利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

19 条记录 (耗时 0.017 秒)

    Force Mediated Assays
    1.
    发明申请
    Force Mediated Assays 审中-公开
    强制调解

    公开(公告)号：US20120288852A1

    公开(公告)日：2012-11-15

    申请号：US13522319

    申请日：2011-01-15

    申请人： Richard Willson ,  Paul Ruchhoeft

    发明人： Richard Willson ,  Paul Ruchhoeft

    IPC分类号： G01N21/75 ,  G01N21/55 ,  G01N21/65 ,  G01N21/64 ,  G01N21/76 ,  B82Y15/00

    CPC分类号： G01N33/54306 ,  G01N15/10 ,  Y10T436/143333

    摘要： A sensitive and specific method of detecting chemical species, viruses and microorganisms is presented to improve performance of molecular-recognition-based assays utilizing particles decorated with molecular recognition agents such as antibodies and DNA probes, and observing analyte-dependent changes in the response of the particles to forces such as magnetic or gravitational forces or Brownian thermal fluctuations.

    摘要翻译： 提出了一种检测化学物质，病毒和微生物的敏感和具体方法，以提高利用分子识别剂如抗体和DNA探针装饰的颗粒的基于分子识别的测定的性能，并观察分子识别的测定反应中的分析物依赖性变化 颗粒到力或磁力或重力或布朗热波动。

    METHOD FOR TRANSLATING A STRUCTURED BEAM OF ENERGETIC PARTICLES ACROSS A SUBSTRATE IN TEMPLATE MASK LITHOGRAPHY
    5.
    发明申请
    METHOD FOR TRANSLATING A STRUCTURED BEAM OF ENERGETIC PARTICLES ACROSS A SUBSTRATE IN TEMPLATE MASK LITHOGRAPHY 有权
    用于在模板掩模图中通过基板翻转结构化的能量粒子的方法

    公开(公告)号：US20090042137A1

    公开(公告)日：2009-02-12

    申请号：US12026445

    申请日：2008-02-05

    申请人： John C. Wolfe ,  Barry Craver ,  Paul Ruchhoeft

    发明人： John C. Wolfe ,  Barry Craver ,  Paul Ruchhoeft

    IPC分类号： G03F7/20

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y40/00 ,  G03F7/201 ,  G03F7/203 ,  Y10S430/143

    摘要： The present inventors have developed an accurate method for forming a plurality of images on a substrate. The present method provides an improved pattern replication technique that provides submicron resolution, for example 20 nm or less, especially 10 nm or less. The method may involve moving a structured beam of energetic radiation across a target substrate. The motion of an image of the template mask on the substrate is achieved by tilting a mask and substrate assembly relative to the axis of the incident beam. The technique does not require high precision motion of the template mask relative to the target substrate. The energetic radiation may comprise energetic particles. The technique is insensitive to particle energy and can be applied to uncharged, neutral particles.

    摘要翻译： 本发明人开发了在基板上形成多个图像的精确方法。 本方法提供了提供亚微米分辨率的改进的图案复制技术，例如20nm或更小，特别是10nm或更小。 该方法可以涉及将目标基底上的能量辐射的结构化束移动。 通过使掩模和基板组件相对于入射光束的轴线倾斜来实现模板掩模在基板上的图像的运动。 该技术不需要模板掩模相对于目标衬底的高精度运动。 能量辐射可以包括高能粒子。 该技术对粒子能量不敏感，可应用于不带电的中性粒子。

    Lithographic patterning of curved substrates
    7.
    发明授权
    Lithographic patterning of curved substrates 失效
    弯曲基板的平版印刷图案

