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    Passive Injection of a Chemical Solution into a Process Stream
    11.
    发明申请
    Passive Injection of a Chemical Solution into a Process Stream 有权
    将化学溶液无源注入工艺流

    公开(公告)号：US20140360606A1

    公开(公告)日：2014-12-11

    申请号：US14298191

    申请日：2014-06-06

    申请人： Robert James Law ,  Robert L. Cowan ,  Thomas P. Diaz ,  Samson Hettiarachchi

    发明人： Robert James Law ,  Robert L. Cowan ,  Thomas P. Diaz ,  Samson Hettiarachchi

    IPC分类号： B01F13/02

    CPC分类号： B01F15/0412 ,  B01F5/0495 ,  F16K19/003 ,  G05D11/006 ,  Y10T137/2218

    摘要： A system and method of injecting a chemical into a high pressure process stream without pumps or other active components. The system utilizes the differential pressure created by resistive losses of downstream components within a high pressure process stream. A bypass side stream is taken from an upstream pressure location and returned to the downstream side of the resistive inline process component. The chemical solution vessel is pressurized by the higher side of the pressure differential. The solution then passes through a flow controlling capillary tube exiting on the lower pressure differential side into the bypass stream. The high flow rate chemically diluted bypass stream then returns to the process stream at the lower differential process stream tie-in. The chemical solution is isolated from the process water pressuring the vessel by a movable separating device preventing mixing of the two fluids. The vessel can also be pressurized by gas.

    摘要翻译： 将化学品注入高压工艺流而不使用泵或其他活性组分的系统和方法。 该系统利用由高压工艺流中的下游部件的电阻损耗产生的压差。 旁路侧流从上游压力位置获取，并返回到电阻内联过程组件的下游侧。 化学溶液容器由压力差的较高侧加压。 然后溶液通过从低压差侧出来的流动控制毛细管进入旁路流。 然后，高流量化学稀释的旁路流在较低的差分过程流束缚下返回到过程流。 化学溶液是通过可移动的分离装置从加工水中分离出来的，以防止两种流体的混合。 容器也可以用气体加压。

    Radiation-induced palladium doping of metals to protect against stress corrosion cracking
    14.
    发明授权
    Radiation-induced palladium doping of metals to protect against stress corrosion cracking 失效
    金属的辐射诱导钯掺杂，以防止应力腐蚀开裂

    公开(公告)号：US5602888A

    公开(公告)日：1997-02-11

    申请号：US416656

    申请日：1995-04-05

    申请人： Samson Hettiarachchi ,  Thomas P. Diaz ,  Gary P. Wozadlo

    发明人： Samson Hettiarachchi ,  Thomas P. Diaz ,  Gary P. Wozadlo

    IPC分类号： G21D1/00 ,  B01J37/03 ,  C23C30/00 ,  C23F11/08 ,  C23F11/18 ,  G01N17/02 ,  G21C3/07 ,  G21C17/02 ,  G21C17/022 ,  G21C19/28 ,  G21C19/30 ,  G21C19/307 ,  G21D3/08 ,  G21C9/00

    CPC分类号： G21C17/0225 ,  B01J37/031 ,  C23F11/08 ,  C23F11/18 ,  G01N17/02 ,  G21C17/02 ,  G21C17/022 ,  G21C19/28 ,  G21C19/30 ,  G21C19/307 ,  G21C3/07 ,  G21Y2002/102 ,  G21Y2002/103 ,  G21Y2002/104 ,  G21Y2002/204 ,  G21Y2004/10 ,  G21Y2004/20 ,  G21Y2004/30 ,  G21Y2004/40 ,  Y02E30/40

    摘要： A method for mitigating crack growth on the surface of stainless steel or other alloy components in a water-cooled nuclear reactor wherein a solution or suspension of a compound containing a noble metal is injected into the coolant water while the reactor is not generating nuclear heat, e.g., during shutdown or recirculation pump heatup. During shutdown, the reactor coolant water reaches temperatures as low as 120.degree. F., in contrast to the water temperature of 550.degree. F. during normal operation. During pump heatup, the water temperature reaches 400.degree.-450.degree. F. At these reduced temperatures, the rate of thermal decomposition of the injected noble metal compound is reduced. However, radiation-induced decomposition also occurs inside the reactor. In particular, the noble metal compound can be decomposed by the gamma radiation emanating from the nuclear fuel core of the reactor. The noble metal compound decomposes under reactor thermal and radiation conditions to release ions/atoms of the noble metal which incorporate in or deposit on the oxide film formed on the stainless steel and other alloy components. As a result, the electrochemical potential of the metal surface is maintained at a level below the critical potential in the presence of low levels of hydrogen to protect against intergranular stress corrosion cracking.

