公开(公告)号：US07298481B2

公开(公告)日：2007-11-20

申请号：US10785395

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Anatoly Fabrikant ,  Mark Ghinovker ,  John Fielden ,  Noah Bareket

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets target that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a plurality of optical signals are measured at a plurality of incident angles, wherein there are predefined offsets between the first and second structures. An overlay error is then determined between the first and second structures by analyzing the measured optical signals at the plurality of incident angles from the periodic targets using a scatterometry overlay technique based on the predefined offsets without using a calibration operation.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标中的每一个，多个光信号以多个入射角测量，其中存在 第一和第二结构之间的预定偏移量。 然后，在不使用校准操作的情况下，通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性靶的多个入射角的测量光信号，从而在第一和第二结构之间确定覆盖误差。

公开(公告)号：US07379183B2

公开(公告)日：2008-05-27

申请号：US10785731

申请日：2004-02-23

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael E. Adel ,  Christopher F. Bevis ,  Paola Dececco ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Mark Ghinovker

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01J4/00 ,  G01N21/55

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.

摘要翻译： 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。

公开(公告)号：US07933016B2

公开(公告)日：2011-04-26

申请号：US12641663

申请日：2009-12-18

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1st diffraction order and a +1st diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1st diffraction order and a +1st diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 提供多个目标。 每个目标包括第一和第二结构的一部分，并且每个目标被设计成在其第一和第二结构部分之间具有偏移。 用电磁辐射照射靶，从而以第一衍射级和+ 1衍射级获得每个靶的光谱。 使用基于检测到的光谱的第一结构和第二结构之间是否存在任何覆盖误差（i）对于每个目标，确定第一衍射级和第+第一衍射之间的第一差分强度 （ii）对于具有第一目标和第二目标的多对目标对，确定第一目标的第一差分强度与第二目标的第一差分强度之间的第二差分强度，以及（iii） 使用基于从每个目标对确定的第二差分强度的散射测量技术来确定第一结构和第二结构之间的任何覆盖误差。

公开(公告)号：US20080094630A1

公开(公告)日：2008-04-24

申请号：US11963730

申请日：2007-12-21

申请人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus Dziura ,  Mark Ghinovker

发明人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00 ,  G01N21/55 ,  G01B9/02

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 在一个实施例中，公开了一种用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的方法。 提供了各自包括第一和第二结构的一部分的目标A，B，C和D。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。 偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。 目标A，B，C和D用电磁辐射照射，以获得光谱S A，B，C，S和S， 分别来自目标A，B，C和D的SUB> D

公开(公告)号：US20080049226A1

公开(公告)日：2008-02-28

申请号：US11926603

申请日：2007-10-29

申请人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant

发明人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

摘要翻译： Disclose是一个组合的散点图标记，包括能够被测量以确定CD或轮廓信息的散射关键维度（CD）或轮廓目标，以及布置在散射测量CD或轮廓目标上的散射测绘覆盖目标，散射测绘覆盖目标与散射光谱CD协调 或轮廓目标以形成能够被测量以确定覆盖的散射测量标记。

公开(公告)号：US07663753B2

公开(公告)日：2010-02-16

申请号：US11963730

申请日：2007-12-21

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Ken Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Ken Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计为具有偏移Xb; 目标C被设计为具有偏移Xc; 并且目标D被设计为具有偏移量Xd。 偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。 目标A，B，C和D用电磁辐射照射，分别从目标A，B，C和D获得光谱SA，SB，SC和SD。 然后使用基于获得的光谱SA，SB，SC和SD的线性近似来确定第一结构和第二结构之间的任何覆盖误差。

公开(公告)号：US20100091284A1

公开(公告)日：2010-04-15

申请号：US12641663

申请日：2009-12-18

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1st diffraction order and a +1st diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1st diffraction order and a +1st diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 提供多个目标。 每个目标包括第一和第二结构的一部分，并且每个目标被设计成在其第一和第二结构部分之间具有偏移。 用电磁辐射照射靶，从而以第一衍射级和+ 1衍射级获得每个靶的光谱。 使用基于检测到的光谱的第一结构和第二结构之间是否存在任何覆盖误差（i）对于每个目标，确定第一衍射级和第+第一衍射之间的第一差分强度 （ii）对于具有第一目标和第二目标的多对目标对，确定第一目标的第一差分强度与第二目标的第一差分强度之间的第二差分强度，以及（iii） 使用基于从每个目标对确定的第二差分强度的散射测量技术来确定第一结构和第二结构之间的任何覆盖误差。

公开(公告)号：US20080024766A1

公开(公告)日：2008-01-31

申请号：US11830798

申请日：2007-07-30

申请人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher Bevis ,  Mark Ghinovker

发明人： Walter Mieher ,  Ady Levy ,  Boris Golovanesky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher Bevis ,  Mark Ghinovker

IPC分类号： G01N21/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.

