摘要:
An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.
摘要:
An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.
摘要:
Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by cristobalitizing powdery silica raw material; then, fusing the cristobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
摘要:
Highly durable silica glass comprising silica having incorporated therein aluminum and at least one element (M) selected from group 2A elements, group 3A elements and group 4A elements of the periodic table. Preferably, the sum of aluminum and element (M) is at least 30 atomic % based on the amount of total metal elements in the silica glass, and the atomic ratio of aluminum to element (M) is in the range of 0.05 to 20.The silica glass has a high purity and exhibits enhanced durability while good processability and machinability, and reduced dusting property are kept, and the glass is suitable for members of a semiconductor production apparatus or liquid crystal display production apparatus using a halogenated gas and/or its plasma.
摘要:
Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by crystobalitizing powdery silica raw material; then, fusing the crystobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
摘要:
Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.
摘要:
An electrolytic cell capable of controlling the pH and the ORP independently to each other, comprising an electrolytic chamber (113) to which subject water to be electrolyzed are supplied, membranes (115, 115) provided on the both side walls of the electrolytic chamber, a pair of electrode plates (116, 117) respectively provided inside the electrolyzed chamber and outside the electrolytic chamber sandwiching the membrane therebetween, and wherein the electrode plate (116) is provided outside the electrolytic chamber in contact with the membrane (115) or leaving a slight space.
摘要:
A controlling apparatus which can control a continuous electrolytic ion water producing apparatus so that the electrolyzing capacity of an electrolytic cell is kept fixed against a variation of the flow rate or the quality of water upon passage of water to always achieve optimization and stabilization of electrolytic ion water produced. When water flows through the electrolytic cell, it is energized by a power source circuit to electrolyze the water to obtain electrolytic ion water. When a range change-over switch is manually operated, a dc voltage of the power source circuit is controlled in response to the range change-over switch by a control unit and a switching regulator to produce an electrolyzing voltage corresponding to the operated position of the range change-over switch. The water is thus electrolyzed with an electrolyzing strength of the electrolyzing voltage. During such electrolyzing operation, if the flow rate or the water temperature varies, then the pulse width of the switching regulator is corrected to automatically adjust the electrolyzing strength in accordance with the varying condition thereby to always keep the electrolyzing capacity of the electrolytic cell fixed.
摘要:
An electrolytic ionized water producer of a continuous type is disclosed which does not require users to perform complicated operations and which makes it possible to obtain ionized water easily with a simple operation, to remove the fear of obtaining unnecessary ionized water in the case of reversing polarity and, further, to maintain a stable electrolyzing capability for a long time while removing scale in an optimum way in every water supplying operation. Specifically, the electrolytic ionized water producer is provided with a control circuit which operates at least a polarity reversing relay provided in a circuit for applying a DC voltage to a positive electrode and a negative electrode, detects water supply and zero flow water supply with a signal from a flow rate sensor and applies a DC voltage to the respective electrodes at a normal connection position when water is supplied to produce ionized water, sets a scale removing period of time corresponding to a water supplying period of time corresponding to integrated signals from the flow rate sensor, and applies a DC voltage to the respective electrodes at a reverse connection position only for a set period of time of scale removing operation in every water supplying operation.
摘要:
Disclosed is a semiconductor device 1 comprising: a semiconductor chip 10; a multilayer wiring structure 30 stacked on the semiconductor chip 10; and an electronic component 60,80 embedded in the multilayer wiring structure 30.