OPTICAL-ELECTRICAL TRANSMISSION CONNECTOR, OPTICAL-ELECTRICAL TRANSMISSION DEVICE AND ELECTRONIC DEVICE
    1.
    发明申请
    OPTICAL-ELECTRICAL TRANSMISSION CONNECTOR, OPTICAL-ELECTRICAL TRANSMISSION DEVICE AND ELECTRONIC DEVICE 有权
    光电传输装置和电子设备的光电传输连接器

    公开(公告)号:US20090196550A1

    公开(公告)日:2009-08-06

    申请号:US12346503

    申请日:2008-12-30

    申请人: Hiizu OHTORII

    发明人: Hiizu OHTORII

    IPC分类号: G02B6/42 G02B6/32

    摘要: An optical-electrical transmission connector having resistance to optical axis misalignment, having small loss, easily increasing the number of buses, and capable of being formed of a commonly-used material is provided. In a male connector, one collimating lens facing the other collimating lens when connecting the male connector to a female connector is arranged, and a light guide is arranged corresponding to the focal point of the one collimating lens. A positioning section is arranged corresponding to surroundings of the one collimating lens, and the positioning section has one inclined surface coming into contact with the other inclined surface when connecting the male connector to the female connector.

    摘要翻译: 本发明提供一种具有耐光轴失准的光传输连接器,其损耗小,容易增加总线数量,并且能够由常用材料形成。 在公连接器中,布置将阳连接器连接到阴连接器时面对另一准直透镜的一个准直透镜,并且相应于一个准直透镜的焦点布置导光体。 相对于一个准直透镜的周围布置有定位部,并且当将阳连接器连接到阴连接器时,定位部具有与另一倾斜面接触的一个倾斜面。

    Photoelectric transducer and photoelectric transducer element array
    2.
    发明申请
    Photoelectric transducer and photoelectric transducer element array 有权
    光电传感器和光电传感器元件阵列

    公开(公告)号:US20060016962A1

    公开(公告)日:2006-01-26

    申请号:US11186603

    申请日:2005-07-19

    申请人: Hiizu Ohtorii

    发明人: Hiizu Ohtorii

    IPC分类号: H01L27/00

    CPC分类号: G02B6/43 G02B6/4214

    摘要: A photoelectric transducer has an optical waveguide and a photoelectric transducer element array of photoelectric transducer elements optically coupled to the optical waveguide. The photoelectric transducer element array has a common conductive layer, and the photoelectric transducer elements are mounted on the common conductive layer in alignment with entrance or exit ends of the optical waveguide. The photoelectric transducer elements having respective first poles, and the photoelectric transducer element array has a second pole disposed in opposite relation to the first poles and connected as a reference potential setting electrode through the common conductive layer to at least two of the photoelectric transducer elements.

    摘要翻译: 光电传感器具有光学波导和光耦合到光波导的光电换能器元件阵列。 光电传感器元件阵列具有公共导电层,并且光电换能器元件安装在与光波导的入射端或出射端对准的公共导电层上。 具有各自的第一极的光电换能器元件和光电换能器元件阵列具有与第一极相对设置的第二极,并且作为参考电位设定电极通过公共导电层连接到至少两个光电换能器元件。

    DISPLAY PANEL, DISPLAY DEVICE, ILLUMINATION PANEL AND ILLUMINATION DEVICE, AND METHODS OF MANUFACTURING DISPLAY PANEL AND ILLUMINATION PANEL
    3.
    发明申请
    DISPLAY PANEL, DISPLAY DEVICE, ILLUMINATION PANEL AND ILLUMINATION DEVICE, AND METHODS OF MANUFACTURING DISPLAY PANEL AND ILLUMINATION PANEL 有权
    显示面板,显示装置,照明面板和照明装置,以及制造显示面板和照明面板的方法

    公开(公告)号:US20120080692A1

    公开(公告)日:2012-04-05

    申请号:US13246372

    申请日:2011-09-27

    申请人: Hiizu Ohtorii

    发明人: Hiizu Ohtorii

    IPC分类号: H01L33/52 H01L33/58 H01L33/44

    摘要: Disclosed herein is a display panel including a mounting substrate in which one or more light-emitting devices each including one or more light-emitting elements are mounted on a circuit substrate; and a transparent substrate disposed to face the light-emitting device side of the mounting substrate, wherein the transparent substrate has a transparent base material and a resin layer formed on the mounting substrate side of the transparent base material, and the resin layer is in contact with the light-emitting device and has, formed on an upper surface or a side surface of the light-emitting device, an inclined part which spreads from the light-emitting device side toward the transparent base material side.

