公开(公告)号：US20100045593A1

公开(公告)日：2010-02-25

申请号：US12312418

申请日：2007-12-04

申请人： Yasushi Washio ,  Hideaki Ikeda ,  Shizuka Maruyama

发明人： Yasushi Washio ,  Hideaki Ikeda ,  Shizuka Maruyama

IPC分类号： G06F3/02 ,  G01D13/00

CPC分类号： G06F3/0338 ,  H01H25/008

摘要： The object of the invention is to provide a directional input device that changes the distance between electrodes that are included in a capacitative element in correspondence with a sliding direction (that is, input direction) to which an input unit is made to slide, thereby changing the electrostatic capacity of the capacitative element.The directional input device according to the invention is a directional input device for detecting an input direction depending on a change in the capacity of a capacitative element. The directional input device is comprising: an input unit, that horizontally slide in correspondence with an input direction allowed to be inputted; a capacitative element, that has a movable electrode and a fixed electrode and is used to detect an input direction inputted to the input unit; and one or more movable portions, that move downward with the sliding of the input unit and make move downward the movable electrode corresponding to the input direction inputted to the input unit together with the downward movement of the movable portions and bring the movable electrode close to the fixed electrode that faces the movable electrode.

摘要翻译： 本发明的目的是提供一种方向输入装置，其改变与输入单元滑动的滑动方向（即，输入方向）对应的电容元件中包括的电极之间的距离，从而改变 电容元件的静电容量。 根据本发明的方向输入装置是用于根据电容元件的容量的变化检测输入方向的方向输入装置。 方向输入装置包括：输入单元，其与允许输入的输入方向相对应地水平滑动; 电容元件，其具有可动电极和固定电极，并且用于检测输入到输入单元的输入方向; 以及一个或多个可移动部分，其随着输入单元的滑动向下移动，并且随着可移动部分的向下移动而与输入到输入单元的输入方向对应的可移动电极向下移动，并使可动电极接近 固定电极面对可动电极。

公开(公告)号：US20070275320A1

公开(公告)日：2007-11-29

申请号：US10547830

申请日：2004-12-03

申请人： Yasushi Washio ,  Koji Saito

发明人： Yasushi Washio ,  Koji Saito

IPC分类号： G03F1/00

CPC分类号： G03F7/0382 ,  G03F7/0392 ,  Y10S430/114 ,  Y10S430/128

摘要： There are provided a stable chemically amplified photoresist composition that undergoes no change in alkali solubility prior to irradiation, a photoresist laminated product produced by laminating the photoresist composition onto a support, and a manufacturing method for a photoresist pattern and a manufacturing method for a connection terminal that use the photoresist composition and the laminated product. A chemically amplified photoresist composition is provided comprising (a) a resin that undergoes a change in alkali solubility under the action of acid, (b) a compound that generates acid on irradiation, and (c) a corrosion inhibitor.

摘要翻译： 提供了稳定的化学放大光致抗蚀剂组合物，其在照射之前不会发生碱溶解度的变化，通过将光致抗蚀剂组合物层压到载体上而制备的光致抗蚀剂层压产品，以及用于光致抗蚀剂图案的制造方法和连接端子的制造方法 使用光致抗蚀剂组合物和层压产品。 提供化学放大光致抗蚀剂组合物，其包含（a）在酸的作用下碱溶性变化的树脂，（b）在照射时产生酸的化合物，和（c）腐蚀抑制剂。

公开(公告)号：US20120141940A1

公开(公告)日：2012-06-07

申请号：US13307911

申请日：2011-11-30

申请人： Takahiro Shimizu ,  Yasushi Washio ,  Tomoyuki Ando ,  Jun Koshiyama

发明人： Takahiro Shimizu ,  Yasushi Washio ,  Tomoyuki Ando ,  Jun Koshiyama

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A chemically amplified positive-type photoresist composition for a thick film capable of forming a thick film resist pattern having superior resolving ability and controllability of dimensions, and being favorable in rectangularity, as well as a method for producing a thick film resist pattern using such a composition. The photoresist composition comprises an acid generator including a cationic moiety and an anionic moiety, and a resin whose alkali solubility increases by the action of an acid.

摘要翻译： 一种用于厚膜的化学放大型正型光致抗蚀剂组合物，其可以形成具有优异的分辨能力和尺寸可控性，并且矩形性好的厚膜抗蚀图案，以及使用这种方法制造厚膜抗蚀剂图案的方法 组成。 光致抗蚀剂组合物包括含有阳离子部分和阴离子部分的酸发生剂，以及碱溶解度随酸的作用而增加的树脂。

公开(公告)号：US20080032242A1

公开(公告)日：2008-02-07

申请号：US11629017

申请日：2005-05-10

申请人： Yasuo Masuda ,  Yasushi Washio ,  Koji Saito

发明人： Yasuo Masuda ,  Yasushi Washio ,  Koji Saito

IPC分类号： G03F7/095 ,  G03F7/00

CPC分类号： G03F7/0035 ,  G03F7/0382 ,  G03F7/095 ,  H05K3/243 ,  H05K2203/0577 ,  H05K2203/1105 ,  H05K2203/1476

摘要： A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is formed by (A) a step of forming a layer of this negative photoresist composition, and then either heating or not heating, before conducting exposure; (B) a step of repeating the step (A) so that the step is performed a total of 2 or more times, thereby superimposing layers of the negative photoresist, and subsequently developing all of these layers simultaneously to form a multilayer resist pattern; and (C) a step of conducting plating treatment within this multilayer resist pattern.

