公开(公告)号：US20030200701A1

公开(公告)日：2003-10-30

申请号：US10125938

申请日：2002-04-19

申请人： 3M Innovative Properties Company

发明人： Gregory A. Koehnle ,  Edward J. Woo

IPC分类号： B24D011/00 ,  B24D003/00

CPC分类号： B24D3/28 ,  B24D3/344 ,  C08F290/061 ,  C08L63/00

摘要： Coated abrasive articles comprise a backing and an abrasive layer, and optionally at least one of a backsize layer, tie layer, supersize layer, presize layer, or saturant. The coated abrasive article comprises a reaction product of components comprising: polyfunctional acrylate; polyfunctional cationically polymerizable material; free radical photoinitiator; triarylsulfonium salt having the formula 1 wherein R1, R2 and R3 independently represent an, optionally substituted, aromatic group having from about 4 to about 20 carbon atoms, and Ynull represents a non-interfering anion; and quaternary ammonium salt having the formula 2 wherein Xnull is a non-interfering anion.

摘要翻译： 涂覆的磨料制品包括背衬和研磨层，以及可选地，背板，连结层，超大层，预浸层或饱和剂中的至少一种。 涂覆的磨料制品包括组分的反应产物，其包含：多官能丙烯酸酯; 多功能阳离子聚合材料; 自由基光引发剂; 具有下式的三芳基锍盐其中R 1，R 2和R 3独立地表示任选取代的具有约4至约20个碳原子的芳族基团，Y 1表示非干扰阴离子 ; 和具有下式的季铵盐其中X - 是非干扰性阴离子。

公开(公告)号：US20030045213A1

公开(公告)日：2003-03-06

申请号：US09862357

申请日：2001-05-22

发明人： Steven J. Keipert ,  John S. Luk ,  Dennis G. Welygan

IPC分类号： B24B001/00

CPC分类号： B24D3/344 ,  B24D3/32

摘要： Abrasive articles abrasive articles (e.g., abrasive wheels) comprised of abrasive agglomerate particles dispersed within cellular polymeric material, and methods of making and using the abrasive articles.

摘要翻译： 由分散在多孔聚合材料中的磨料聚集体颗粒组成的磨料制品磨料制品（例如砂轮）以及制造和使用磨料制品的方法。

公开(公告)号：US20030003846A1

公开(公告)日：2003-01-02

申请号：US10187643

申请日：2002-06-27

发明人： Robert D. Tolles

IPC分类号： B24B049/00 ,  B24B051/00

CPC分类号： B24B37/24 ,  B24B37/26 ,  B24B37/32 ,  B24B53/017 ,  B24D3/32 ,  B24D3/344 ,  B24D9/08

摘要： A material with a mesh of fibers and a binder material holding the fibers in the mesh can be used on a carrier head or a polishing pad. A polishing apparatus can include a pad cleaner with nozzles to direct jets of cleaning fluid onto the polishing pad and a brush to agitate a surface of the polishing pad.

摘要翻译： 可以在载体头或抛光垫上使用具有纤维网和将纤维保持在网中的粘合剂材料的材料。 抛光装置可以包括具有喷嘴以将清洁流体喷射到抛光垫上的喷嘴清洁器和刷子以搅动抛光垫的表面。

公开(公告)号：US20020142705A1

公开(公告)日：2002-10-03

申请号：US10105455

申请日：2002-03-26

申请人： NORITAKE CO., LTD.

发明人： Etsuo Sugiura

IPC分类号： B24B001/00

CPC分类号： B24B19/226 ,  B24D3/28 ,  B24D3/344

摘要： An abrasive film for polishing a workpiece, including: (a) a substrate; (b) a binder; (c) a multiplicity of abrasive grains which are fixed to a surface of the substrate by the binder; and (d) a water-soluble inorganic compound or a water-soluble organic acid alkali metal salt which is added to the binder. The water-soluble inorganic compound preferably consists of a weak-alkali metal salt or a weak-acid metal salt. The water-soluble organic acid alkali metal salt preferably consists of an anionic surface-active agent or a carboxylic acid alkali metal salt.

