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公开(公告)号：US07414148B2
公开(公告)日：2008-08-19
申请号：US11923197
申请日：2007-10-24
IPC分类号： C07C309/57 , C07C309/19
CPC分类号： C07C313/04 , C07C303/02 , C07C303/32 , C07C381/12 , C07C2603/74 , C07C309/17
摘要： A process for producing an alkoxycarbonylfluoroalkanesulfonate represented by the formula [1] is provided. This process includes the steps of (a) reacting a halofluoroalkanoate represented by the formula [2], with a sulfinating agent, thereby obtaining an alkoxycarbonylfluoroalkanesulfinate represented by the formula [3]; and (b) reacting the alkoxycarbonylfluoroalkanesulfinate with an oxidizing agent, thereby obtaining the target alkoxycarbonylfluoroalkanesulfonate. Furthermore, it is possible to react the obtained alkoxycarbonylfluoroalkanesulfonate with a monovalent onium salt to conduct a salt exchange, thereby obtaining a alkoxycarbonylfluoroalkanesulfonic acid onium salt represented by the formula [4].
摘要翻译： 提供由式[1]表示的制备烷氧基羰基氟烷基磺酸盐的方法。 该方法包括以下步骤：（a）使由式[2]表示的卤氟烷酸酯与硫酸化剂反应，从而得到由式[3]表示的烷氧基羰基氟烷基亚磺酸酯。 和（b）使烷氧基羰基氟亚烷基亚磺酸酯与氧化剂反应，从而得到目标烷氧基羰基氟烷基磺酸酯。 此外，可以使所得到的烷氧基羰基氟烷基磺酸盐与单价鎓盐进行盐交换，从而得到由式[4]表示的烷氧基羰基氟烷基磺酸鎓盐。
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12.发明授权公开(公告)号：US08304508B2
公开(公告)日：2012-11-06
申请号：US13195375
申请日：2011-08-01
IPC分类号： C08G63/685
CPC分类号： C08G63/6826 , C07C65/01 , C08G73/22
摘要： A fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
摘要翻译： 由式（1）表示的含氟二羧酸，其中n表示1-4的整数，并且所述两个羧基在芳香环上彼此不相邻。 可以通过使含氟二羧酸与共聚单体（例如二氨基二醇）反应来获得线型高分子化合物。 通过热环化，该线性高分子化合物可以转化为具有优异特性的另一种高分子化合物。
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13.发明授权公开(公告)号：US08003749B2
公开(公告)日：2011-08-23
申请号：US12174414
申请日：2008-07-16
IPC分类号： C08G75/00
CPC分类号： C08G63/6826 , C07C65/01 , C08G73/22
摘要： Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
摘要翻译： 公开了由式（1）表示的含氟二羧酸，其中n表示1-4的整数，并且两个羧基在芳环上彼此不相邻。 可以通过使含氟二羧酸与共聚单体（例如二氨基二醇）反应来获得线型高分子化合物。 通过热环化，该线性高分子化合物可以转化为具有优异特性的另一种高分子化合物。
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14.发明申请Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method 有权含氟化合物，含氟聚合物化合物，抗蚀剂组合物，顶层组合物和图案形成方法公开(公告)号：US20120077126A1
公开(公告)日：2012-03-29
申请号：US13375026
申请日：2010-05-20
申请人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/20 , G03F7/004 , C07C69/593 , C08K5/05 , C07C69/54 , C08F214/18 , C09D127/12
CPC分类号： C07C69/653 , C07C69/675 , C07C69/732 , C07C2602/42 , C07C2603/68 , C08F220/24 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
摘要翻译： 本发明的含氟聚合物含有通式（2）的重复单元（a），其质均分子量为1,000〜1,000,000。 该聚合物适用于通过300nm或更小波长或电子束辐射的高能量射线辐射或用于液浸光刻的面漆组合物的图案形成用抗蚀剂组合物，其特征在于具有高的拒水性，特别是高后退接触角 。 在该式中，R 1表示含有可聚合双键的基团; R2表示氟原子或含氟烷基; R8表示取代或未取代的烷基等; W1表示单键，取代或未取代的亚甲基等。
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公开(公告)号：US20120004447A1
公开(公告)日：2012-01-05
申请号：US13256101
申请日：2010-03-12
IPC分类号： C07C309/69 , C07C313/06
CPC分类号： C07C313/04 , C07C303/32 , C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C07C309/08 , C07C309/12
摘要： An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like.