    摘要翻译： 一种用于减轻水冷核反应堆中不锈钢或其他合金组分表面上的裂纹扩展的方法，其中将含有贵金属的化合物的溶液或悬浮液注入冷却水中，同时反应器不产生核热， 例如在停机或再循环泵加热期间。 在停机期间，反应堆冷却水的温度低至120°F，与正常运行时的550°F水温相反。 在泵加热期间，水温达到400°-450°F。在这些降低的温度下，注入的贵金属化合物的热分解速率降低。 然而，辐射诱导的分解也发生在反应器内部。 特别地，贵金属化合物可以通过从反应器的核燃料芯发出的γ射线分解。 贵金属化合物在反应器热和辐射条件下分解，以释放掺入或沉积在不锈钢和其它合金组分上形成的氧化膜上的贵金属的离子/原子。 因此，在低水平的氢气存在下，金属表面的电化学势能保持在低于临界电位的水平，以防止晶间应力腐蚀开裂。

    Synergistic corrosion inhibitors based on substituted pyridinium compounds
    15.
    发明授权
    Synergistic corrosion inhibitors based on substituted pyridinium compounds 失效
    基于取代的吡啶鎓化合物的协同腐蚀抑制剂

    公开(公告)号：US5132093A

    公开(公告)日：1992-07-21

    申请号：US582796

    申请日：1990-09-13

    申请人： Samson Hettiarachchi ,  Subhash C. Narang ,  Digby D. Macdonald

    发明人： Samson Hettiarachchi ,  Subhash C. Narang ,  Digby D. Macdonald

    IPC分类号： A01N43/40 ,  A01N55/00 ,  A01N55/04 ,  A01N57/24 ,  C07D213/70 ,  C07D213/74 ,  C07F7/08 ,  C07F7/10 ,  C07F7/22 ,  C07F9/58 ,  C07F9/6568 ,  C09K3/18 ,  C23F11/14 ,  C23F11/16

    CPC分类号： C07D213/70 ,  A01N43/40 ,  A01N55/00 ,  A01N55/04 ,  A01N57/24 ,  C07D213/74 ,  C07F7/0814 ,  C07F7/2212 ,  C07F9/587 ,  C07F9/65683 ,  C23F11/04 ,  C23F11/141 ,  C23F11/149 ,  C23F11/16

    摘要： The present invention relates to a compound of the formula: ##STR1## wherein (a) A is independently selected from --SR.sup.1, --NR.sup.1 R.sup.2, --PR.sup.1 R.sup.2, --Si,R.sup.1 R.sup.2 R.sup.3, or --SnR.sup.1 R.sup.2 R.sup.3,R.sup.1, R.sup.2 and R.sup.3 are each independently selected from alkyl, cycloalkyl, alkylcycloalkyl, arylalkyl having from 1 to 20 carbon atoms or aryl, substituted aryl, or where R.sup.2 and R.sup.3 together form a heterocycle group, having from 4 to 20 carbon atoms, andn is an integer from 1 to 5;(b) Y is selected from a direct bond or --CR.sup.4 R.sup.5 --, wherein R.sup.4 and R.sup.5 are each independently selected from hydrogen, or alkyl group having 1 to 20 carbon atoms or R.sup.4 and R.sup.5 together form a cycloalkyl group having 4 to 20 carbon atoms;(c) Z is aryl or substituted aryl; and(d) X is halogen, sulfonate, carboxylate, phosphate, carbonate, sulfate, or MD.sub.m wherein M is boron, phosphorous, arsenic, antimony or silicon, D is fluorine, chlorine, bromine or iodine and m is 2, 3 or 4. These compounds are useful as synergistic corrosion inhibitors for metals. These compounds are also useful as bacteriostats, antifungal agents and as deicing agents as surfactants.

