Photolithography mask repair
    15.
    发明授权
    Photolithography mask repair 有权
    光刻面膜修复

    公开(公告)号:US07662524B2

    公开(公告)日:2010-02-16

    申请号:US12345368

    申请日:2008-12-29

    IPC分类号: G03F1/00 G03C5/00

    CPC分类号: G03F1/74 G03F1/72

    摘要: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.

    摘要翻译: 可以通过创建与原始设计不同的结构来修复面具,但产生相同的空间图像。 例如,可以通过注入镓原子来代替缺少的不透明材料以减少透射,并且可以将石英蚀刻到适当的深度以产生适当的相位。 在另一方面,可以使用激光器或其他装置去除缺陷周围的掩模区域,然后可以使用带电粒子束来构造掩模结构,或者产生相同空间图像的预期设计结构或替代结构 沉积和蚀刻。 例如,电子束可用于沉积石英以改变透射光的相位。 电子束也可与气体一起使用以蚀刻石英以除去包括注入的镓原子的层。 也可以通过提供可以使用例如宽离子束与注入的镓原子一起除去的牺牲层来还原或消除镓染色。 在另一方面,带电粒子束可被编程为使用从两个带电粒子束导出的来自不同角度的缺陷图像的三维信息来蚀刻缺陷。

    Combined hardware and software instrument simulator for use as a teaching aid
    16.
    发明申请
    Combined hardware and software instrument simulator for use as a teaching aid 有权
    组合的硬件和软件仪器模拟器用作教学辅助

    公开(公告)号:US20070020605A1

    公开(公告)日:2007-01-25

    申请号:US11454293

    申请日:2006-06-17

    IPC分类号: G09B25/00

    CPC分类号: G09B25/00 H01J2237/2813

    摘要: An improved simulator for an analytical instrument that provides the student with an experience similar to that of operating the actual instrument. In one preferred embodiment, the invention combines real functionality and simulated functionality where at least one function of the analytical instrument is real. In another preferred embodiment, the invention combines a functional first instrument along with a simulation of a second instrument, the simulation including both hardware with limited functionality and software that simulates the output of a functional instrument to create a teaching aid for use in classrooms and teaching laboratories.

    摘要翻译: 用于分析仪器的改进模拟器,为学生提供与操作实际仪器相似的体验。 在一个优选实施例中,本发明结合了实际功能和模拟功能,其中分析仪器的至少一个功能是真实的。 在另一个优选实施例中,本发明将功能第一仪器与第二仪器的模拟结合在一起,模拟包括具有有限功能的硬件和模拟功能仪器的输出的软件,以创建用于教室和教学中的教学辅助 实验室。