Semiconductor light emitting element
    12.
    发明授权
    Semiconductor light emitting element 有权
    半导体发光元件

    公开(公告)号:US09252330B2

    公开(公告)日:2016-02-02

    申请号:US13813792

    申请日:2011-08-05

    摘要: A semiconductor light-emitting element according to the present invention includes: an n-type nitride semiconductor layer 21; a p-type nitride semiconductor layer 23; an active layer region 22 which includes an m plane nitride semiconductor layer and which is interposed between the n-type nitride semiconductor layer and the p-type nitride semiconductor layer; an n-type electrode 30 which is electrically connected to the n-type nitride semiconductor layer; a p-type electrode 40 which is electrically connected to the p-type nitride semiconductor layer; a light-emitting face, through which polarized light that has been produced in the active layer region is extracted out of this element; and a striped structure 50 which is provided for the light-emitting face and which has a plurality of projections that run substantially parallel to the a-axis direction of the m plane nitride semiconductor layer.

    摘要翻译: 根据本发明的半导体发光元件包括:n型氮化物半导体层21; p型氮化物半导体层23; 包括m面氮化物半导体层并且介于n型氮化物半导体层和p型氮化物半导体层之间的有源层区域22; 与n型氮化物半导体层电连接的n型电极30; 与p型氮化物半导体层电连接的p型电极40; 从该元件中提取出在有源层区域中产生的偏振光的发光面; 以及条形结构50,其被设置用于发光面,并且具有大致平行于m面氮化物半导体层的a轴方向延伸的多个突起。

    Nitride-based semiconductor device and method for fabricating the same
    13.
    发明授权
    Nitride-based semiconductor device and method for fabricating the same 有权
    基于氮化物的半导体器件及其制造方法

    公开(公告)号:US08748899B2

    公开(公告)日:2014-06-10

    申请号:US13447368

    申请日:2012-04-16

    摘要: A nitride-based semiconductor device according to the present disclosure includes a nitride-based semiconductor multilayer structure 20 with a p-type semiconductor region, of which the surface 12 defines a tilt angle of one to five degrees with respect to an m plane, and an electrode 30, which is arranged on the p-type semiconductor region. The p-type semiconductor region is made of an AlxInyGazN (where x+y+z=1, x≧0, y≧0 and z≧0) semiconductor layer 26. The electrode 30 includes an Mg layer 32, which is in contact with the surface 12 of the p-type semiconductor region, and a metal layer 34 formed on the Mg layer 32. The metal layer 34 is formed from at least one metallic element that is selected from the group consisting of Pt, Mo and Pd.

    摘要翻译: 根据本公开的氮化物基半导体器件包括具有p型半导体区域的氮化物基半导体多层结构20,其表面12相对于m平面限定1至5度的倾斜角,以及 布置在p型半导体区域上的电极30。 p型半导体区域由Al x In y Ga z N(其中x + y + z = 1,x≥0,y≥0和z≥0)半导体层26制成。电极30包括Mg层32,其接触 与p型半导体区域的表面12以及形成在Mg层32上的金属层34.金属层34由选自Pt,Mo和Pd中的至少一种金属元素形成。

    SEMICONDUCTOR LIGHT-EMITTING ELEMENT
    14.
    发明申请
    SEMICONDUCTOR LIGHT-EMITTING ELEMENT 审中-公开
    半导体发光元件

    公开(公告)号:US20130126901A1

    公开(公告)日:2013-05-23

    申请号:US13813777

    申请日:2011-08-05

    IPC分类号: H01L33/32

    摘要: A semiconductor light-emitting element according to the present invention includes: an n-type nitride semiconductor layer 21; a p-type nitride semiconductor layer 23; an active layer region 22 which includes an m-plane nitride semiconductor layer and which is interposed between the n- and p-type nitride semiconductor layers; an n-type electrode 30 which is electrically connected to the n-type nitride semiconductor layer; a p-type electrode 40 which is electrically connected to the p-type nitride semiconductor layer; a light-emitting face, through which polarized light that has been produced in the active layer region is extracted out of this element; and a striped structure 50 which is provided for the light-emitting face and which has a plurality of projections that run in a direction that defines either an angle of 5 degrees to 80 degrees or an angle of −80 degrees to −5 degrees with respect to the a-axis direction of the m-plane nitride semiconductor layer.

