公开(公告)号：US20130032837A1

公开(公告)日：2013-02-07

申请号：US13238283

申请日：2011-09-21

申请人： Yang-Kuao Kuo ,  Hsin-Liang Chen ,  Chun-Yen Lo ,  Chin-Peng Wang

发明人： Yang-Kuao Kuo ,  Hsin-Liang Chen ,  Chun-Yen Lo ,  Chin-Peng Wang

IPC分类号： H01L33/50 ,  H01L33/44

CPC分类号： H01L33/502

摘要： Disclosed is a fluorescent coating and a method for making the same. At first, fluorescent powder is mixed with an anti-electrostatic solution. The mixture is cleared of impurities before it is dried and sintered. Thus, the fluorescent powder is coated with the anti-electrostatic material. The fluorescent powder coated with the anti-electrostatic material is plated on a side of a light-emitting diode (“LED”) chip by electrophoresis, thus forming a mixing zone on the side of the LED chip. Hence, the mixing zone is not vulnerable to deterioration or itiolation when it is subjected to heat in use. Accordingly, the life of the LED chip is long, and the illumination of the LED chip is high.

摘要翻译： 公开了一种荧光涂层及其制造方法。 首先，将荧光粉与抗静电溶液混合。 混合物在干燥和烧结之前被清除。 因此，荧光粉被抗静电材料涂覆。 用防静电材料涂布的荧光粉末通过电泳电镀在发光二极管（LED）芯片的一侧，从而在LED芯片一侧形成混合区。 因此，混合区在使用时受到热量的影响，不易受到劣化或破坏的影响。 因此，LED芯片的寿命长，LED芯片的照明度高。

公开(公告)号：US08829537B2

公开(公告)日：2014-09-09

申请号：US13239569

申请日：2011-09-22

申请人： Yang-Kuao Kuo ,  Chin-Peng Wang ,  Lea-Hwung Leu

发明人： Yang-Kuao Kuo ,  Chin-Peng Wang ,  Lea-Hwung Leu

IPC分类号： H01L33/00 ,  F21V29/00 ,  H05K1/02 ,  F21V23/00 ,  H05B33/08 ,  H05K1/03 ,  H01L25/075 ,  H05K3/00 ,  F21Y101/02 ,  F21Y105/00

CPC分类号： F21V29/70 ,  F21V23/005 ,  F21V29/004 ,  F21V29/763 ,  F21V29/89 ,  F21Y2105/10 ,  F21Y2115/10 ,  H01L25/0753 ,  H01L2224/73253 ,  H01L2924/0002 ,  H05B33/0803 ,  H05K1/0203 ,  H05K1/0306 ,  H05K3/0061 ,  H05K2201/10106 ,  Y02B20/341 ,  H01L2924/00

摘要： Disclosed is an integrated apparatus including an isolative substrate, a plurality of driver chips provided on a side of the isolative substrate, a power supply provided on the side of the isolative substrate and electrically connected to the driver chips, and LED chips provided on another side of the isolative substrate and electrically connected to the driver chips. Thus, the driver chips, the power supply and the LED chips are integrated on the isolative substrate. The production is easy. The integrated apparatus is not vulnerable to surges and lightning strikes. Electromagnetic interferences are reduced. Heat radiation of the integrated apparatus is excellent so that the LED chips are protected from thermal effect.

摘要翻译： 公开了一种集成装置，包括隔离基板，设置在隔离基板一侧的多个驱动器芯片，设置在隔离基板侧并电连接到驱动器芯片的电源，以及设置在另一侧的LED芯片 的隔离衬底并电连接到驱动器芯片。 因此，驱动器芯片，电源和LED芯片集成在隔离基板上。 生产容易。 综合设备不易受到浪涌和雷击的影响。 电磁干扰减少。 集成设备的散热优良，使LED芯片免受热影响。

公开(公告)号：US07283198B2

公开(公告)日：2007-10-16

申请号：US10999624

申请日：2004-11-30

申请人： Yang-Kuao Kuo

发明人： Yang-Kuao Kuo

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/62 ,  G03C5/00

CPC分类号： G03F7/70783 ,  G03F7/7085 ,  G03F7/70875

摘要： A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a degree of distortion of the reticle. An alarm is connected to the mechanism for activation by the mechanism when the reticle is distorted. The invention further includes a novel method of enhancing the quality of circuit pattern images formed on a wafer during photolithography.