    摘要翻译: 这里公开了一种显示面板,其包括:安装基板,其中一个或多个发光元件各自包括一个或多个发光元件安装在电路基板上; 以及与所述安装基板的发光元件侧相对配置的透明基板,所述透明基板具有透明基材和形成在所述透明基材的安装基板侧的树脂层,所述树脂层接触 在发光装置的上表面或侧面上形成有从发光装置侧朝向透明基材侧扩散的倾斜部的发光装置。

    Optical-electrical transmission connector, optical-electrical transmission device and electronic device
    4.
    发明授权
    Optical-electrical transmission connector, optical-electrical transmission device and electronic device 有权
    光电传输连接器,光电传输装置和电子设备

    公开(公告)号:US07651279B2

    公开(公告)日:2010-01-26

    申请号:US12346503

    申请日:2008-12-30

    申请人: Hiizu Ohtorii

    发明人: Hiizu Ohtorii

    IPC分类号: G02B6/36

    摘要: An optical-electrical transmission connector having resistance to optical axis misalignment, having small loss, easily increasing the number of buses, and capable of being formed of a commonly-used material is provided. In a male connector, one collimating lens facing the other collimating lens when connecting the male connector to a female connector is arranged, and a light guide is arranged corresponding to the focal point of the one collimating lens. A positioning section is arranged corresponding to surroundings of the one collimating lens, and the positioning section has one inclined surface coming into contact with the other inclined surface when connecting the male connector to the female connector.

    摘要翻译: 本发明提供一种具有耐光轴失准的光传输连接器,其损耗小,容易增加总线数量,并且能够由常用材料形成。 在公连接器中,布置将阳连接器连接到阴连接器时面对另一准直透镜的一个准直透镜,并且相应于一个准直透镜的焦点布置导光体。 相对于一个准直透镜的周围布置有定位部,并且当将阳连接器连接到阴连接器时,定位部具有与另一倾斜面接触的一个倾斜面。

    Photo-Electric Conversion Element Array, Integrated Apparatus Of The Same, Mounted Structures Of Them, And Optical Information Processing Apparatus
    5.
    发明申请
    Photo-Electric Conversion Element Array, Integrated Apparatus Of The Same, Mounted Structures Of Them, And Optical Information Processing Apparatus 有权
    光电转换元件阵列,其集成装置,其安装结构以及光信息处理装置

    公开(公告)号:US20070215790A1

    公开(公告)日:2007-09-20

    申请号:US11569616

    申请日:2005-03-03

    申请人: Hiizu Ohtorii

    发明人: Hiizu Ohtorii

    IPC分类号: H01L27/00

    摘要: A photoelectric conversion element array having a plurality of photoelectric conversion elements (emitting optics 4, receiving optics 5) arranged in an array, and the photoelectric conversion elements 4, 5 are arranged alternately at different positions so that every second one is aligned on the same line in the direction of array. A mounted structure of photoelectric conversion element array, having the emitting optics array and the receiving optics array in the photoelectric conversion element array of this invention, arranged on an interposer substrate 9 so as to oppose therewith, and these arrays are mounted on the interposer substrate 9 through the external connection terminals 7. An optical information processing apparatus 1 having the photoelectric conversion element array of the present invention, and an optical wave guide 3 opposed to the respective optics of the photoelectric conversion element arrays. These configurations not only allow high-density integration of optical interconnects, but also reduce optical interference or crosstalk due to the photoelectric conversion element, and can thereby provide a photoelectric conversion element array allowing efficient propagation of light, an integrated apparatus thereof, a mounted structure of them, and an optical information processing apparatus.