    摘要翻译： 本发明涉及下式化合物：其中（a）A独立地选自-SR1，-NR1R2，-PR1R2，-Si，R1R2R3或-SnR1R2R3，R1，R2和R3各自独立地选自 由烷基，环烷基，烷基环烷基，具有1至20个碳原子的芳基烷基或芳基，取代的芳基，或其中R2和R3一起形成具有4至20个碳原子的杂环基，n为1至5的整数; （b）Y选自直接键或-CR 4 R 5 - ，其中R 4和R 5各自独立地选自氢或具有1至20个碳原子的烷基或R 4和R 5一起形成具有4至20个碳原子的环烷基 ; （c）Z是芳基或取代的芳基; 和（d）X是卤素，磺酸盐，羧酸盐，磷酸盐，碳酸盐，硫酸盐或MDm，其中M是硼，磷，砷，锑或硅，D是氟，氯，溴或碘，m是2,3或4 这些化合物可用作金属的协同腐蚀抑制剂。 这些化合物也可用作抑菌剂，抗真菌剂和作为表面活性剂的除冰剂。

    Method for monitoring noble metal distribution in reactor circuit during plant application
    18.
    发明授权
    Method for monitoring noble metal distribution in reactor circuit during plant application 失效
    在工厂应用中监测电抗器电路中贵金属分布的方法

    公开(公告)号：US5625656A

    公开(公告)日：1997-04-29

    申请号：US482243

    申请日：1995-06-07

    申请人： Samson Hettiarachchi ,  Robert L. Cowan, II ,  Robert J. Law ,  Thomas P. Diaz

    发明人： Samson Hettiarachchi ,  Robert L. Cowan, II ,  Robert J. Law ,  Thomas P. Diaz

    IPC分类号： B01J37/03 ,  C23F11/08 ,  C23F11/18 ,  G01N17/02 ,  G21C3/07 ,  G21C17/02 ,  G21C17/022 ,  G21C19/28 ,  G21C19/30 ,  G21C19/307

    CPC分类号： B01J37/031 ,  C23F11/08 ,  C23F11/18 ,  C23F15/00 ,  G01N17/02 ,  G21C17/02 ,  G21C17/022 ,  G21C17/0225 ,  G21C19/28 ,  G21C19/30 ,  G21C19/307 ,  G21C3/07 ,  G21Y2002/102 ,  G21Y2002/103 ,  G21Y2002/104 ,  G21Y2002/204 ,  G21Y2004/10 ,  G21Y2004/20 ,  G21Y2004/30 ,  G21Y2004/40 ,  Y02E30/40

    摘要： A method for ensuring the distribution of noble metal in the reactor circuit during plant application without measuring the reactor water for noble metal content by chemical analysis. The method involves the measurement of electrochemical corrosion potential in an autoclave or a high-flow test section that is connected to the reactor water circuit through sample lines downstream of the injection port, preferably the point in the reactor circuit which is furthest from the injection port. If the noble metal flows into the autoclave or test section at these distant points in the reactor circuit, then the noble metal will deposit on the test specimens inside the autoclave or test section. After the noble metal has been injected for a predetermined duration, the electrochemical corrosion potential autoclave or test section is exposed to hydrogen water chemistry conditions and the electrochemical corrosion potentials of the specimens inside the autoclave or test section will be measured to determine the extent of their catalytic response. A good catalytic response indicates that the noble metal has reached the locations upstream where electrochemical corrosion potential is being measured.

