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11.发明申请Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film 审中-公开具有氮化硅，碳化硅或氮氧化硅膜的模板公开(公告)号：US20090004319A1
公开(公告)日：2009-01-01
申请号：US12130259
申请日：2008-05-30
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1×d
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图形层，包括具有与其相关联的第三厚度的多个特征，其中所述第二厚度由以下定义：c1xd
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公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译： 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10％。 多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。
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公开(公告)号：US20100112310A1
公开(公告)日：2010-05-06
申请号：US12607547
申请日：2009-10-28
申请人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
发明人： Van Nguyen Truskett , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Benjamin G. Eynon, JR. , Byung-Jin Choi , Kosta S. Selinidis , Sidlgata V. Sreenivasan , Nicholas A. Stacey
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/708 , G03F9/7084 , Y10T428/24802
摘要： Systems and methods for providing identification patterns on substrates are described.
摘要翻译： 描述了在基板上提供识别图案的系统和方法。
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公开(公告)号：US20100015270A1
公开(公告)日：2010-01-21
申请号：US12498748
申请日：2009-07-07
申请人： Byung-Jin Choi , Kosta S. Selinidis
发明人： Byung-Jin Choi , Kosta S. Selinidis
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nano-imprint lithography template system having a support layer with at least one port, and a patterned surface layer coupled to the support layer. Coupling of the patterned surface layer to the support layer forms a cavity. Pressure within the cavity is controlled through the port of the support layer.
摘要翻译： 一种纳米压印光刻模板系统，其具有至少一个端口的支撑层，以及耦合到所述支撑层的图案化表面层。 图案化表面层与支撑层的耦合形成空腔。 通过支撑层的端口控制空腔内的压力。
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公开(公告)号：US08961852B2
公开(公告)日：2015-02-24
申请号：US13021461
申请日：2011-02-04
申请人： Kosta S. Selinidis
发明人： Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks.
摘要翻译： 描述了用于形成具有高对比度材料的对准标记的模板的系统和方法。 高对比度材料可以位于对准标记的凹槽内。
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公开(公告)号：US08012395B2
公开(公告)日：2011-09-06
申请号：US12464487
申请日：2009-05-12
申请人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
发明人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
IPC分类号： B28B11/08
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y20/00 , B82Y40/00 , G02B5/1838 , G03F7/0002 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
摘要翻译： 压印光刻基板可以包括由高对比度材料形成的对准标记。 描述用于形成具有高对比度材料的对准标记的示例性方法。
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公开(公告)号：US20110140304A1
公开(公告)日：2011-06-16
申请号：US12964081
申请日：2010-12-09
IPC分类号： B29C59/02
CPC分类号： B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
摘要翻译： 描述了纳米压印光刻过程中用于清洗流体的纳米压印光刻模板。 模板可以包括内部通道和外部通道。 内部通道构造成在纳米压印光刻工艺期间提供与模板和衬底之间的区域的工艺气体供应的流体连通。 外部通道构造成在模板的有效区域和基底之间排出流体和/或限制流体。
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18.发明授权公开(公告)号：US06733960B2
公开(公告)日：2004-05-11
申请号：US10073664
申请日：2002-02-11
申请人： Lorin C. Nash , Douglas E. Corbin , Kosta S. Selinidis , Alexei L. Krasnoselsky , Jamie M. Kropka
发明人： Lorin C. Nash , Douglas E. Corbin , Kosta S. Selinidis , Alexei L. Krasnoselsky , Jamie M. Kropka
IPC分类号： G03C5305
摘要： An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic film is also provided, and includes the steps of coating an aqueous developer solution containing at least one surfactant or thickener onto the film, thereby developing the film, and scanning the film through the coating of developer solution.
摘要翻译： 用于数字胶片处理的含水显影剂溶液。 显影剂溶液包括显影剂和至少一种表面活性剂或增稠剂。 还提供了一种处理照相胶片的方法，并且包括将含有至少一种表面活性剂或增稠剂的显影剂水溶液涂布到膜上的步骤，从而显影该膜，并通过显影剂溶液的涂层扫描该膜。
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公开(公告)号：US20100092599A1
公开(公告)日：2010-04-15
申请号：US12575834
申请日：2009-10-08
申请人： Kosta S. Selinidis , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin , Douglas J. Resnick
发明人： Kosta S. Selinidis , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin , Douglas J. Resnick
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： Systems and methods for minimizing overlay error during alignment of a template with a substrate are described. Templates generally include two distinct types of alignment marks: buried alignment marks and complementary alignment marks. Buried marks may be fabricated separately from the patterning surface, and the complementary marks may be fabricated in the same step as the patterning surface.
摘要翻译： 描述了在模板与衬底对准期间最小化覆盖误差的系统和方法。 模板通常包括两种不同类型的对准标记：掩埋对准标记和互补对准标记。 掩埋标记可以与图案化表面分开制造，并且补充标记可以在与图案化表面相同的步骤中制造。
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20.发明授权Film processing solution cartridge and method for developing and digitizing film 失效薄膜处理解决方案及其制作和数字化薄膜的方法公开(公告)号：US06913404B2
公开(公告)日：2005-07-05
申请号：US10378062
申请日：2003-03-03
申请人： Richard A. Patterson , Joseph B. Gault , John J. Straigis , William D. Mapel , Michael R. Thering , G. Gregory Mooty , Patrick W. Lea , Kosta S. Selinidis , Steven K. Brown , Homero Saldana , Eric C. Segerstrom , Stacy S. Cook , Leland A. Lester
发明人： Richard A. Patterson , Joseph B. Gault , John J. Straigis , William D. Mapel , Michael R. Thering , G. Gregory Mooty , Patrick W. Lea , Kosta S. Selinidis , Steven K. Brown , Homero Saldana , Eric C. Segerstrom , Stacy S. Cook , Leland A. Lester
CPC分类号： H04N1/00259 , G03D5/06 , H04N1/00249 , H04N1/00267
摘要： A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.
摘要翻译： 公开了一种数字胶片处理系统和胶片处理液盒。 盒包括壳体和用于存储膜处理流体的室。 处理溶液可以包含在腔室内的柔性囊内。 盒还可以包括用于将处理溶液涂覆到未显影的膜上的整体施用器。 盒通常可移除地附接到胶片处理系统，但是也可以是可再填充的。
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