摘要:
A system for a server room management includes an air-conditioning control device including: an acquisition unit; a setting unit that sets content for generating supply air at temperature, absolute humidity, and relative humidity within target range, based on outside air temperature and humidity as well as return air temperature; and a controller controlling amount of outside air, amount of return air, control amount of humidifier, control amount of cooler, and amount of air blown by blower, based on the content. If the outside air is within range greater than absolute humidity upper limit, or within range greater than enthalpy upper limit and greater than the temperature upper limit, the setting unit compares outside air and return air, and then determines, in accordance with the comparison, whether to set the content so that the cooler performs cooling by minimizing or maximizing the amount of the outside air.
摘要:
According to the embodiment, the air conditioning system for a server changes air conditioning control target values within a certain range when outside air and return air both have higher specific enthalpy than the target state and hence the mixed air of the outside air and the return air cannot be adjusted to air in the target state.
摘要:
A data center is disclosed that includes a container; a server; a rack installed within the container and storing the server; and a curtain fixed to at least one point of the rack or the container and separating an internal space of the container between a cold side and a hot side; wherein the rack is configured to enable the circulation of air from the cold side to the hot side. The curtain is fixed by a removable clamping mechanism. The data center further includes a modular refrigeration unit configured to attach to the container and direct cold air into the cold area. At least one prop is positioned below a bottom of the housing and connected to a container bottom, the prop is configured to absorb vibration of the container or housing.
摘要:
An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.
摘要:
There are provided a culture treatment apparatus and an automatic culture apparatus capable of taking quick and appropriate action even if there is a change in the state of a space where cells stored in a container, such as a culture vessel, for the automatic culture apparatus are subjected to predetermined treatment. The culture treatment apparatus includes a treatment section for applying predetermined treatment to cells stored in an openable container for the automatic culture apparatus in a partitioned space; a detection section for detecting a predetermined state of the space, the detection section being in the space or in the vicinity of the space; and a control section for controlling the treatment section to close the container if the detection section detects the predetermined state with the container opened.
摘要:
A composition that includes a high-valent compound of copper, silver or indium; a linear, branched or cyclic C1-18 alcohol; and a Group VIII metal catalyst forms a metal film of copper, silver or indium on a substrate when the composition is coated on the substrate and heated to reduce the high-valent compound. The composition may alternatively include metal particles of silver, copper or indium in which the surface layer of the particle includes a high-valent compound of copper, silver or indium. A metal film of copper, silver or indium may also be formed on a substrate by coating a substrate with the composition including the metal particles, and heating to reduce the high-valent compound in the same manner as above.
摘要:
An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.
摘要:
To provide a composition with which a metal film can be directly produced from a high-valent metal compound, a method for producing a metal film, and a method for producing a metal powder.Using a composition for production of a metal film of copper, silver or indium, which comprises a high-valent compound of copper, silver or indium, a linear, branched or cyclic C1-18 alcohol and a Group VIII metal catalyst, a coating film is formed, followed by reduction by heating to produce a metal film of copper, silver or indium. Further, using metal particles of silver, copper of indium having a surface layer comprising a high-valent compound of copper, silver or indium, instead of the high-valent compound of copper, silver or indium, a metal film of copper, silver or indium is produced in the same manner as above.
摘要:
A pair of links hangingly support a bearing plate that secures a winding shaft of a shutter curtain. The links are arranged so that the dimension of the space accommodating the links can be minimized. A first link pivots at one end to an end of the bearing plate, adjacent to a shutter guide, and swings at the base end to a side wall of the shutter case so as to project upward away from the shutter guide. A second link pivots at one end to the other end of the bearing plate, away from the shutter guide, and swings at the base end to a portion of the side wall of the shutter case so that the second link extends under the winding shaft toward the shutter guide to bypass the winding shaft. Thus, both the first and second links can be accommodated within the diameter of the winding wheel.