On-chip micro electron source and manufacturing method thereof

    公开(公告)号:US11315747B2

    公开(公告)日:2022-04-26

    申请号:US17292862

    申请日:2019-11-07

    Abstract: Provided are an on-chip miniature electron source and a method for manufacturing the same. The on-chip miniature electron source includes: a thermal conductive layer; an insulating layer provided on the thermal conductive layer, where the insulating layer is made of a resistive-switching material, and at least one through hole is provided in the insulating layer; and at least one electrode pair provided on the insulating layer, where at least one electrode of the electrode pair is in contact with and connected to the thermal conductive layer via the through hole, where there is a gap between two electrodes of the electrode pair, and a tunnel junction is formed within a region of the insulating layer under the gap. Thus, heat generated by the on-chip micro electron source can be dissipated through the electrode and the thermal conductive layer, thereby significantly improving heat dissipation ability of the on-chip miniature electron source.

    Electron gun, electron beam applicator, method for releasing electrons using electron gun, and method for adjusting focal position of electron beam

    公开(公告)号:US11195685B2

    公开(公告)日:2021-12-07

    申请号:US17044856

    申请日:2019-08-07

    Inventor: Hokuto Iijima

    Abstract: The present invention addresses the problem of providing a device with which it is possible to adjust the focal point of an electron beam both toward a shorter focal point and toward a longer focal point after an electronic gun was fitted on a counterpart device.
    The aforementioned problem can be solved by an electron gun including a photocathode, and an anode, the electron gun furthermore comprising an intermediate electrode disposed between the photocathode and the anode, the intermediate electrode comprising an electron-beam passage hole through which an electron beam released from the photocathode passes, and the electron-beam passage hole having formed therein a drift space in which, when an electrical field is formed between the photocathode and the anode due to application of a voltage, the effect of the electrical field can be disregarded.

    METHOD FOR USE WITH A RADIOTHERAPY DEVICE

    公开(公告)号:US20210370098A1

    公开(公告)日:2021-12-02

    申请号:US17309048

    申请日:2019-10-14

    Applicant: Elekta Limited

    Abstract: Described is a method of determining whether repair or replacement of an electron gun of a radiotherapy device should be scheduled. The radiotherapy device comprises a linear accelerator and is configured to provide therapeutic radiation to a patient. The radiotherapy device comprises a vacuum tube comprising the electron gun, a waveguide configured to accelerate electrons emitted by the electron gun toward a target to produce said radiation. The radiotherapy device comprises also comprises a current sensor, the current sensor being configured to provide signals indicative of current supplied to the electron gun. The method comprises receiving a current value, processing the current value, and based on the processing of the current value, determining whether repair or replacement of the electron gun should be scheduled. Processing the current value comprises determining whether the current value meets at least one threshold criterion, and determining whether the current value has changed by at least a threshold amount in a particular time period.

    Electron gun
    236.
    发明授权

    公开(公告)号:US10950407B2

    公开(公告)日:2021-03-16

    申请号:US16897828

    申请日:2020-06-10

    Abstract: An electron gun comprising a cathode having an electron emitting surface and whose planar shape is circular; a heater; an anode being arranged to oppose the cathode; and a heat resistant member. The anode applies a positive potential relative to the cathode to extract electrons in a predetermined direction. The cathode has, in a central portion thereof, a through hole along a central axis of the cathode. The heat resistant member has a first portion to close the through hole and a second portion being positioned between the cathode and the heater.

    Tunable charged particle vortex beam generator and method

    公开(公告)号:US10607804B2

    公开(公告)日:2020-03-31

    申请号:US16330982

    申请日:2016-09-07

    Abstract: The present invention refers to a device for generating charged particle beams with tunable orbital angular momentum. The device firstly includes one or more components for providing a charged particle beam. It is further characterized by an electrical arrangement for imparting a tunable orbital angular momentum to the charged particle beam during operation. The orbital angular momentum of the produced charged particle vortex beam is tunable by adjusting the amount of electrical current. The chirality of the produced charged particle vortex beam is switchable by reversing the direction of the electrical current. The generation of the charged particle vortex beam from the present invention does not depend on the energy of the charged particle beams. The generation of the charged particle vortex beams from the present invention is predictable and reproducible.

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