公开(公告)号：US20180350570A1

公开(公告)日：2018-12-06

申请号：US15989518

申请日：2018-05-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hiroki ENDO ,  Katsuyuki KOIZUMI ,  Naohiko OKUNISHI

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683

Abstract: A stage according to an exemplary embodiment has an electrostatic chuck. The electrostatic chuck has a base and a chuck main body. The chuck main body is provided on the base and configured to hold a substrate with electrostatic attractive force. The chuck main body has a plurality of first heaters and a plurality of second heaters. The number of second heaters is larger than the number of first heaters. The first heater controller drives the plurality of first heaters by an alternating current output or a direct current output from a first power source. The second heater controller drives the plurality of second heaters by an alternating current output or a direct current output from a second power source which has electric power lower than electric power of the output from the first power source.

公开(公告)号：US20150262793A1

公开(公告)日：2015-09-17

申请号：US14643667

申请日：2015-03-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohiko OKUNISHI ,  Nozomu NAGASHIMA

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32284 ,  H01J37/32082 ,  H01J37/32155 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32256 ,  H01L21/67069 ,  H01L21/67248 ,  H01L21/6831 ,  H01R13/719 ,  H03H1/0007

Abstract: A resonance frequency can be adjusted by shifting the resonance frequency without reducing an impedance function or a withstanding voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a power feed line from an electrical member other than a high frequency electrode within a processing vessel. Comb teeth M of a comb-teeth member 114 are inserted into winding gaps of air core coils 104(1) and 104(2). For example, first comb teeth M− having a thickness m− smaller than a standard thickness ts are mainly inserted in an effective zone A in a central portion of the air core coils. Further, in non-effective zones B at both sides or both end portions thereof, second comb teeth M+ having a thickness m+ equal to or larger than the standard thickness ts are arranged.

Abstract translation: 可以通过移动谐振频率来调节谐振频率，而不会通过使用分布常数线路的多个并联谐振特性，将引入到高频噪声的高频噪声阻挡在阻塞时，降低阻抗函数或抵抗高频噪声的耐受电压特性 来自处理容器内的高频电极以外的电气部件的供电线。 梳齿构件114的梳齿M插入到空心线圈104（1）和104（2）的卷绕间隙中。 例如，具有小于标准厚度ts的厚度m的第一梳齿M-主要插入空心线圈的中心部分中的有效区域A. 此外，在两侧或两端的非有效区域B中，布置了厚度m +等于或大于标准厚度ts的第二梳齿M +。

公开(公告)号：US20230031368A1

公开(公告)日：2023-02-02

申请号：US17963735

申请日：2022-10-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohiko OKUNISHI ,  Nozomu Nagashima

IPC: H01J37/32 ,  C23C16/458 ,  H01L21/687

Abstract: Provided is a filter device includes: a first coil group including a plurality of coils arranged along a central axis and spirally wound with a first inner diameter; and a second coil group including a plurality of coils arranged along the central axis and spirally wound with a second inner diameter larger than the first inner diameter. A pitch between respective turns of the plurality of coils of the second coil group is larger than a pitch between respective turns of the plurality of coils of the first coil group.

公开(公告)号：US20190318914A1

公开(公告)日：2019-10-17

申请号：US16378956

申请日：2019-04-09

Applicant: Tokyo Electron Limited

Inventor： Naohiko OKUNISHI ,  Hiroshi NAGAHATA ,  Masaru ISAGO ,  Hiraku MURAKAMI

IPC: H01J37/32

Abstract: A processing apparatus that processes an substrate inside a processing container includes a first electrode disposed inside the processing container, the first electrode being configured to mount the substrate, a second electrode disposed so as to face the first electrode, an electric power supply unit configured to apply high frequency power to the first electrode or the second electrode, a coil disposed on a surface opposite to the surface to which the first electrode or the second electrode faces and on a surface of any one of the first electrode and the second electrode, one end of the coil being connected to the any one of the the first electrode and the second electrode, another end of the coil being connected to ground, and an adjusting mechanism configured to control a magnetic field strength of a magnetic field that is from the coil and passes through the coil.

