公开(公告)号：US20090152235A1

公开(公告)日：2009-06-18

申请号：US11956292

申请日：2007-12-13

申请人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.

摘要翻译： 一种用于制造具有阶梯式后挡板的磁写头的方法。 在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。 该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。 研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

公开(公告)号：US07990651B2

公开(公告)日：2011-08-02

申请号：US11956292

申请日：2007-12-13

申请人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Hieu Lam ,  Vladimir Nikitin ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/187

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3166 ,  G11B5/3169

摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.

摘要翻译： 一种用于制造具有阶梯式后挡板的磁写头的方法。 在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。 该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。 研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

公开(公告)号：US08108985B2

公开(公告)日：2012-02-07

申请号：US11934687

申请日：2007-11-02

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括形成写极，然后沉积补充层。 掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。 然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。 然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。 缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

公开(公告)号：US08503131B2

公开(公告)日：2013-08-06

申请号：US13339310

申请日：2011-12-28

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.

摘要翻译： 用于垂直磁数据记录的磁写头。 写入头包括形成在衬底上的衬底和磁性写入磁极，写入极具有后缘和第一和第二侧。 在磁性写入磁极的一部分上形成有磁性的缝合磁极，缝合的磁极具有限定二次闪光点的前部边缘。 第一和第二非磁性侧壁形成在写入极的第一和第二侧。 所述非磁性侧壁在靠近空气支承表面的第一区域中从所述基板至少延伸到所述写柱的后缘，并且其中所述第一和第二非磁性侧壁从所述基板延伸到所述基板之间的点 和后缘，允许缝合的磁极部分地延伸在写柱的侧面上。

公开(公告)号：US08085497B2

公开(公告)日：2011-12-27

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20100157474A1

公开(公告)日：2010-06-24

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

公开(公告)号：US20120107645A1

公开(公告)日：2012-05-03

申请号：US13339310

申请日：2011-12-28

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/33 ,  G11B5/127

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括形成写极，然后沉积补充层。 掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。 然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。 然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。 缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

公开(公告)号：US20090117407A1

公开(公告)日：2009-05-07

申请号：US11934687

申请日：2007-11-02

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： B05D5/12 ,  G11B5/33

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括形成写极，然后沉积补充层。 掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。 然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。 然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。 缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

公开(公告)号：US07212380B2

公开(公告)日：2007-05-01

申请号：US10831834

申请日：2004-04-26

申请人： Wen-Chien David Hsiao ,  Wipul Pemsiri Jayaekara ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Patrick Rush Webb ,  Sue Siyang Zhang

发明人： Wen-Chien David Hsiao ,  Wipul Pemsiri Jayaekara ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Patrick Rush Webb ,  Sue Siyang Zhang

IPC分类号： G11B5/31 ,  G11B5/187 ,  G11B5/255 ,  G11B5/39

CPC分类号： G11B5/1278 ,  G11B5/3143

摘要： A magnetoresistive read/write head having a first layer of alumina and a second layer of silicon dioxide overlaying a P3 layer of the head. In a preferred embodiment, the silicon dioxide layer is recessed away from an Air Bearing Surface (ABS) to reduce protrusion of a P2 layer and the P3 layer in the head, and to reduce degradation in the magnetic properties of the pole tips of the P2 and P3 layer ends.

摘要翻译： 具有第一氧化铝层和覆盖头部的P3层的第二二氧化硅层的磁阻读写头。 在优选实施例中，二氧化硅层从空气轴承表面（ABS）凹入，以减少P2层和P3中头部的突出，并减少P2的极尖的磁性能的降低 和P3层结束。

公开(公告)号：US08422168B2

公开(公告)日：2013-04-16

申请号：US12343709

申请日：2008-12-24

申请人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.

摘要翻译： 一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。 屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。 该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。 护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。