摘要翻译： 提供了能够形成具有大电镀深度的多层镀层产品的方法。 使用包含（a）碱溶性树脂，（b）酸产生剂和（c）其它组分）的负性光致抗蚀剂组合物，并且通过（A）形成该负性光致抗蚀剂层的步骤形成镀覆产物 组成，然后加热或不加热，然后进行曝光; （B）重复步骤（A）的步骤，使步骤总共进行2次以上，由此叠加负性光致抗蚀剂层，随后同时显影所有这些层以形成多层抗蚀剂图案; 和（C）在该多层抗蚀剂图案内进行电镀处理的工序。

公开(公告)号：US20060127825A1

公开(公告)日：2006-06-15

申请号：US10560155

申请日：2004-06-10

申请人： Yasushi Washio ,  Koji Saito

发明人： Yasushi Washio ,  Koji Saito

IPC分类号： G03C5/26

CPC分类号： G03F7/322

摘要： To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprising an anionic surfactant represented by the following general formula (I), and SO42−, the content of S42− being from 0.01 to 1% by mass. In the formula, at least one of R1 and R2 represents an alkyl or alkoxy group having 5 to 18 carbon atoms and the other one represents a hydrogen atom, or an alkyl or alkoxy group having 5 to 18 carbon atoms, and at least one of R3, R4 and R5 represents an ammonium sulfonate group or a sulfonic acid-substituted ammonium group and the others represent a hydrogen atom, an ammonium sulfonate group or a sulfonic acid-substituted ammonium group.

摘要翻译： 提供能够提高抗蚀剂图案的尺寸可控性的抗蚀剂用显影剂组合物。 用于抗蚀剂的显影剂组合物包含有机季铵碱作为主要成分，所述显影剂组合物还包含由以下通式（I）表示的阴离子表面活性剂和SO 4 - / SUP>，其中S 2 的含量为0.01〜1质量％。 在该式中，R 1和R 2中的至少一个表示具有5至18个碳原子的烷基或烷氧基，另一个表示氢原子，或 具有5至18个碳原子的烷基或烷氧基，并且R 3，R 4和R 5中的至少一个表示磺酸铵基团 或磺酸取代的铵基，其余的表示氢原子，磺酸铵基或磺酸取代的铵基。

公开(公告)号：US06838229B2

公开(公告)日：2005-01-04

申请号：US10194298

申请日：2002-07-15

申请人： Yasushi Washio ,  Koji Saito ,  Toshiki Okui ,  Hiroshi Komano

发明人： Yasushi Washio ,  Koji Saito ,  Toshiki Okui ,  Hiroshi Komano

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/38

CPC分类号： G03F7/0045 ,  G03F7/0382 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/128

摘要： A chemically amplified negative photoresist composition is used for the formation of thick films having a thickness of 20 to 150 μm and includes (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation with active light or radiant ray, and (C) a compound which serves as a crosslinking agent in the presence of an acid. The alkali-soluble resin (A) includes (a1) a novolak resin having a weight average molecular weight of from 5000 to 10000, and (a2) a polymer containing at least a hydroxystyrene constitutional unit and having a weight average molecular weight of less than or equal to 5000.

摘要翻译： 化学放大型负性光致抗蚀剂组合物用于形成厚度为20至150μm的厚膜，并且包括（A）碱溶性树脂，（B）在用活性光或辐射线照射时产生酸的化合物 ，和（C）在酸存在下用作交联剂的化合物。 碱溶性树脂（A）包括（a1）重均分子量为5000〜10000的酚醛清漆树脂，（a2）至少含有羟基苯乙烯结构单元且重均分子量小于 或等于5000。

公开(公告)号：US6000886A

公开(公告)日：1999-12-14

申请号：US797458

申请日：1997-02-06

申请人： Yasushi Washio ,  Koji Miyano ,  Akio Fukuda

发明人： Yasushi Washio ,  Koji Miyano ,  Akio Fukuda

IPC分类号： B23B35/00 ,  H05K3/00 ,  B23B41/14 ,  B32B15/01 ,  B32B15/20

CPC分类号： H05K3/0047 ,  B23B35/005 ,  H05K2203/0152 ,  H05K2203/0214 ,  Y10T408/03 ,  Y10T408/55 ,  Y10T408/561 ,  Y10T428/12458 ,  Y10T428/12639 ,  Y10T428/12764

摘要： An entry board for drilling small holes having a front surface layer made of aluminum or aluminum alloy to be disposed at the drilling inlet side and a back surface layer made of aluminum or aluminum alloy to be disposed at the drilling outlet side. The back surface layer is adhered or joined by clad rolling to said front surface layer. The hardness of the front surface layer is smaller than that of the back surface layer.