摘要翻译： 公开了一种用于在光刻之前测量掩模版的热条件和变形的掩模版热检测器。 掩模版热检测器包括用于确定掩模版的变形程度的机构。 当标线被扭曲时，通过机构将报警器连接到用于激活的机构。 本发明还包括一种在光刻期间增强在晶片上形成的电路图案图像的质量的新颖方法。

公开(公告)号：US20090057555A1

公开(公告)日：2009-03-05

申请号：US11896622

申请日：2007-09-04

申请人： Yang-Kuao Kuo ,  Kuo-Hsing Teng

发明人： Yang-Kuao Kuo ,  Kuo-Hsing Teng

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J37/09 ,  H01J2237/045

摘要： A scanning electron microscope is provided. The scanning electron microscope includes an electron beam source generating a primary electron beam, a condenser lens converging the primary electron beam, a base plate with a diamond film formed on the surface thereof having an aperture for passing of the primary electron beam, and a scanning unit two-dimensionally scanning a specimen with the primary electron beam.

公开(公告)号：US06907742B2

公开(公告)日：2005-06-21

申请号：US10324405

申请日：2002-12-19

申请人： Yang-Kuao Kuo

发明人： Yang-Kuao Kuo

IPC分类号： H01L21/00 ,  F25D25/00

CPC分类号： H01L21/67109

摘要： An apparatus and method which is particularly suitable for maintaining a wafer at an optimum temperature for the alignment and exposure step during photolithography. The apparatus includes a cooling plate having at least one cooling channel. A coolant is continually circulated through the cooling channel to cool the cooling plate and the wafer resting thereon prior to transfer of the wafer to a wafer stage in a stepper, for example. The cooling plate may be mounted on an OF table inside the stepper and include a central opening for receiving the wafer-engaging shaft of the OF table. The cooling plate maintains all regions of the wafer at substantially the same temperature as the wafer stage in the stepper prior to transfer of the wafer to the wafer stage.

摘要翻译： 特别适用于在光刻期间将晶片保持在用于对准和曝光步骤的最佳温度的装置和方法。 该装置包括具有至少一个冷却通道的冷却板。 例如，在将晶片转移到步进机中的晶片台之前，将冷却剂连续地循环通过冷却通道以冷却冷却板和搁置在其上的晶片。 冷却板可以安装在步进器内的OF台上，并且包括用于接收OF台的晶片接合轴的中心开口。 在将晶片转移到晶片台之前，冷却板将晶片的所有区域保持在步进器中与晶片台基本相同的温度。

公开(公告)号：US20100045959A1

公开(公告)日：2010-02-25

申请号：US12195870

申请日：2008-08-21

申请人： Shin-Hsiang Chou ,  Kuo-Hsing Teng ,  Yang-Kuao Kuo

发明人： Shin-Hsiang Chou ,  Kuo-Hsing Teng ,  Yang-Kuao Kuo

IPC分类号： G03B27/58 ,  H04N7/18

CPC分类号： G03F9/7034 ,  G03F9/7088

摘要： A method for leveling a wafer in a photolithography apparatus is disclosed, including inputting a wafer into the photolithography apparatus to be supported by a chuck, using at least three image capture devices to capture images of corresponding alignment marks on the wafer; and leveling the wafer according to the clarity of the images of the corresponding alignment marks on the wafer captured by the image capture device.

摘要翻译： 公开了一种用于在光刻设备中调平晶片的方法，包括使用至少三个图像捕获设备将晶片输入到光刻设备中以由卡盘支撑，以捕获晶片上相应对准标记的图像; 以及根据由图像捕获装置捕获的晶片上对应的对准标记的图像的清晰度来平整晶片。

公开(公告)号：US07601955B2

公开(公告)日：2009-10-13

申请号：US11896622

申请日：2007-09-04

申请人： Yang-Kuao Kuo ,  Kuo-Hsing Teng

发明人： Yang-Kuao Kuo ,  Kuo-Hsing Teng

IPC分类号： G01N7/00

CPC分类号： H01J37/28 ,  H01J37/09 ,  H01J2237/045

摘要： A scanning electron microscope is provided. The scanning electron microscope includes an electron beam source generating a primary electron beam, a condenser lens converging the primary electron beam, a base plate with a diamond film formed on the surface thereof having an aperture for passing of the primary electron beam, and a scanning unit two-dimensionally scanning a specimen with the primary electron beam.

