利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

58 条记录 (耗时 0.043 秒)

    MAGNETIC WRITE HEAD HAVING A SELF-ALIGNED SIDE WRAP-AROUND SHIELD WITH MULTI-ANGLE SLANTED BUMP
    13.
    发明申请
    MAGNETIC WRITE HEAD HAVING A SELF-ALIGNED SIDE WRAP-AROUND SHIELD WITH MULTI-ANGLE SLANTED BUMP 有权
    具有多角度凸起的自对准侧面封装的磁头写头

    公开(公告)号：US20100157472A1

    公开(公告)日：2010-06-24

    申请号：US12343709

    申请日：2008-12-24

    申请人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/10 ,  B44C1/22

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.

    摘要翻译： 一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。 屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。 该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。 护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

    Magnetic write head having a self-aligned side wrap-around shield with multi-angle slanted bump
    14.
    发明授权
    Magnetic write head having a self-aligned side wrap-around shield with multi-angle slanted bump 有权
    具有具有多角度倾斜凸起的自对准侧包绕屏蔽的磁性写头

    公开(公告)号：US08422168B2

    公开(公告)日：2013-04-16

    申请号：US12343709

    申请日：2008-12-24

    申请人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.

    摘要翻译： 一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。 屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。 该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。 护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

    METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH STEPPED TRAILING MAGNETIC SHIELD WITH ELECTRICAL LAPPING GUIDE CONTROL
    15.
    发明申请
    METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH STEPPED TRAILING MAGNETIC SHIELD WITH ELECTRICAL LAPPING GUIDE CONTROL 有权
    使用带电导线控制的步进式磁屏蔽制造全磁性写磁头的方法

    公开(公告)号：US20090152235A1

    公开(公告)日：2009-06-18

    申请号：US11956292

    申请日：2007-12-13

    申请人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： B44C1/22

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

    摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.

    摘要翻译： 一种用于制造具有阶梯式后挡板的磁写头的方法。 在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。 该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。 研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

    Method of manufacturing a perpendicular magnetic write head with stepped trailing magnetic shield with electrical lapping guide control
    16.
    发明授权
    Method of manufacturing a perpendicular magnetic write head with stepped trailing magnetic shield with electrical lapping guide control 有权
    使用带电研磨导向器控制的具有阶梯式后跟磁屏蔽的垂直磁性写头的制造方法

    公开(公告)号：US07990651B2

    公开(公告)日：2011-08-02

    申请号：US11956292

    申请日：2007-12-13

    申请人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/187

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

    摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.

    摘要翻译： 一种用于制造具有阶梯式后挡板的磁写头的方法。 在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。 该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。 研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

    Method for manufacturing a perpendicular magnetic write head with a wrap around shield
    17.
    发明授权
    Method for manufacturing a perpendicular magnetic write head with a wrap around shield 有权
    用于围绕屏蔽制造垂直磁写头的方法

    公开(公告)号：US08066892B2

    公开(公告)日：2011-11-29

    申请号：US12241751

    申请日：2008-09-30

    申请人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.

    摘要翻译： 一种用于制造用于垂直磁写头的写极的方法。 该方法采用镶嵌工艺构造具有非常精确控制的轨道宽度的写极点。 该方法包括沉积可以通过反应离子蚀刻容易地去除的材料层。 该材料可以称为可分级材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻以在RIEAble材料中形成锥形沟槽。 可以将CMP停止层沉积，并将写入极电镀到沟槽中。 然后可以执行CMP以限定写入极的后沿。 可以执行另一掩模，蚀刻和电镀步骤以形成拖尾的环绕磁屏蔽。

    METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH A WRAP AROUND SHIELD
    18.
    发明申请
    METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH A WRAP AROUND SHIELD 有权
    用于制造具有附着力的扁平磁头写入头的方法

    公开(公告)号：US20100078406A1

    公开(公告)日：2010-04-01

    申请号：US12241751

    申请日：2008-09-30

    申请人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Yimin Hsu ,  Ming Jiang ,  Sue Siyang Zhang

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.

    摘要翻译： 一种用于制造用于垂直磁写头的写极的方法。 该方法采用镶嵌工艺构造具有非常精确控制的轨道宽度的写极点。 该方法包括沉积可以通过反应离子蚀刻容易地去除的材料层。 该材料可以称为可分级材料。 在RIEable材料上形成掩模，并执行反应离子蚀刻以在RIEAble材料中形成锥形沟槽。 可以将CMP停止层沉积，并将写入极电镀到沟槽中。 然后可以执行CMP以限定写入极的后沿。 可以执行另一掩模，蚀刻和电镀步骤以形成拖尾的环绕磁屏蔽。