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19 条记录 (耗时 0.026 秒)

    Lithographic patterning of curved substrates
    12.
    发明授权
    Lithographic patterning of curved substrates 失效
    弯曲基板的平版印刷图案

    公开(公告)号：US06624429B1

    公开(公告)日：2003-09-23

    申请号：US09662182

    申请日：2000-09-14

    申请人： John Charles Wolfe ,  Paul Ruchhoeft

    发明人： John Charles Wolfe ,  Paul Ruchhoeft

    IPC分类号： H01J37302

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

    摘要： For producing an exposure pattern on a curved, in particular concave substrate field of a substrate which comprises a layer of resist material sensitive to exposure to an energetic radiation, in a pattern transfer system a wide, substantially parallel beam of said energetic radiation is produced, and by means of said beam a planar mask having a structure pattern, namely, a set of transparent windows to form a structured beam, is illuminated and the structure pattern is imaged onto the substrate by means of the structured beam, producing a pattern image, namely, a spatial distribution of irradiation over the substrate. The direction of incidence of said beam onto the mask is varied through a sequence of inclinations with respect to the normal axis to the mask, the sequence of inclinations being adapted to merge those exposure pattern components which result from neighboring windows of the structure pattern, the exposure with respect to the sequence of inclinations superposing into a spatial distribution of exposure dose on the substrate, said distribution exceeding the specific minimum exposure dose of said resist material within only one or more regions of the substrate field, said region(s) forming the exposure pattern. The center of curvature of the substrate field is positioned to align with the pattern center on the mask. The windows of the structure pattern are arranged in a manner that along each radius from the pattern center, the radial spacing of said windows decreases with increasing radius from the pattern center; preferably, the windows have uniform area.

    摘要翻译： 为了在基板的弯曲的特别是凹面基板领域产生曝光图案，该基板包括对暴露于能量辐射敏感的抗蚀剂材料层，在图案转印系统中，产生所述能量辐射的宽的基本平行的光束， 并且借助于所述光束，照射具有结构图案的平面掩模，即形成结构光束的一组透明窗口，并且通过结构化光束将结构图案成像到衬底上，产生图案图像， 即基板上的照射的空间分布。 所述光束到掩模上的入射方向通过相对于垂直于掩模的轴线的倾斜序列而变化，倾斜序列适于合并由结构图案的相邻窗口产生的那些曝光图案部件， 相对于叠加在衬底上的曝光剂量的空间分布中的倾斜序列的曝光，所述分布超过仅在衬底场的一个或多个区域内的所述抗蚀剂材料的特定最小曝光剂量，所述区域形成 曝光模式 基板区域的曲率中心定位成与掩模上的图案中心对准。 结构图案的窗口以沿着图案中心的每个半径的方式布置，所述窗口的径向间距随着距图案中心的半径的增加而减小; 优选地，窗户具有均匀的面积。

    Energetic neutral particle lithographic apparatus and process
    15.
    发明申请
    Energetic neutral particle lithographic apparatus and process 有权

    公开(公告)号：US20060124865A1

    公开(公告)日：2006-06-15

    申请号：US10515041

    申请日：2003-05-19

    申请人： John Wolfe ,  Paul Ruchhoeft

    发明人： John Wolfe ,  Paul Ruchhoeft

    IPC分类号： G21G5/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J2237/31752

    摘要： An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a supporting membrane, an energetic neutral particle protective layer on the membrane, and a reproduction member consisting of an energetic neutral particle-sensitive layer between a substrate and the mask for absorbing energetic neutral particles in a pattern created by the mask.

    Template mask lithography utilizing structured beam
    16.
    发明授权
    Template mask lithography utilizing structured beam 有权
    使用结构光束的模板掩模光刻

    公开(公告)号：US06372391B1

    公开(公告)日：2002-04-16

    申请号：US09669288

    申请日：2000-09-25

    申请人： John Charles Wolfe ,  Paul Ruchhoeft

    发明人： John Charles Wolfe ,  Paul Ruchhoeft

    IPC分类号： G03F900

    CPC分类号： G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J37/3174 ,  H01J2237/31788 ,  Y10S430/143