摘要翻译： 提供扫描电子显微镜。 扫描电子显微镜包括产生一次电子束的电子束源，会聚一次电子束的聚光透镜，在其表面上形成有金刚石膜的基板，其具有用于使一次电子束通过的孔，扫描电子显微镜 单元用一次电子束二维扫描样品。

公开(公告)号：US20060114444A1

公开(公告)日：2006-06-01

申请号：US11000386

申请日：2004-11-30

申请人： Yang-Kuao Kuo

发明人： Yang-Kuao Kuo

IPC分类号： G03B27/58

CPC分类号： G03F7/70783 ,  G03F7/7075 ,  G03F7/70875

摘要： A pattern control system for cooling a wafer prior to a photolithography exposure step. The pattern control system includes a wafer transfer pathway for transferring the wafer in a photolithography process and at least one cooling module provided along the wafer transfer pathway for cooling the wafer. Cooling of the wafers prevents thermal distortion of circuit pattern images formed in a photoresist layer on the wafer during a subsequent photolithography exposure process.

摘要翻译： 一种用于在光刻曝光步骤之前冷却晶片的图案控制系统。 图案控制系统包括用于在光刻工艺中传送晶片的晶片传送路径和沿着晶片传送路径设置的用于冷却晶片的至少一个冷却模块。 在随后的光刻曝光处理期间，晶片的冷却防止在晶片上的光致抗蚀剂层中形成的电路图案图像的热变形。

公开(公告)号：US20060114432A1

公开(公告)日：2006-06-01

申请号：US10999624

申请日：2004-11-30

申请人： Yang-Kuao Kuo

发明人： Yang-Kuao Kuo

IPC分类号： G03B27/52

CPC分类号： G03F7/70783 ,  G03F7/7085 ,  G03F7/70875

摘要： A reticle thermal detector for measuring a thermal condition and distortion of a reticle prior to photolithography is disclosed. The reticle thermal detector includes a mechanism for determining a degree of distortion of the reticle. An alarm is connected to the mechanism for activation by the mechanism when the reticle is distorted. The invention further includes a novel method of enhancing the quality of circuit pattern images formed on a wafer during photolithography.

摘要翻译： 公开了一种用于在光刻之前测量掩模版的热条件和变形的掩模版热检测器。 掩模版热检测器包括用于确定掩模版的变形程度的机构。 当标线被扭曲时，通过该机构将报警器连接到用于激活的机构。 本发明还包括一种在光刻期间提高在晶片上形成的电路图案图像的质量的新颖方法。

公开(公告)号：US20130032826A1

公开(公告)日：2013-02-07

申请号：US13239569

申请日：2011-09-22

申请人： Yang-Kuao Kuo ,  Chin-Peng Wang ,  Lea-Hwung Leu

发明人： Yang-Kuao Kuo ,  Chin-Peng Wang ,  Lea-Hwung Leu

IPC分类号： H01L27/15

CPC分类号： F21V29/70 ,  F21V23/005 ,  F21V29/004 ,  F21V29/763 ,  F21V29/89 ,  F21Y2105/10 ,  F21Y2115/10 ,  H01L25/0753 ,  H01L2224/73253 ,  H01L2924/0002 ,  H05B33/0803 ,  H05K1/0203 ,  H05K1/0306 ,  H05K3/0061 ,  H05K2201/10106 ,  Y02B20/341 ,  H01L2924/00

摘要： Disclosed is an integrated apparatus including an isolative substrate, a plurality of driver chips provided on a side of the isolative substrate, a power supply provided on the side of the isolative substrate and electrically connected to the driver chips, and LED chips provided on another side of the isolative substrate and electrically connected to the driver chips. Thus, the driver chips, the power supply and the LED chips are integrated on the isolative substrate. The production is easy. The integrated apparatus is not vulnerable to surges and lightning strikes. Electromagnetic interferences are reduced. Heat radiation of the integrated apparatus is excellent so that the LED chips are protected from thermal effect.

摘要翻译： 公开了一种集成装置，包括隔离基板，设置在隔离基板一侧的多个驱动器芯片，设置在隔离基板侧并电连接到驱动器芯片的电源，以及设置在另一侧的LED芯片 的隔离衬底并电连接到驱动器芯片。 因此，驱动器芯片，电源和LED芯片集成在隔离基板上。 生产容易。 综合设备不易受到浪涌和雷击的影响。 电磁干扰减少。 集成设备的散热优良，使LED芯片免受热影响。