    摘要翻译: 具有排列成阵列的多个光电转换元件(发光光学器件4,接收光学器件5)和光电转换元件4,5的光电转换元件阵列交替地配置在不同的位置,使得每隔一个的光电转换元件 沿阵列的方向。 具有本发明的光电转换元件阵列中的发光光学阵列和接收光学阵列的光电转换元件阵列的安装结构被布置在插入器基板9上以与之相对,并且这些阵列安装在插入器基板 具有本发明的光电转换元件阵列的光信息处理装置1和与光电转换元件阵列的各光学元件相对的光波导3。 这些配置不仅允许光互连的高密度集成,而且还减少由于光电转换元件引起的光干扰或串扰,从而可以提供允许光的有效传播的光电转换元件阵列,其集成的装置,安装结构 的光信息处理装置。

    Polishing method, polishing apparatus, and method of manufacturing semiconductor device
    6.
    发明授权
    Polishing method, polishing apparatus, and method of manufacturing semiconductor device 失效
    抛光方法,抛光装置和制造半导体器件的方法

    公开(公告)号:US07141501B2

    公开(公告)日:2006-11-28

    申请号:US10512745

    申请日:2003-04-14

    IPC分类号: H01L21/302 H01L21/461

    摘要: A polishing method and a polishing apparatus by which excess portions of a metallic film 18 can be removed easily and efficiently in planarizing the metallic film 18 by polishing and which is high in accuracy of polishing, are provided. Also, a method of manufacturing a semiconductor device by use of the polishing method and the polishing apparatus is provided. A substrate 17 provided with the metallic film 18 and a counter electrode 15 are disposed oppositely to each other in an electrolytic solution E, an electric current is passed to the metallic film 18 through the electrolytic solution E, and the surface of the metallic film 18 is polished with a hard pad 14.

    摘要翻译: 提供了抛光方法和抛光装置,其通过抛光对金属膜18进行平面化并且抛光精度高而容易且有效地除去金属膜18的多余部分。 此外,提供了通过使用抛光方法和抛光装置制造半导体器件的方法。 设置有金属膜18的基板17和对置电极15在电解液E中相对配置,电流通过电解液E通过金属膜18,金属膜18的表面 用硬垫抛光14。

    Etching solution, etching method and method for manufacturing semiconductor device
    7.
    发明申请
    Etching solution, etching method and method for manufacturing semiconductor device 失效
    蚀刻溶液,蚀刻方法和制造半导体器件的方法

    公开(公告)号:US20050070110A1

    公开(公告)日:2005-03-31

    申请号:US10919580

    申请日:2004-08-17

    摘要: An etching solution includes an anticorrosive for copper or a benzotriazole based anticorrosive in a hydrofluoric acid aqueous solution. An etching method makes use of the etching solution set out above. Moreover, a method for manufacturing a semiconductor device which should include the step of removing copper by the etching method. The method includes the steps of forming copper through a barrier layer made of a metal or metal compound, which is greater in ionization tendency than copper, so as to bury a wiring groove formed in an insulating film with the copper, followed by polishing additional copper and barrier layer formed on the insulating film, and etching a surface layer of the insulating film by use of the etching solution to remove an insulating defective layer made mainly of the barrier layer on the insulating film along with the surface layer of the insulating film.

    摘要翻译: 蚀刻溶液包括在氢氟酸水溶液中对铜或苯并三唑类防腐蚀剂的防锈剂。 蚀刻方法利用上述蚀刻溶液。 此外,一种制造半导体器件的方法,其应包括通过蚀刻方法去除铜的步骤。 该方法包括通过由金属或金属化合物制成的阻挡层形成铜的步骤,其电离度比铜更大,以便用铜掩埋形成在绝缘膜中的布线槽,然后抛光附加的铜 以及形成在绝缘膜上的阻挡层,并且通过使用蚀刻溶液来蚀刻绝缘膜的表面层,以除去绝缘膜上的主要由绝缘膜上的阻挡层形成的绝缘缺陷层以及绝缘膜的表面层。

    Photoelectric transducer and photoelectric transducer element array
    8.
    发明授权
    Photoelectric transducer and photoelectric transducer element array 有权
    光电传感器和光电传感器元件阵列

    公开(公告)号:US07315669B2

    公开(公告)日:2008-01-01

    申请号:US11186603

    申请日:2005-07-19

    申请人: Hiizu Ohtorii

    发明人: Hiizu Ohtorii

    IPC分类号: G02B6/12 G02B6/122

    CPC分类号: G02B6/43 G02B6/4214

    摘要: A photoelectric transducer has an optical waveguide and a photoelectric transducer element array of photoelectric transducer elements optically coupled to the optical waveguide. The photoelectric transducer element array has a common conductive layer, and the photoelectric transducer elements are mounted on the common conductive layer in alignment with entrance or exit ends of the optical waveguide. The photoelectric transducer elements having respective first poles, and the photoelectric transducer element array has a second pole disposed in opposite relation to the first poles and connected as a reference potential setting electrode through the common conductive layer to at least two of the photoelectric transducer elements.