    摘要翻译: 根据本发明的半导体发光元件包括:n型氮化物半导体层21; p型氮化物半导体层23; 包括m面氮化物半导体层并且介于n型和p型氮化物半导体层之间的有源层区22。 与n型氮化物半导体层电连接的n型电极30; 与p型氮化物半导体层电连接的p型电极40; 从该元件中提取出在有源层区域中产生的偏振光的发光面; 以及条形结构50,其被设置用于发光面,并且具有多个突起,该多个突起在限定5度至80度的角度或-80度至-5度的角度的方向上延伸,相对于 相对于m面氮化物半导体层的a轴方向。

    Method for fabricating nitride-based semiconductor device having electrode on m-plane
    15.
    发明授权
    Method for fabricating nitride-based semiconductor device having electrode on m-plane 有权
    一种在m面上具有电极的氮化物基半导体器件的制造方法

    公开(公告)号:US08318594B2

    公开(公告)日:2012-11-27

    申请号:US12937756

    申请日:2010-03-17

    IPC分类号: H01L21/3205

    摘要: A nitride-based semiconductor light-emitting device 100 includes: a GaN substrate 10 with an m-plane surface 12; a semiconductor multilayer structure 20 provided on the m-plane surface 12 of the GaN substrate 10; and an electrode 30 provided on the semiconductor multilayer structure 20. The electrode 30 includes an Mg layer 32 and an Ag layer 34 provided on the Mg layer 32. The Mg layer 32 is in contact with a surface of a p-type semiconductor region of the semiconductor multilayer structure 20.

    摘要翻译: 氮化物系半导体发光装置100具备:具有m面面12的GaN衬底10; 设置在GaN衬底10的m面表面12上的半导体多层结构20; 以及设置在半导体层叠结构体20上的电极30.电极30包括设置在Mg层32上的Mg层32和Ag层34.Mg层32与p型半导体区域的表面接触 半导体多层结构20。

    Nitride-based semiconductor device having electrode on m-plane
    16.
    发明授权
    Nitride-based semiconductor device having electrode on m-plane 有权
    在m面上具有电极的氮化物半导体器件

    公开(公告)号:US08299490B2

    公开(公告)日:2012-10-30

    申请号:US13167026

    申请日:2011-06-23

    IPC分类号: H01L33/00

    摘要: A nitride-based semiconductor light-emitting device 100 includes: a GaN substrate 10 with an m-plane surface 12; a semiconductor multilayer structure 20 provided on the m-plane surface 12 of the GaN substrate 10; and an electrode 30 provided on the semiconductor multilayer structure 20. The electrode 30 includes an Mg layer 32 and an Ag layer 34 provided on the Mg layer 32. The Mg layer 32 is in contact with a surface of a p-type semiconductor region of the semiconductor multilayer structure 20.

    摘要翻译: 氮化物系半导体发光装置100具备:具有m面面12的GaN衬底10; 设置在GaN衬底10的m面表面12上的半导体多层结构20; 以及设置在半导体层叠结构体20上的电极30.电极30包括设置在Mg层32上的Mg层32和Ag层34.Mg层32与p型半导体区域的表面接触 半导体多层结构20。

    Nitride semiconductor light-emitting element, illuminating device, liquid crystal display device, method for producing nitride semiconductor light-emitting element and method for manufacturing illuminating device
    17.
    发明授权
    Nitride semiconductor light-emitting element, illuminating device, liquid crystal display device, method for producing nitride semiconductor light-emitting element and method for manufacturing illuminating device 有权
    氮化物半导体发光元件,照明装置,液晶显示装置,氮化物半导体发光元件的制造方法及照明装置的制造方法

    公开(公告)号:US08791473B2

    公开(公告)日:2014-07-29

    申请号:US13256529

    申请日:2009-07-09

    IPC分类号: H01L33/32

    摘要: An illuminating device according to the present invention includes at least a first nitride-based semiconductor light-emitting element and a second nitride-based semiconductor light-emitting element, in which: the first nitride-based semiconductor light-emitting element and the second nitride-based semiconductor light-emitting element each include a semiconductor chip; the semiconductor chip includes a nitride-based semiconductor multilayer structure 45 formed from an AlxInyGazN (x+y+z=1, x≧0, y≧0, z≧0) semiconductor, and the nitride-based semiconductor multilayer structure 20 includes an active layer region 24 having an m-plane as an interface; the first nitride-based semiconductor light-emitting element and the second nitride-based semiconductor light-emitting element each emit polarized light from the active layer region 24; and, when the polarized light emitted from the first nitride-based semiconductor light-emitting element and the polarized light emitted from the second nitride-based semiconductor light-emitting element have wavelengths λ1 and λ2, respectively, and thicknesses of the semiconductor chips 45 of the first nitride-based semiconductor light-emitting element and the second nitride-based semiconductor light-emitting element are given as d1 and d2, respectively, the following relations are satisfied: λ1