摘要翻译： 通过使用有机碱，同时用硫酸化剂硫化溴氟醇来获得羟基氟烷基亚磺酸铵。 通过氧化羟基氟烷基亚磺酸铵得到羟基氟烷基磺酸铵。 通过酯化将羟基氟烷基磺酸铵转化成鎓盐得到氟代烷基磺酸鎓鎓盐。 该氟鎓烷基磺酸鎓可用作化学放大抗蚀剂等中的光致酸产生剂。
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16.发明授权Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method 有权含氟化合物，含氟高分子化合物，抗蚀剂组合物，面漆组合物和图案形成方法公开(公告)号：US08686098B2
公开(公告)日：2014-04-01
申请号：US13375026
申请日：2010-05-20
申请人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： C08F12/20 , C08F216/12 , C07C69/34 , G03F7/004 , G03F7/40
CPC分类号： C07C69/653 , C07C69/675 , C07C69/732 , C07C2602/42 , C07C2603/68 , C08F220/24 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
摘要翻译： 本发明的含氟聚合物含有通式（2）的重复单元（a），其质均分子量为1,000〜1,000,000。 该聚合物适用于通过300nm或更小波长或电子束辐射的高能量射线辐射或用于液浸光刻的面漆组合物的图案形成用抗蚀剂组合物，其特征在于具有高的拒水性，特别是高后退接触角 。 在该式中，R 1表示含有可聚合双键的基团; R2表示氟原子或含氟烷基; R8表示取代或未取代的烷基等; W1表示单键，取代或未取代的亚甲基等。
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17.发明申请NOVEL FLUORINE-CONTAINING DICARBOXYLIC ACIDS AND THEIR NOVEL POLYMER COMPOUNDS 有权含新颖的含氟二羧酸及其新型聚合物化合物公开(公告)号：US20090030173A1
公开(公告)日：2009-01-29
申请号：US12174414
申请日：2008-07-16
CPC分类号： C08G63/6826 , C07C65/01 , C08G73/22
摘要： Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
摘要翻译： 公开了由式（1）表示的含氟二羧酸，其中n表示1-4的整数，并且两个羧基在芳环上彼此不相邻。 可以通过使含氟二羧酸与共聚单体（例如二氨基二醇）反应来获得线型高分子化合物。 通过热环化，该线性高分子化合物可以转化为具有优异特性的另一种高分子化合物。
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公开(公告)号：US08877960B2
公开(公告)日：2014-11-04
申请号：US13254708
申请日：2010-03-12
IPC分类号： C07C313/04 , G03F7/00 , G03F7/004 , C07C303/32 , C07C381/12 , G03F7/039
CPC分类号： C07C313/04 , C07C303/32 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C07C309/12 , C07C309/10
摘要： When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium salt. This is used as the raw material and is converted to an onium salt or is converted to an onium salt by going through saponification and esterification, thereby obtaining a fluoroalkanesulfonic acid onium salt. This fluoroalkanesulfonic acid onium salt is useful as a photoacid generator used for chemically amplified resist materials, etc.
摘要翻译： 当通过使用硫酸化剂将羧酸溴氟烷基酯硫化时，使用有机碱，从而得到氟代烷基亚磺酸铵盐。 将其氧化得到氟烷基磺酸铵盐。 将其用作原料并转化为鎓盐，或通过皂化和酯化转化为鎓盐，从而得到氟烷基磺酸鎓盐。 该氟烷基磺酸鎓盐可用作用于化学放大抗蚀剂材料等的光致酸产生剂。
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公开(公告)号：US20110313190A1
公开(公告)日：2011-12-22
申请号：US13254708
申请日：2010-03-12
IPC分类号： C07C69/78 , C07C309/08 , C07C69/533 , C07C69/75
CPC分类号： C07C313/04 , C07C303/32 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C07C309/12 , C07C309/10
摘要： When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium salt. This is used as the raw material and is converted to an onium salt or is converted to an onium salt by going through saponification and esterification, thereby obtaining a fluoroalkanesulfonic acid onium salt. This fluoroalkanesulfonic acid onium salt is useful as a photoacid generator used for chemically amplified resist materials, etc.
摘要翻译： 当通过使用硫酸化剂将羧酸溴氟烷基酯硫化时，使用有机碱，从而得到氟代烷基亚磺酸铵盐。 将其氧化得到氟烷基磺酸铵盐。 将其用作原料并转化为鎓盐，或通过皂化和酯化转化为鎓盐，从而得到氟烷基磺酸鎓盐。 该氟烷基磺酸鎓盐可用作用于化学放大抗蚀剂材料等的光致酸产生剂。
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20.发明授权Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt 有权磺酸盐及其衍生物，光酸发生剂，以及磺酸盐的制备方法公开(公告)号：US08889888B2
公开(公告)日：2014-11-18
申请号：US13000643
申请日：2009-07-06
IPC分类号： C07D209/96 , C07C309/70 , C07C303/22 , C07D311/78 , C07D333/46 , G03F7/039 , C07C381/12 , C07D335/02 , C07C309/82 , G03F7/004 , C07C309/12 , C07C25/18 , C07D209/76
CPC分类号： C07C381/12 , C07C25/18 , C07C303/22 , C07C309/12 , C07C309/82 , C07C2603/74 , C07D209/76 , C07D311/78 , C07D333/46 , C07D335/02 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.]
摘要翻译： 提供含氟磺酸盐或具有含氟磺酸基的化合物，其具有由以下通式（1）表示的结构。 这样的盐或化合物可以用作合适的光酸发生剂，并且可以形成具有优异的灵敏度，分辨率和掩模依赖性的抗蚀剂图案。 [通式（1）中，R表示取代或未取代的碳原子数1〜30的直链或支链一价烃基，取代或未取代的碳原子数3〜30的一价烃基和环状或部分环状结构， 取代或未取代的碳原子数为6〜30的芳基，取代或未取代的碳原子数为4〜30的1价杂环有机基。
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