摘要翻译： 一种用于抛光工件的研磨膜，包括：（a）基底; （b）粘合剂; （c）多个磨料颗粒，通过粘合剂固定在基材的表面上; 和（d）添加到粘合剂中的水溶性无机化合物或水溶性有机酸碱金属盐。 水溶性无机化合物优选由弱碱金属盐或弱酸金属盐组成。 水溶性有机酸碱金属盐优选由阴离子表面活性剂或羧酸碱金属盐组成。

公开(公告)号：US20020004365A1

公开(公告)日：2002-01-10

申请号：US09878213

申请日：2001-06-12

发明人： Hae-Do Jeong ,  Ho-Sik Lee ,  Ho-Youn Kim ,  Chul-Woo Nam ,  Sang-Ick Lee ,  Jae-Hong Kim

IPC分类号： B24D011/00

CPC分类号： B24B37/22 ,  B24B37/24 ,  B24D3/344 ,  B24D11/001

摘要： The present invention relates to a polishing pad for the chemical mechanical polishing (CMP). According to the present invention, there is provided a chemical mechanical polishing pad for polishing a semiconductor wafer with chemicals containing predetermined components supplied between the semiconductor wafer and the polishing pad, comprising a base layer; and an abrasive layer which contains polishing abrasives capsulated with a material soluble in the chemicals and is formed to have a constant thickness on the top surface of the base layer. The capsulated polishing abrasives become free abrasives in the chemicals supplied upon polishing, and take part in the polishing. Capsulating the polishing abrasives can be performed by granulization or spraying. According to the polishing pad of the present invention, planarization polishing can be performed as whole. In addition, since a small amount of chemicals are used, it is advantageous in the economic and environmental aspects.

摘要翻译： 本发明涉及一种用于化学机械抛光（CMP）的抛光垫。 根据本发明，提供了一种化学机械抛光垫，用于利用含有供应在半导体晶片和抛光垫之间的预定部件的化学品来研磨半导体晶片，所述化学机械抛光垫包括基底层; 以及研磨层，其包含用可溶于所述化学品的材料封装的抛光研磨剂，并且形成为在所述基底层的顶表面上具有恒定的厚度。 封装的抛光磨料在抛光时提供的化学品中成为游离磨料，并参与抛光。 抛光研磨剂的封装可以通过颗粒化或喷涂进行。 根据本发明的抛光垫，可以整体进行平面化研磨。 另外，由于使用少量的化学物质，因此在经济和环境方面是有利的。

公开(公告)号：US06251149B1

公开(公告)日：2001-06-26

申请号：US09075294

申请日：1998-05-08

申请人： Gerald W. Meyer ,  Paul E. Johnson

发明人： Gerald W. Meyer ,  Paul E. Johnson

IPC分类号： B24D328

CPC分类号： B24D3/344 ,  B24D11/00

摘要： A bonded-abrasive tool includes a matrix of an organic bond, abrasive grains dispersed in the organic bond and a grinding aid in the form of either an inorganic nonhalogenated filler or a hydrated filler. The inorganic nonhalogenated filler can react with free radicals released from the organic bond during grinding. The hydrated filler endothermically releases water. A coated-abrasive tool includes a flexible substrate, abrasive grains bonded to the flexible substrate, and an organic bond containing a grinding aid including an inorganic nonhalogenated filler or a hydrated filler coated on the substrate.

摘要翻译： 粘合研磨工具包括有机结合基体，分散在有机键中的磨料颗粒和无机非卤化填料或水合填料形式的研磨助剂。 无机非卤化填料可以在研磨过程中与有机键释放的自由基反应。 水合填料吸热释放水。 涂覆研磨工具包括柔性基底，结合到柔性基底的磨料颗粒和含有研磨助剂的有机粘合剂，所述研磨助剂包括涂覆在基底上的无机非卤化填料或水合填料。

公开(公告)号：US06217413B1

公开(公告)日：2001-04-17

申请号：US09198864

申请日：1998-11-24

申请人： Todd J. Christianson

发明人： Todd J. Christianson

IPC分类号： B24B1912

CPC分类号： B24D11/001 ,  B24D3/002 ,  B24D3/20 ,  B24D3/28 ,  B24D3/344 ,  B24D11/00

摘要： A coated abrasive article having a backing and an abrasive layer coated on the first major surface of the backing, wherein a cross-section of the abrasive layer normal to the thickness and at a center point of the thickness has a total cross-sectional area of abrasive agglomerates which is substantially the same as that at a point along the thickness which is 75% of a distance between the center point and the contact side; a coated abrasive article having a bond system with a Knoop hardness number of at least 70; a coated abrasive article comprising abrasive agglomerates in the shape of a truncated four-sided pyramid; a method of making the coated abrasive article; and a method of abrading a hard workpiece using a coated abrasive article.

