Abstract:
Systems, methods and mediums with instructions for viewing medical data are provided. A system for viewing medical data can include a computer processor, a database and a user interface. The database can include numerous entries from numerous clinical modalities. Each entry can include image data and/or non-image data. Each entry can include annotated medical information from a previous study. The annotated medical information can include comments and markings. The database can be searchable to identify an entry based on input medical information relating to a current study. The user interface can be configured to simultaneously display annotated medical information from an identified entry and medical information from the current study. The system can further include a second user interface configured to display medical information, allow a user to annotate the medical information, and allow the user to save the annotated medical information as an entry in the database.
Abstract:
A top semiconductor layer is formed with two different thicknesses such that a step is formed underneath a body region of a semiconductor-on-insulator (SOI) field effect transistor at the interface between a top semiconductor layer and an underlying buried insulator layer. The interface and the accompanying interfacial defects in the body region provide recombination centers, which increase the recombination rate between the holes and electrons in the body region. Optionally, a spacer portion, comprising a material that functions as recombination centers, is formed on sidewalls of the step to provide an enhanced recombination rate between holes and electrons in the body region, which increases the bipolar breakdown voltage of a SOI field effect transistor.
Abstract:
The present invention provides appropriately substituted chalcones, such as, for example, represented by the structural formula as shown herein below Wherein R1, R2 and R3 are selected from the group consisting of H, OH, O-alkyl, O-phenyl and O-substituted phenyl; B represents Ar—Z—O or RO; where Z is an alkane having up to 5 carbon atoms; R is substituted propanol amino, wherein substituted amino groups are selected from the group consisting of t-butyl, n-butyl, i-butyl, i-propyl, 4-phenyl piperazine-1-yl, 4-(2-methoxyphenyl)-piperazin-1-yl and 3,4-dimethoxy phenethyl; and Ar is thiazolidine-dione methylene phenoxy. The compounds prepared have been demonstrated to exhibit significant antidiabetic effect in various animal models indicating potential for further exploitation.
Abstract:
A system and method are provided for correction of parameters used in determination of stator turn faults of an induction motor. An embodiment may include determining a residual impedance and/or a residual voltage of the motor, and correcting a normalized cross-coupled impedance based on the residual impedance and residual voltage. Additional embodiments may include measuring an operating temperature of the motor and determining a negative sequence impedance of the motor based on the temperature. Another embodiment may include measuring voltages and currents of the motor and determining phasors for the voltages and currents using compensation for variations from a nominal frequency of the motor.
Abstract:
Techniques for combining transistors having different threshold voltage requirements from one another are provided. In one aspect, a semiconductor device comprises a substrate having a first and a second nFET region, and a first and a second pFET region; a logic nFET on the substrate over the first nFET region; a logic pFET on the substrate over the first pFET region; a SRAM nFET on the substrate over the second nFET region; and a SRAM pFET on the substrate over the second pFET region, each comprising a gate stack having a metal layer over a high-K layer. The logic nFET gate stack further comprises a capping layer separating the metal layer from the high-K layer, wherein the capping layer is further configured to shift a threshold voltage of the logic nFET relative to a threshold voltage of one or more of the logic pFET, SRAM nFET and SRAM pFET.
Abstract:
A short-term content buffer maintains segments of audio and/or video content and the content segments are identified with segment identifiers which enables management and playback of the content segments. In an embodiment, independent video content segments corresponding to a particular broadcast channel can be identified by associated content segment identifiers and the video content segments can be recorded together to generate a single recording of the content.
Abstract:
A light-assisted sensor and method of light-assisted sensing of gaseous species involves contacting a gaseous medium with a material selected to adsorb on its surface one or more gaseous species of interest and illuminating the surface of the material from a source to induce a change of an electrical property, such as conductivity, of the material in the presence of the one or more gaseous species. The change in the electrical property of the material is measured and can be used to identify and quantify the gaseous species of interest in the gaseous medium.
Abstract:
The illustrative embodiments provide a socket, a method for manufacturing the socket, a device, and a method for compensating for differing coefficients of thermal expansion between a socket and a printed circuit board. The socket includes surface mounted contacts and an elongated housing. The elongated housing comprises at least two members that are coupled together and disposed to form an aperture in between the at least two members, wherein the surface mounted contacts extend from the aperture, and wherein at least one dimension of the at least two members is selected to compensate for a difference between the coefficients of thermal expansion between the socket and a printed circuit board.
Abstract:
A semiconductor structure that includes at least one logic device region and at least one static random access memory (SRAM) device region wherein each device region includes a double gated field effect transistor (FET) wherein the back gate of each of the FET devices is doped to a specific level so as to improve the performance of the FET devices within the different device regions is provided. In particular, the back gate within the SRAM device region is more heavily doped than the back gate within the logic device region. In order to control short channel effects, the FET device within the logic device region includes a doped channel, while the FET device within the SRAM device region does not. A none uniform lateral doping profile with a low net doping beneath the source/drain regions and a high net doping underneath the channel would provide additional SCE control for the logic device.
Abstract:
A process for fabricating an MOS device specifically a DRAM device, featuring passivation of defects in regions of a semiconductor substrate wherein defects left unpassivated can deleteriously influence data retention time, has been developed. A high density plasma dry etching procedure used to define the DRAM conductive gate electrode can create unwanted defects in a region near the surface of uncovered portions of the semiconductor substrate during the high density plasma procedure over etch cycle. Implantation of a group V element such as arsenic can be used to passivate the unwanted plasma etch defects, thus reducing the risk of defect related device leakage phenomena. However to insure the group V implanted species remain at or near the semiconductor surface for optimum defect passivation, the group V element implantation procedure is performed after all high temperature DRAM fabrication steps, such as selective oxidation for creation of oxide spacers on the sides of the conductive gate electrode, have been completed. A slow diffusing implanted arsenic ion is the optimum candidate for passivation while faster diffusing group V elements such as phosphorous are not as attractive for defect passivation.