    公开(公告)号：US06624429B1

    公开(公告)日：2003-09-23

    申请号：US09662182

    申请日：2000-09-14

    申请人： John Charles Wolfe ,  Paul Ruchhoeft

    发明人： John Charles Wolfe ,  Paul Ruchhoeft

    IPC分类号： H01J37302

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

    摘要： For producing an exposure pattern on a curved, in particular concave substrate field of a substrate which comprises a layer of resist material sensitive to exposure to an energetic radiation, in a pattern transfer system a wide, substantially parallel beam of said energetic radiation is produced, and by means of said beam a planar mask having a structure pattern, namely, a set of transparent windows to form a structured beam, is illuminated and the structure pattern is imaged onto the substrate by means of the structured beam, producing a pattern image, namely, a spatial distribution of irradiation over the substrate. The direction of incidence of said beam onto the mask is varied through a sequence of inclinations with respect to the normal axis to the mask, the sequence of inclinations being adapted to merge those exposure pattern components which result from neighboring windows of the structure pattern, the exposure with respect to the sequence of inclinations superposing into a spatial distribution of exposure dose on the substrate, said distribution exceeding the specific minimum exposure dose of said resist material within only one or more regions of the substrate field, said region(s) forming the exposure pattern. The center of curvature of the substrate field is positioned to align with the pattern center on the mask. The windows of the structure pattern are arranged in a manner that along each radius from the pattern center, the radial spacing of said windows decreases with increasing radius from the pattern center; preferably, the windows have uniform area.

    摘要翻译： 为了在基板的弯曲的特别是凹面基板领域产生曝光图案，该基板包括对暴露于能量辐射敏感的抗蚀剂材料层，在图案转印系统中，产生所述能量辐射的宽的基本平行的光束， 并且借助于所述光束，照射具有结构图案的平面掩模，即形成结构光束的一组透明窗口，并且通过结构化光束将结构图案成像到衬底上，产生图案图像， 即基板上的照射的空间分布。 所述光束到掩模上的入射方向通过相对于垂直于掩模的轴线的倾斜序列而变化，倾斜序列适于合并由结构图案的相邻窗口产生的那些曝光图案部件， 相对于叠加在衬底上的曝光剂量的空间分布中的倾斜序列的曝光，所述分布超过仅在衬底场的一个或多个区域内的所述抗蚀剂材料的特定最小曝光剂量，所述区域形成 曝光模式 基板区域的曲率中心定位成与掩模上的图案中心对准。 结构图案的窗口以沿着图案中心的每个半径的方式布置，所述窗口的径向间距随着距图案中心的半径的增加而减小; 优选地，窗户具有均匀的面积。

    System and Method For Nano-Pantography
    9.
    发明申请
    System and Method For Nano-Pantography 有权
    纳米制图系统与方法

    公开(公告)号：US20100132887A2

    公开(公告)日：2010-06-03

    申请号：US12435545

    申请日：2009-05-05

    申请人： Vincent Donnelly ,  Demetre Economou ,  Paul Ruchhoeft ,  Lin Xu ,  Sri Vemula ,  Manish Jain

    发明人： Vincent Donnelly ,  Demetre Economou ,  Paul Ruchhoeft ,  Lin Xu ,  Sri Vemula ,  Manish Jain

    IPC分类号： C23F1/08 ,  B05C5/02

    CPC分类号： B29D11/00365 ,  B82Y30/00

    摘要： A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

    摘要翻译： 提供了一种用于以基本上平行的方式产生多个基本均匀的纳米尺度特征的方法，其中微透镜阵列位于基底的表面上，其中每个微透镜包括孔，使得底部 孔对应于基板表面的一部分。 带电粒子的通量，例如所选元素的正离子束，被施加到微透镜阵列。 带电粒子的通量被聚焦在微透镜阵列的孔的底部的基底表面上的选定的焦点处。 衬底以一个或多个选定的角度倾斜，以便将焦点的位置移动穿过衬底表面。 通过沉积材料或蚀刻衬底的表面，可以以基本上平行的方式在衬底的表面上的每个孔中快速产生几个基本均匀的纳米尺寸的特征。