公开(公告)号：US07267842B2

公开(公告)日：2007-09-11

申请号：US10800880

申请日：2004-03-15

Applicant: Dingjun Wu ,  Bing Ji ,  Philip Bruce Henderson ,  Eugene Joseph Karwacki, Jr.

Inventor： Dingjun Wu ,  Bing Ji ,  Philip Bruce Henderson ,  Eugene Joseph Karwacki, Jr.

IPC: C23C16/00 ,  H05H1/24

CPC classification number: C23C16/405 ,  C23C14/083 ,  C23C14/564 ,  C23C16/4405

Abstract: A process for the selective removal of a TiO2-containing substance from an article for cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a TiO2-containing substance from an article comprising: providing the article having the TiO2-containing substance deposited thereupon; reacting the substance with a reactive gas comprising at least one selected from a fluorine-containing cleaning agent, a chlorine-containing cleaning agent and mixtures thereof to form a volatile product; and removing the volatile product from the article to thereby remove the substance from the article.

Abstract translation: 本文公开了用于从用于清洁应用的制品中选择性除去含TiO 2的物质的方法。 在一个实施方案中，提供了从制品中除去含TiO 2的物质的方法，包括：提供其上沉积有含TiO 2的物质的制品; 使物质与包含选自含氟清洗剂，含氯清洗剂及其混合物中的至少一种的反应性气体反应以形成挥发性产物; 并从制品中除去挥发性产物，从而从制品中除去物质。

公开(公告)号：US07055263B2

公开(公告)日：2006-06-06

申请号：US10721719

申请日：2003-11-25

Applicant: Dingjun Wu ,  Bing Ji ,  Stephen Andrew Motika ,  Eugene Joseph Karwacki, Jr.

Inventor： Dingjun Wu ,  Bing Ji ,  Stephen Andrew Motika ,  Eugene Joseph Karwacki, Jr.

IPC: F26B3/34

CPC classification number: C23C16/4405

Abstract: A method for dry etching and chamber cleaning high dielectric constant materials is disclosed herein. In one aspect of the present invention, there is provided a process for cleaning a substance comprising a dielectric constant greater than the dielectric constant of silicon dioxide from at least a portion of a surface of a reactor comprising: introducing a first gas mixture comprising a boron-containing reactive agent into the reactor wherein the first gas mixture reacts with the substance contained therein to provide a volatile product and a boron-containing by-product; introducing a second gas mixture comprising a fluorine-containing reactive agent into the reactor wherein the second gas mixture reacts with the boron-containing by-product contained therein to form the volatile product; and removing the volatile product from the reactor.

Abstract translation: 本文公开了一种用于干蚀刻和室清洁的高介电常数材料的方法。 在本发明的一个方面，提供了一种清洁物质的方法，该方法包括介电常数大于来自反应器表面的至少一部分的二氧化硅的介电常数，包括：引入包含硼的第一气体混合物 其中第一气体混合物与其中所含的物质反应以提供挥发性产物和含硼副产物; 将包含含氟反应剂的第二气体混合物引入反应器中，其中第二气体混合物与其中所含的含硼副产物反应形成挥发性产物; 并从反应器中除去挥发性产物。

公开(公告)号：US20050120877A1

公开(公告)日：2005-06-09

申请号：US10730506

申请日：2003-12-08

Applicant: Dingjun Wu ,  Timothy Christopher Golden ,  Chun Christine Dong ,  Paula Jean Battavio

Inventor： Dingjun Wu ,  Timothy Christopher Golden ,  Chun Christine Dong ,  Paula Jean Battavio

IPC: B01D53/26 ,  B01D53/02 ,  B01J20/00 ,  B01J20/02 ,  B01J20/04 ,  B01J20/06 ,  B01J20/18 ,  B01J20/28 ,  B01J20/30 ,  B01J20/32 ,  C01B3/56 ,  C01B6/34 ,  C01B21/04 ,  C01B23/00 ,  C01B25/06 ,  C01B33/04 ,  C01C1/02

CPC classification number: B01J20/041 ,  B01D53/02 ,  B01J20/06 ,  B01J20/08 ,  B01J20/103 ,  B01J20/18 ,  B01J20/20 ,  B01J20/28057 ,  B01J20/3204 ,  B01J20/3236 ,  B01J20/3289 ,  B01J2220/42 ,  C01B3/56 ,  C01B6/34 ,  C01B21/0455 ,  C01B23/0057 ,  C01B25/06 ,  C01B33/046 ,  C01B2203/042 ,  C01B2203/0465 ,  C01B2203/0475 ,  C01B2203/0495 ,  C01B2210/0042 ,  C01B2210/0045 ,  C01B2210/0051 ,  C01B2210/0062 ,  C01C1/024 ,  Y10S95/90 ,  Y10S95/901

Abstract: Purification material for removing a contaminant from an impure hydride gas comprising an adsorbent comprising a reduced metal oxide on a porous support and a desiccant. The porous support may be selected from the group consisting of activated carbon, alumina, silica, zeolite, silica alumina, titania, zirconia, and combinations thereof. The reduced metal oxide may comprise one or more metals selected from the group consisting of Group I alkali metals (lithium, sodium, potassium, rubidium, and cesium), Group II alkaline earth metals (magnesium, calcium, strontium, and barium), and transition metals (manganese, nickel, zinc, iron, molybdenum, tungsten, titanium, vanadium, cobalt, and rhodium). The desiccant may be selected from the group consisting of hygroscopic metal salts, zeolites, single metal oxides, mixed metal oxides, and combinations thereof.

Abstract translation: 用于从不纯的氢化物气体中除去污染物的净化材料，其包含在多孔载体上的还原金属氧化物的吸附剂和干燥剂。 多孔载体可以选自活性炭，氧化铝，二氧化硅，沸石，二氧化硅氧化铝，二氧化钛，氧化锆及其组合。 还原的金属氧化物可以包含一种或多种选自第I族碱金属（锂，钠，钾，铷和铯），II族碱土金属（镁，钙，锶和钡）的金属和 过渡金属（锰，镍，锌，铁，钼，钨，钛，钒，钴和铑）。 干燥剂可以选自吸湿金属盐，沸石，单金属氧化物，混合金属氧化物及其组合。