摘要翻译： 一种涂覆的磨料制品，其具有背衬和涂覆在背衬的第一主表面上的研磨层，其中研磨层的垂直于厚度的横截面和厚度的中心点具有总横截面积 与沿着厚度的中心点和接触侧之间的距离的75％的点基本相同的磨料团块; 具有Knoop硬度值至少为70的粘结体系的涂覆磨料制品; 包括具有截顶四棱锥形状的磨料凝聚体的涂覆磨料制品; 制造涂覆的磨料制品的方法; 以及使用涂覆的磨料制品研磨硬质工件的方法。

公开(公告)号：US6039631A

公开(公告)日：2000-03-21

申请号：US65444

申请日：1998-04-24

申请人： Shuzo Sato ,  Hiizu Ohtorii

发明人： Shuzo Sato ,  Hiizu Ohtorii

IPC分类号： B24B29/00 ,  B24B13/02 ,  B24D3/28 ,  B24D3/34 ,  B24D11/02 ,  B29C44/12 ,  B24B1/00 ,  B24B7/00 ,  B24B33/00

CPC分类号： B24B37/245 ,  B24B13/02 ,  B24D11/02 ,  B24D3/28 ,  B24D3/344 ,  B29C44/12

摘要： Disclosed is a polishing method including the step of: polishing a surface of a member to be polished by rotating and sliding an abrasive wheel holding fixed abrasive grains on the surface of the wheel while supplying free abrasive grains to the surface of the member to be polished; wherein the abrasive wheel is formed by binding the fixed abrasive grains with a soft binder and a pore forming agent. This polishing method is effective to obtain a high flatness of a polished surface and improve surface characteristics of the polished surface, and also to obtain a high continuous-workability by stably keeping a polishing ability for a long period of time.

摘要翻译： 公开了一种抛光方法，包括以下步骤：通过在砂轮的表面上旋转和滑动保持固定的磨粒的砂轮，同时向待抛光的构件的表面供给游离的磨粒而抛光待抛光构件的表面 ; 其中砂轮通过用固定的磨料颗粒与软粘合剂和成孔剂结合而形成。 该抛光方法对于获得抛光表面的高平坦度并且提高抛光表面的表面特性是有效的，并且通过长时间稳定地保持抛光能力而获得高的连续加工性。

公开(公告)号：US5954844A

公开(公告)日：1999-09-21

申请号：US995570

申请日：1997-12-22

申请人： Kam W. Law ,  Walter L. Harmer ,  Alan R. Kirk ,  Ernest L. Thurber

发明人： Kam W. Law ,  Walter L. Harmer ,  Alan R. Kirk ,  Ernest L. Thurber

IPC分类号： B24D3/00 ,  B24D3/28 ,  B24D3/34 ,  B24D11/00 ,  B24D11/02 ,  C08J7/04 ,  C09K3/14

CPC分类号： B24D11/02 ,  B24D11/001 ,  B24D3/004 ,  B24D3/28 ,  B24D3/344 ,  B24D3/346

摘要： An abrasive article, for example, a coated, bonded, or nonwoven abrasive article comprising a binder, a plurality of abrasive particles, and an antiloading component.

摘要翻译： 磨料制品，例如包括粘合剂，多个磨料颗粒和抗负载组分的涂覆粘结或非织造材料制品。

公开(公告)号：US5912216A

公开(公告)日：1999-06-15

申请号：US964766

申请日：1997-11-05

申请人： Channarayapatna N. Thimmappaiah ,  Murugesan K. Kurubaran ,  Gerald W. Meyer

发明人： Channarayapatna N. Thimmappaiah ,  Murugesan K. Kurubaran ,  Gerald W. Meyer

IPC分类号： B24B3/34 ,  B24D3/28 ,  B24D3/34

CPC分类号： B24D3/346 ,  B24D3/344

摘要： A resin bonded abrasive tool consists of abrasive grain and an organic bond comprising a thermosetting resin, such as epoxy resin, phenolic resin or rubber or blends thereof and a precursor filler system capable of forming in situ an active filler system by reacting under the heat generated during grinding. The organic bond optionally further comprises a filler system. A method of making the resin bonded abrasive tool consists of mixing the abrasive grain and the organic bond with the precursor filler system, pressing the resulting mixture into shape, and curing the abrasive tool at about 150 to 200.degree. C.

摘要翻译： 树脂粘结研磨工具由磨粒和包含热固性树脂如环氧树脂，酚醛树脂或橡胶或其混合物的有机粘结剂组成，以及能够在活性填料体系下通过在产生的热量 在研磨过程中。 有机键任选地还包含填充体系。 制造树脂粘合研磨工具的方法是将磨料颗粒与有机粘合剂与前体填料体系混合，将所得混合物压成形状，并在约150至200℃固化研磨工具。