    摘要： For lithographic patterning a plurality of identical structures (24) onto a target substrate (14), a template mask (13) is produced which bears a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one structure element (C) of circular shape. Starting from a primary mask (11) bearing a primary structure pattern consisting of at least one structure element having a circular shape, the production of the template mask is done in at least one lithographic mask structuring step (b, c) wherein in each mask structuring step by means of a broad beam (31) of energetic radiation the mask is illuminated and a structure pattern on the mask (11,12) is imaged onto an intermediate substrate (12a,13a); in these mask structuring steps the pattern image imaged from the structure pattern is moved over the intermediate substrate to a number of different locations. From the intermediate substrate (12a,13a) thus patterned another mask (12,13) having a structure pattern corresponding to the pattern image is produced, respectively. The mask produced from the last of said mask structuring steps is the template mask (13). By means of the template mask (13) a target substrate (14) is patterned in a final lithographic patterning step, the pattern image thus produced comprising a plurality of identical target structures (24).

    摘要翻译： 为了将多个相同的结构（24）平版印刷图案化到目标衬底（14）上，制造模板掩模（13），其具有包括多个相同的模板结构的模板结构图案，每个模板结构由一组至少一个结构 圆形元件（C）。 从具有由至少一个具有圆形形状的结构元件组成的初级结构图案的初级掩模（11）开始，在至少一个光刻掩模结构化步骤（b，c）中进行模板掩模的制备，其中在每个掩模 通过能量辐射的宽光束（31）构造步骤，掩模被照亮，掩模（11,12）上的结构图案被成像到中间基板（12a，13a）上; 在这些掩模结构化步骤中，从结构图案成像的图案图像在中间基板上移动到多个不同的位置。 分别产生具有与图案图像对应的结构图案的另一个掩模（12,13）的中间基板（12a，13a）。 由所述掩模构造步骤中的最后一个产生的掩模是模板掩模（13）。 通过模板掩模（13），目标衬底（14）在最终光刻图案化步骤中被图案化，由此产生的图案图像包括多个相同的目标结构（24）。

    Device and method for manufacturing a particulate filter with regularly spaced micropores
    18.
    发明授权
    Device and method for manufacturing a particulate filter with regularly spaced micropores 有权
    用于制造具有规则间隔的微孔的微粒过滤器的装置和方法

    公开(公告)号：US07960708B2

    公开(公告)日：2011-06-14

    申请号：US11856615

    申请日：2007-09-17

    申请人： John C. Wolfe ,  Paul Ruchhoeft

    发明人： John C. Wolfe ,  Paul Ruchhoeft

    IPC分类号： G21K5/02 ,  G21K5/08

    CPC分类号： G03B27/42 ,  B01D67/0034 ,  B01D71/48 ,  B01D2323/42 ,  B01D2325/028 ,  G03F7/0015 ,  Y10T428/249921

    摘要： Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

    摘要翻译： 各种实施方案公开了用于制造具有规则空间孔的微孔微粒过滤器的装置和方法，其中片膜衬底通过掩模暴露于高能粒子辐射，并且在合适的显影剂中去除损伤区域。 所需的景深是通过使用能量粒子来最小化衍射和具有适当小直径的能量粒子源实现的。

    Energetic neutral particle lithographic apparatus and process
    19.
    发明授权
    Energetic neutral particle lithographic apparatus and process 有权
    能量中性粒子光刻设备和工艺

    公开(公告)号：US07504619B2

    公开(公告)日：2009-03-17

    申请号：US10515041

    申请日：2003-05-19

    申请人： John C. Wolfe ,  Paul Ruchhoeft

    发明人： John C. Wolfe ,  Paul Ruchhoeft

    IPC分类号： H01S1/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  H01J2237/31752

    摘要： An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a supporting membrane, an energetic neutral particle protective layer on the membrane, and a reproduction member consisting of an energetic neutral particle-sensitive layer between a substrate and the mask for absorbing energetic neutral particles in a pattern created by the mask.

    摘要翻译： 公开了一种用于复制亚微米和纳米尺度图案的高能中性粒子光刻设备，其包括通过气体分子的能量离子的电荷转移散射产生包含原子或分子的能量中性粒子束的源，所述掩模构件具有 支撑膜上的开放模板窗，膜上的高能中性颗粒保护层，以及由基材和掩模之间的能量中性粒子敏感层组成的再生构件，用于吸收由掩模形成的图案中的能量中性粒子。