摘要翻译： 一个用于钻孔的入口板，具有设置在钻孔入口侧的由铝或铝合金制成的前表面层的小孔和由铝或铝合金制成的背面层，以设置在钻孔出口侧。 背面层通过包层轧制粘合或接合到所述前表面层。 前表面层的硬度小于后表面层的硬度。

公开(公告)号：US08105763B2

公开(公告)日：2012-01-31

申请号：US11629017

申请日：2005-05-10

申请人： Yasuo Masuda ,  Yasushi Washio ,  Koji Saito

发明人： Yasuo Masuda ,  Yasushi Washio ,  Koji Saito

IPC分类号： G03F5/00

CPC分类号： G03F7/0035 ,  G03F7/0382 ,  G03F7/095 ,  H05K3/243 ,  H05K2203/0577 ,  H05K2203/1105 ,  H05K2203/1476

摘要： A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is formed by (A) a step of forming a layer of this negative photoresist composition, and then either heating or not heating, before conducting exposure; (B) a step of repeating the step (A) so that the step is performed a total of 2 or more times, thereby superimposing layers of the negative photoresist, and subsequently developing all of these layers simultaneously to form a multilayer resist pattern; and (C) a step of conducting plating treatment within this multilayer resist pattern.

摘要翻译： 提供了能够形成具有大电镀深度的多层镀层产品的方法。 使用包含（a）碱溶性树脂，（b）酸产生剂和（c）其它组分）的负性光致抗蚀剂组合物，并且通过（A）形成该负性光致抗蚀剂层的步骤形成镀覆产物 组成，然后加热或不加热，然后进行曝光; （B）重复步骤（A）的步骤，使步骤总共进行2次以上，由此叠加负性光致抗蚀剂层，随后同时显影所有这些层以形成多层抗蚀剂图案; 和（C）在该多层抗蚀剂图案内进行电镀处理的工序。

公开(公告)号：US20070105037A1

公开(公告)日：2007-05-10

申请号：US10578398

申请日：2004-11-18

申请人： Yasushi Washio ,  Koji Saito

发明人： Yasushi Washio ,  Koji Saito

IPC分类号： G03C1/00

CPC分类号： G03F7/033 ,  G03F7/405 ,  Y10S430/106 ,  Y10S430/114

摘要： A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing a hydroxyl group, (B) a polymerizable compound containing at least one ethylenic unsaturated double bond, (C) a photopolymerization initiator, and (D) an organic solvent.

摘要翻译： 提供了具有改善的碱显影性的负厚膜光致抗蚀剂组合物。 该组合物包含：（A）含有（a）61〜90重量％的衍生自（甲基）丙烯酸环状烷基酯的结构单元的树脂成分，（b）衍生自含有 羟基，（B）含有至少一个烯属不饱和双键的聚合性化合物，（C）光聚合引发剂，（D）有机溶剂。

公开(公告)号：US20060154158A1

公开(公告)日：2006-07-13

申请号：US10561802

申请日：2004-06-22

申请人： Yasushi Washio ,  Koji Saito

发明人： Yasushi Washio ,  Koji Saito

IPC分类号： G03C5/00

CPC分类号： G03F7/322

摘要： A developer composition for resists which has a high dissolution rate (high developing sensitivity). The developer composition for resists is a developer composition for resists, comprising an organic quaternary ammonium base as a main component and a surfactant, said surfactant containing an anionic surfactant represented by the following general formula (I): wherein at least one member of R1 and R2 represents an alkyl or alkoxy group having 5 to 18 carbon atoms and any reminder member represents a hydrogen atom, or an alkyl or alkoxy group having 5 to 18 carbon atoms, and at least onemember of R3, R4 and R5 represents a group represented by the following general formula (II): [Chemical Formula 2] —SO3M  (II) wherein M represents a metal atom, and any reminder member represents a hydrogen atom or a group represented by the above general formula (II).

摘要翻译： 具有高溶解速率（高显影灵敏度）的抗蚀剂用显影剂组合物。 抗蚀剂用显影剂组合物是含有有机季铵碱作为主要成分的抗蚀剂用显影剂组合物和表面活性剂，所述表面活性剂含有下述通式（I）表示的阴离子性表面活性剂：其中， SUB> 1和R 2表示具有5至18个碳原子的烷基或烷氧基，任何提醒构件表示氢原子或具有5至18个碳原子的烷基或烷氧基 ，并且R 3 3，R 4和R 5的至少一部分表示由以下通式（II）表示的基团：[化学式 公式2] <？in-line-formula description =“In-line Formulas”end =“lead”？> - SO 3 M（II）<？in-line-formula description =“In 其中M表示金属原子，任何提醒成员均表示氢原子或上述通式（II）表示的基团。