摘要翻译： 公开了一种用于确定多层样品中至少两层之间的覆盖误差的方法。 成像光学系统用于从样本上的多个周期性目标测量多个测量的光信号。 目标各自具有第一层中的第一结构和第二层中的第二结构。 在第一和第二结构之间有预定义的偏移。 然后使用散射测量覆盖技术来分析周期性目标的测量光信号和周期性目标的第一和第二结构的预定偏移量，从而确定周期性目标的第一和第二结构之间的重叠误差。

公开(公告)号：US09561336B2

公开(公告)日：2017-02-07

申请号：US13380083

申请日：2010-06-24

申请人： Ian Smith

发明人： Ian Smith

IPC分类号： A61M15/00

CPC分类号： A61M15/0045 ,  A61M15/0003 ,  A61M15/0031 ,  A61M15/0048 ,  A61M15/0051 ,  A61M15/0061 ,  A61M2202/064

摘要： Various embodiments relate to a dose unit for a dry powder inhaler including: a dose carrier including a plurality of pockets each adapted to contain a dose of medication powder suitable for inhalation, the pockets being sequentially arranged such that the content of the pockets can be sequentially exposed to a flow of air for successive inhalations and a plurality of medication powder doses arranged in the pockets of the dose carrier. The doses are regularly distributed in the pockets according to a sequence of identical groups, each group including at least one blank pocket and one pocket containing a dose of medication powder. Various embodiments also relate to a pack including one such dose unit and one further dose unit with all pockets containing a medication powder. Various embodiments further relate to a dry powder inhaler including such a pack of dose units.

摘要翻译： 各种实施方案涉及用于干粉吸入器的剂量单位，包括：剂量载体，其包括多个口袋，每个口袋适于容纳适于吸入的一定剂量的药用粉末，所述口袋顺序地布置成使得口袋的内容可以顺序地 暴露于用于连续吸入的空气流和布置在剂量载体的袋中的多个药粉剂量。 剂量根据相同组的顺序规则分布在口袋中，每组包括至少一个空白口袋和一个含有一定剂量的药粉的口袋。 各种实施方案还涉及一种包括一种这样的剂量单位和一个另外的剂量单位，其中所有口袋含有药物粉末。 各种实施方案进一步涉及包含这样一组剂量单位的干粉吸入器。

公开(公告)号：US20100159272A1

公开(公告)日：2010-06-24

申请号：US12653894

申请日：2009-12-17

申请人： Pierre Henri Marois ,  Kevin Michael Gatenby ,  Thomas L. Davisson ,  Andrew D. Howells ,  Ian Smith

发明人： Pierre Henri Marois ,  Kevin Michael Gatenby ,  Thomas L. Davisson ,  Andrew D. Howells ,  Ian Smith

IPC分类号： B32B15/01 ,  B32B1/08 ,  B32B15/20

CPC分类号： C22C21/10 ,  B23K1/0012 ,  B23K35/0238 ,  B23K35/286 ,  B32B15/016 ,  C22C21/00 ,  C22C21/02 ,  C22C21/12 ,  C23F13/08 ,  C23F13/14 ,  C23F2213/32 ,  F28F19/06 ,  F28F21/084 ,  F28F21/089 ,  Y10T428/12736 ,  Y10T428/1275 ,  Y10T428/12764

摘要： The exemplary embodiments relate to a multilayer aluminum alloy sheet material suitable for fabrication into coolant-conveying tubes, headers and the like used for heat exchangers, and to the tubes and headers, etc., fabricated from the sheet. The multi-layer metal sheet has a core layer of aluminum alloy having first and second sides. The first side has an interlayer made of a Zn-containing aluminum alloy positioned between a Zn-containing outer layer and the core layer. The alloy of the outer layer is more electronegative than the alloy of the interlayer. The alloy of the interlayer is preferably more electronegative than the alloy of the core layer. The first side clad in this way is the side intended for exposure to the coolant, and provides good resistance to corrosion and erosion.

摘要翻译： 示例性实施例涉及适于制造用于热交换器的冷却剂输送管，集管等的多层铝合金板材以及由板制成的管和集管等。 多层金属片具有第一和第二侧的铝合金芯层。 第一面具有由位于含Zn外层和芯层之间的含Zn铝合金制成的中间层。 外层的合金比中间层的合金更具电负性。 中间层的合金优选比核心层的合金更具有电负性。 以这种方式包覆的第一面是用于暴露于冷却剂的侧面，并且提供良好的耐腐蚀和侵蚀性。