(公告)号：US20070272356A1

公开(公告)日：2007-11-29

申请号：US11837412

申请日：2007-08-10

申请人： Hung Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven Zuniga

发明人： Hung Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven Zuniga

IPC分类号： C23F1/00

CPC分类号： B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

公开(公告)号：US20070202785A1

公开(公告)日：2007-08-30

申请号：US11614940

申请日：2006-12-21

申请人： Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chen ,  Andrew Nagengast ,  Steven Zuniga ,  Thomas Brezoczky

发明人： Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chen ,  Andrew Nagengast ,  Steven Zuniga ,  Thomas Brezoczky

IPC分类号： B24B41/06

CPC分类号： B24B37/30 ,  B24B41/06 ,  B29C33/424 ,  B29C35/02 ,  B29K2023/00 ,  B29K2083/00 ,  B29K2995/0074 ,  B29L2031/755

摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.

摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。

公开(公告)号：US20050211377A1

公开(公告)日：2005-09-29

申请号：US10810784

申请日：2004-03-26

申请人： Hung Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven Zuniga

发明人： Hung Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas Brezoczky ,  Steven Zuniga

IPC分类号： B24B37/04 ,  B44C1/22 ,  C23F1/00 ,  H01L21/68

CPC分类号： B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

公开(公告)号：US06563686B2

公开(公告)日：2003-05-13

申请号：US09812287

申请日：2001-03-19

申请人： Cheng-Hsiung Tsai ,  Karl Brown ,  Thomas Brezoczky

发明人： Cheng-Hsiung Tsai ,  Karl Brown ,  Thomas Brezoczky

IPC分类号： H05E2300

CPC分类号： H01L21/68785 ,  C23C16/4586 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  Y10T29/41

摘要： A pedestal assembly for supporting a substrate within a semiconductor process chamber is provided. In one embodiment, the pedestal assembly generally includes a ceramic body, a metallic housing and a cooling plate. The ceramic body is coupled to the housing and is adapted to support the substrate. The cooling plate is disposed against the ceramic body. A conformal graphite interstitial layer disposed between the cooling plate and the ceramic body to provide enhanced thermal conductivity therebetween over a thermal operating range of the pedestal assembly. In another embodiment, a pedestal assembly generally includes a removable ceramic body disposed on a cover. A conformal graphite interstitial layer disposed in a vacuum environment surrounding the pedestal assembly between the ceramic body and the cover. Optionally, a second conformal graphite interstitial layer disposed in an internal volume of the pedestal assembly between the cooling plate and the cover.

公开(公告)号：US06348073B1

公开(公告)日：2002-02-19

申请号：US09569738

申请日：2000-05-11

申请人： Roger Heyder ,  Thomas Brezoczky ,  Deepak Manoharlal

发明人： Roger Heyder ,  Thomas Brezoczky ,  Deepak Manoharlal

IPC分类号： H01L2100

CPC分类号： H01L21/67778 ,  Y10S414/136 ,  Y10S414/138 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S414/141 ,  Y10T29/41

摘要： An apparatus for positioning an object at multiple positions within an enclosure has a moveable positioning member attached to a linear motor, both of which are positioned within the enclosure. The moveable positioning member is adapted to receive and support the object. A control signal directs the motion of the linear motor which moves the moveable positioning member and, thus, the object. An insulated conductor extends through the wall of the enclosure and allows electrical communication through the enclosure wall. The insulated conductor communicates with a power supply and a control mechanism exterior the enclosure. A flexible connection line, adapted to avoid contact with the enclosure, provides communication between an insulated conductor and the linear motor so that the linear motor is in communication with the power supply and the control mechanism.

摘要翻译： 用于将物体定位在外壳内的多个位置的装置具有连接到线性电动机的可移动定位构件，两者位于外壳内。 可移动定位构件适于接收和支撑物体。 控制信号引导线性电动机的运动，其移动可移动的定位构件，从而使物体移动。 绝缘导体延伸穿过外壳的壁，并允许通过外壳壁的电气连通。 绝缘导体与机箱外部的电源和控制机构通信。 适于避免与外壳接触的柔性连接线提供绝缘导体和线性电动机之间的连通，使得线性电动机与电源和控制机构连通。

公开(公告)号：US20090178701A1

公开(公告)日：2009-07-16

申请号：US12011533

申请日：2008-01-28

申请人： Andrew Nagengast ,  Thomas Brezoczky

发明人： Andrew Nagengast ,  Thomas Brezoczky

IPC分类号： H01L31/042 ,  B23P19/00

CPC分类号： H01L31/035281 ,  F24S10/45 ,  F24S25/30 ,  F24S25/35 ,  H01L31/02008 ,  H01L31/048 ,  H02S20/20 ,  H02S30/20 ,  Y02E10/47 ,  Y02E10/50 ,  Y10T29/5313

摘要： In some embodiments, an apparatus for producing electric energy from light energy includes an elongated photovoltaic module (EPM) and a cover engageable therewith. The EPM includes at least one electrical output contact and the cover includes at least one electrical connector operable to electrically engage at least one electrical output contact(s). The cover sealingly engages the EPM around at least one of its electrical output contact(s).

摘要翻译： 在一些实施例中，用于从光能产生电能的装置包括细长光伏模块（EPM）和可与其接合的盖。 EPM包括至少一个电输出触点，并且盖包括至少一个电连接器，其可操作以电耦合至少一个电输出触点。 盖子围绕其电输出触头中的至少一个密封地接合EPM。