    摘要翻译: 光电传感器具有光学波导和光耦合到光波导的光电换能器元件阵列。 光电传感器元件阵列具有公共导电层,并且光电换能器元件安装在与光波导的入射端或出射端对准的公共导电层上。 具有各自的第一极的光电换能器元件和光电换能器元件阵列具有与第一极相对设置的第二极,并且作为参考电位设定电极通过公共导电层连接到至少两个光电换能器元件。

    Electropolishing liquid, electropolishing method, and method for fabricating semiconductor device
    9.
    发明申请
    Electropolishing liquid, electropolishing method, and method for fabricating semiconductor device 审中-公开
    电抛光液,电解抛光方法及制造半导体器件的方法

    公开(公告)号:US20070051638A1

    公开(公告)日:2007-03-08

    申请号:US11591688

    申请日:2006-11-01

    IPC分类号: B23H5/00

    摘要: Electric conductivity is enhanced without causing coagulation or precipitation of polishing abrasive grains. In addition, good planarization is realized without inducing defects in a metallic film or a wiring which are to be polished. In an electropolishing method for planarizing the surface of a metallic film to be polished by moving a polishing pad (15) in sliding contact with the metallic film surface while oxidizing the metallic film surface through an electrolytic action in an electropolishing liquid E, the electropolishing liquid E contains at least polishing abrasive grains and an electrolyte for maintaining an electrostatically charged state of the polishing abrasive grains. Since the electropolishing liquid having a high electric conductivity is used, it is possible to obtain a high electrolyzing current and to enlarge the distance between electrodes. Besides, in the electropolishing method, the electropolishing liquid with a good dispersion state of the polishing abrasive grains is used, so that remaining of the abrasive grains and defects such as scratches are prevented from being generated upon polishing.

    摘要翻译: 电导率提高而不引起研磨磨粒的凝结或沉淀。 此外,实现良好的平坦化,而不会引起要抛光的金属膜或布线的缺陷。 在电抛光方法中,通过在电解抛光液体E中通过电解作用使金属膜表面氧化而移动与金属膜表面滑动接触的抛光垫(15)来平坦化待抛光的金属膜的表面,电抛光液 E至少含有抛光磨粒和用于保持抛光磨粒的静电充电状态的电解质。 由于使用具有高导电性的电解抛光液体,因此可以获得高的电解电流并且扩大电极之间的距离。 此外,在电抛光方法中,使用具有抛光磨粒的良好分散状态的电解抛光液,从而防止在研磨时残留磨粒和划痕等缺陷。

    Etching solution, etching method and method for manufacturing semiconductor device
    10.
    发明授权
    Etching solution, etching method and method for manufacturing semiconductor device 失效
    蚀刻溶液,蚀刻方法和制造半导体器件的方法

    公开(公告)号:US07033943B2

    公开(公告)日:2006-04-25

    申请号:US10919580

    申请日:2004-08-17

    IPC分类号: H01L21/311

    摘要: An etching solution includes an anticorrosive for copper or a benzotriazole based anticorrosive in a hydrofluoric acid aqueous solution. An etching method makes use of the etching solution set out above. Moreover, a method for manufacturing a semiconductor device which should include the step of removing copper by the etching method. The method includes the steps of forming copper through a barrier layer made of a metal or metal compound, which is greater in ionization tendency than copper, so as to bury a wiring groove formed in an insulating film with the copper, followed by polishing additional copper and barrier layer formed on the insulating film, and etching a surface layer of the insulating film by use of the etching solution to remove an insulating defective layer made mainly of the barrier layer on the insulating film along with the surface layer of the insulating film.

    摘要翻译: 蚀刻溶液包括在氢氟酸水溶液中对铜或苯并三唑类防腐蚀剂的防锈剂。 蚀刻方法利用上述蚀刻溶液。 此外,一种制造半导体器件的方法,其应包括通过蚀刻方法去除铜的步骤。 该方法包括通过由金属或金属化合物制成的阻挡层形成铜的步骤,其电离度比铜更大,以便用铜掩埋形成在绝缘膜中的布线槽,然后抛光附加的铜 以及形成在绝缘膜上的阻挡层,并且通过使用蚀刻溶液来蚀刻绝缘膜的表面层,以除去绝缘膜上的主要由绝缘膜上的阻挡层形成的绝缘缺陷层以及绝缘膜的表面层。