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1.发明申请Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film 审中-公开具有氮化硅，碳化硅或氮氧化硅膜的模板公开(公告)号：US20090004319A1
公开(公告)日：2009-01-01
申请号：US12130259
申请日：2008-05-30
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1×d
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图形层，包括具有与其相关联的第三厚度的多个特征，其中所述第二厚度由以下定义：c1xd
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2.发明申请公开(公告)号：US20100040718A1
公开(公告)日：2010-02-18
申请号：US12605848
申请日：2009-10-26
IPC分类号： G03F1/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。
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3.发明授权公开(公告)号：US07874831B2
公开(公告)日：2011-01-25
申请号：US12605848
申请日：2009-10-26
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。
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公开(公告)号：US20100104852A1
公开(公告)日：2010-04-29
申请号：US12604094
申请日：2009-10-22
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/249978 , Y10T428/268
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅的相对密度（磷/二氧化硅）的比例为至少约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。
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公开(公告)号：US09778562B2
公开(公告)日：2017-10-03
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
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公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译： 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10％。 多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。
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公开(公告)号：US20140212534A1
公开(公告)日：2014-07-31
申请号：US13754015
申请日：2013-01-30
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
CPC分类号： C23C16/401 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporous/ρfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅（“多孔/熔融二氧化硅”）的相对密度之比至少为约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。
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公开(公告)号：US20110165412A1
公开(公告)日：2011-07-07
申请号：US12954376
申请日：2010-11-24
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/265
摘要： Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.
摘要翻译： 在纳米压印光刻模板或双面盘上形成粘合剂层。 在双面盘上形成粘合剂层包括将双面盘浸入液体粘合剂组合物中并从粘合剂组合物中除去双面盘。 双面盘的外层是碳外涂层或中间层。 将粘合剂组合物干燥以形成直接附着在盘的第一侧上的碳外涂层或中间层的第一粘合层，以及直接粘附在盘的第二侧上的碳外涂层或中间层的第二粘附层。 在纳米压印光刻模板上形成粘合剂层包括将粘合剂材料施加到模板上，允许模板保持静止，并用溶剂从模板中漂洗一部分粘合剂材料，并干燥模板。
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公开(公告)号：US20100102029A1
公开(公告)日：2010-04-29
申请号：US12604866
申请日：2009-10-23
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T156/10
摘要： Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template.
摘要翻译： 描述了用于从多层基板形成压印光刻模板的系统，方法和工艺。 多层基材可以包括位于基材层上的嵌段共聚物层。 嵌段共聚物层可以包括两个或更多个结构域。 至少一个结构域可能具有与另一个结构域不同的组成敏感性，使得这些结构域对特定过程具有不同的反应。 结构域与特定方法的反应可以提供嵌段共聚物层中的图案。 该图案可以被转移到基底层中以形成压印光刻模板。
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公开(公告)号：US08980751B2
公开(公告)日：2015-03-17
申请号：US13014508
申请日：2011-01-26
申请人： Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
发明人： Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要： Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译： 可以通过暴露于受控组合物的气体气氛中的来自能量源的真空紫外（VUV）辐射来去除衬底上的聚合材料。 在这种去除之后，还描述了用于纳米压印的附加蚀刻技术。
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