公开(公告)号：US20190295819A1

公开(公告)日：2019-09-26

申请号：US16361464

申请日：2019-03-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohiko OKUNISHI ,  Katsumi SEKIGUCHI ,  Ryuichi YUI

IPC: H01J37/32 ,  H01J37/20

Abstract: In a plasma processing apparatus, a high frequency power source is electrically connected to a lower electrode of a supporting table through a power feeding unit. The power feeding unit is surrounded by a conductor pipe outside the chamber. An electrostatic chuck of the supporting table has therein a plurality of heaters. A filter device is provided between the heaters and a heater controller. The filter device includes a plurality of coil groups, each of the coil groups including two or more coils. In each of the coil groups, the two or more coils are arranged such that winding portions of the two or more coils extend in a spiral shape around a central axis and turns of the winding portions are arranged sequentially and repeatedly, and the coil groups are provided coaxially to the central axis to surround the conductor pipe directly below the chamber.

公开(公告)号：US20180309423A1

公开(公告)日：2018-10-25

申请号：US15961001

申请日：2018-04-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naohiko OKUNISHI ,  Nozomu NAGASHIMA

IPC: H03H7/01 ,  H01L21/67 ,  H01L21/683 ,  H01J37/32 ,  H01F27/28 ,  H01F27/40

CPC classification number: H03H7/0115 ,  H01F27/28 ,  H01F27/40 ,  H01J37/32458 ,  H01J37/32532 ,  H01J37/32724 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/6833 ,  H03H7/1725

Abstract: Provided is a filter device including a plurality of coils, a plural of capacitors, and a frame. The coils constitute a plurality of coil groups. Each coil group includes two or more coils. The two or more coils in each coil group are provided such that respective windings of the two or more coils extend spirally about a central axis and respective turns of the two or more coils are sequentially and repeatedly arranged in an axial direction in which the central axis extends. The coil groups are provided coaxially with the central axis. A pitch between the respective turns of the two or more coils of any one coil group among the coil groups is larger than a pitch between the respective turns of the two or more coils of the coil group provided inside the one coil group among the coil groups.

公开(公告)号：US20150109716A1

公开(公告)日：2015-04-23

申请号：US14519903

申请日：2014-10-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masahiko KONNO ,  Masayuki SHINTAKU ,  Takashi SUZUKI ,  Michitaka AITA ,  Taizo OKADA ,  Naohiko OKUNISHI ,  Hideo KATO ,  Naoki MATSUMOTO

IPC: H01L21/683

CPC classification number: H01L21/6831 ,  H01J37/32192 ,  H01J37/32311 ,  H01J37/32577 ,  H01J37/32715 ,  H01J37/32724 ,  H01L21/67103

Abstract: A plasma processing apparatus includes a mounting table including a lower electrode and an electrostatic chuck, a high frequency power supply electrically connected to the lower electrode, a heater provided in the electrostatic chuck, a heater power supply for supplying a power to the heater, a filter unit including a filter connected to the heater power supply, a rod-shaped power feeder connecting the heater power supply and the heater via the filter, an insulating tubular portion having an inner hole through which the power feeder extends, and a conductive choke portion serving to suppress a microwave propagating through the tubular portion. The choke portion includes a first portion extending from the power feeder in a direction intersecting with a longitudinal direction of the power feeder and a cylindrical second portion extending, between the tubular portion and the power feeder, from a peripheral portion of the first portion.

Abstract translation: 等离子体处理装置包括：安装台，包括下电极和静电卡盘;电连接到下电极的高频电源;设置在静电卡盘中的加热器;向加热器供电的加热器电源; 过滤器单元，包括连接到加热器电源的过滤器，经由过滤器连接加热器电源和加热器的棒状供电器，具有供电器延伸穿过的内孔的绝缘管状部分和导电阻塞部分 用于抑制通过管状部分传播的微波。 扼流部包括从与馈电装置的长度方向交叉的方向从电力馈送器延伸的第一部分，以及在第一部分的周边部分之间延伸的管状部分和供电线之间的圆柱形第二部分。