    摘要翻译： 一种用于确保在植物施用期间在反应器回路中分布贵金属的方法，而不通过化学分析测量贵金属含量的反应器水。 该方法包括在高压灭菌器或高流量测试部分中测量电化学腐蚀电位，该高压灭菌器或高流量试验部分通过注入口下游的取样管线连接到反应器水回路，优选地在反应器电路中与注射端口最远的点 。 如果贵金属在反应器电路中的这些远处流入高压釜或试验部分，则贵金属将沉积在高压釜或试验部分内的试样上。 在将贵金属注入预定时间后，将电化学腐蚀潜力的高压釜或试验部分暴露于氢水化学条件下，并测量高压釜或试验部分内的试样的电化学腐蚀电位，以确定它们的程度 催化反应。 良好的催化反应表明贵金属已经到达测量电化学腐蚀电位的上游位置。

    Reference electrode assembly and process for constructing
    19.
    发明授权
    Reference electrode assembly and process for constructing 失效
    参考电极组件及其构造工艺

    公开(公告)号：US5238553A

    公开(公告)日：1993-08-24

    申请号：US881157

    申请日：1992-05-11

    申请人： Samson Hettiarachchi ,  Herking Song ,  Digby D. Macdonald

    发明人： Samson Hettiarachchi ,  Herking Song ,  Digby D. Macdonald

    IPC分类号： G01N27/30

    CPC分类号： G01N27/301

    摘要： A reference electrode for use in measuring electrochemical corrosion potential and pH of, for example, water in a drum boiler at supercritical temperatures and which is corrosive includes an alumina or zirconia tube which is packed with a bulk solid electrolyte. The electrolyte consists of a mixture of silver chloride and glass in an optimally 2 to 4 weight ratio or glass particles with silver chloride precipitated around each particle. A solidified silver chloride electrode interfaces with the bulk electrolyte and has embedded in it a conductive silver electrode which provides the electrical contact. Use of the foregoing provides an immobilized solid electrolyte which displays stability and integrity as the temperature and pressure cycles between extremes.

    摘要翻译： 用于测量超临界温度下的鼓式锅炉中的电化学腐蚀电位和pH的参考电极，其具有腐蚀性，包括填充有大量固体电解质的氧化铝或氧化锆管。 电解质由氯化银和玻璃的混合物组成，最佳为2至4重量比，或者每个颗粒周围沉积有氯化银的玻璃颗粒。 固化的氯化银电极与本体电解质接合并嵌入其中提供电接触的导电银电极。 使用前述提供固定的固体电解质，其显示出极端之间的温度和压力循环的稳定性和完整性。

    Passive injection of a chemical solution into a process stream
    20.
    发明授权
    Passive injection of a chemical solution into a process stream 有权
    将化学溶液无源注入工艺流

    公开(公告)号：US09533270B2

    公开(公告)日：2017-01-03

    申请号：US14298191

    申请日：2014-06-06

    申请人： Robert James Law ,  Robert L Cowan ,  Thomas P Diaz ,  Samson Hettiarachchi

    发明人： Robert James Law ,  Robert L Cowan ,  Thomas P Diaz ,  Samson Hettiarachchi

    IPC分类号： B01F15/04 ,  B01F5/04 ,  G05D11/00 ,  F16K11/00

    CPC分类号： B01F15/0412 ,  B01F5/0495 ,  F16K19/003 ,  G05D11/006 ,  Y10T137/2218

    摘要： A system and method of injecting a chemical into a high pressure process stream without pumps or other active components. The system utilizes the differential pressure created by resistive losses of downstream components within a high pressure process stream. A bypass side stream is taken from an upstream pressure location and returned to the downstream side of the resistive inline process component. The chemical solution vessel is pressurized by the higher side of the pressure differential. The solution then passes through a flow controlling capillary tube exiting on the lower pressure differential side into the bypass stream. The high flow rate chemically diluted bypass stream then returns to the process stream at the lower differential process stream tie-in. The chemical solution is isolated from the process water pressuring the vessel by a movable separating device preventing mixing of the two fluids. The vessel can also be pressurized by gas.

    摘要翻译： 将化学品注入高压工艺流而不使用泵或其他活性组分的系统和方法。 该系统利用由高压工艺流中的下游部件的电阻损耗产生的压差。 旁路侧流从上游压力位置获取，并返回到电阻内联过程组件的下游侧。 化学溶液容器由压力差的较高侧加压。 然后溶液通过从低压差侧出来的流动控制毛细管进入旁路流。 然后，高流量化学稀释的旁路流在较低的差分过程流束缚下返回到过程流。 化学溶液是通过可移动的分离装置从加工水中分离出来的，以防止两种流体的混合。 容器也可以用气体加压。