    摘要翻译: 根据本发明的照明装置至少包括第一氮化物基半导体发光元件和第二氮化物基半导体发光元件,其中:第一氮化物基半导体发光元件和第二氮化物半导体发光元件 半导体发光元件各自包括半导体芯片; 半导体芯片包括由Al x In y Ga z N(x + y + z = 1,x≥0,y≥0,z≥0)形成的氮化物基半导体多层结构45,氮化物类半导体多层结构20包括 具有m面作为界面的有源层区域24; 第一氮化物系半导体发光元件和第二氮化物系半导体发光元件均从有源层区域24发射偏振光; 并且当从第一氮化物基半导体发光元件发射的偏振光和从第二氮化物基半导体发光元件发出的偏振光分别具有波长λ1和λ2时,半导体芯片45的厚度 第一氮化物系半导体发光元件和第二氮化物系半导体发光元件分别赋予d1和d2,满足以下关系:λ1<λ2和d1

    Method for fabricating nitride-based semiconductor device having electrode on m-plane
    19.
    发明授权
    Method for fabricating nitride-based semiconductor device having electrode on m-plane 有权
    一种在m面上具有电极的氮化物基半导体器件的制造方法

    公开(公告)号:US08357607B2

    公开(公告)日:2013-01-22

    申请号:US12936960

    申请日:2010-03-09

    IPC分类号: H01L21/3205

    摘要: A nitride-based semiconductor light-emitting device 100 includes a GaN substrate 10, of which the principal surface is an m-plane 12, a semiconductor multilayer structure 20 that has been formed on the m-plane 12 of the GaN-based substrate 10, and an electrode 30 arranged on the semiconductor multilayer structure 20. The electrode 30 includes an Mg alloy layer 32 which is formed of Mg and a metal selected from a group consisting of Pt, Mo, and Pd. The Mg alloy layer 32 is in contact with a surface of a p-type semiconductor region of the semiconductor multilayer structure 20.

    摘要翻译: 氮化物系半导体发光器件100包括其主表面是m面12的GaN衬底10,已经形成在GaN基衬底10的m面12上的半导体多层结构20 以及布置在半导体多层结构20上的电极30.电极30包括由Mg和选自Pt,Mo和Pd的金属形成的Mg合金层32。 Mg合金层32与半导体多层结构体20的p型半导体区域的表面接触。

    Nitride-based semiconductor device having electrode on m-plane
    20.
    发明授权
    Nitride-based semiconductor device having electrode on m-plane 有权
    在m面上具有电极的氮化物半导体器件

    公开(公告)号:US08309984B2

    公开(公告)日:2012-11-13

    申请号:US13167865

    申请日:2011-06-24

    IPC分类号: H01L33/00

    摘要: A nitride-based semiconductor light-emitting device 100 includes a GaN substrate 10, of which the principal surface is an m-plane 12, a semiconductor multilayer structure 20 that has been formed on the m-plane 12 of the GaN-based substrate 10, and an electrode 30 arranged on the semiconductor multilayer structure 20. The electrode 30 includes an Mg alloy layer 32 which is formed of Mg and a metal selected from a group consisting of Pt, Mo, and Pd. The Mg alloy layer 32 is in contact with a surface of a p-type semiconductor region of the semiconductor multilayer structure 20.

    摘要翻译: 氮化物系半导体发光器件100包括其主表面是m面12的GaN衬底10,已经形成在GaN基衬底10的m面12上的半导体多层结构20 以及布置在半导体多层结构20上的电极30.电极30包括由Mg和选自Pt,Mo和Pd的金属形成的Mg合金层32。 Mg合金层32与半导体多层结构体20的p型半导体区域的表面接触。