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232 条记录 (耗时 0.033 秒)

    Method for producing NO/N2 gaseous mixtures intended for the medical field
    4.
    发明授权
    Method for producing NO/N2 gaseous mixtures intended for the medical field 有权
    生产用于医疗领域的NO / N2气体混合物的方法

    公开(公告)号：US09526744B2

    公开(公告)日：2016-12-27

    申请号：US14302282

    申请日：2014-06-11

    申请人： Air Liquide Santé (International)

    发明人： Pierre De Villemeur ,  Laurent Lecourt

    IPC分类号： A61K33/00 ,  C01B21/24 ,  C01B21/04 ,  A61M16/12

    CPC分类号： A61K33/00 ,  A61M16/107 ,  A61M16/12 ,  A61M2202/0266 ,  A61M2202/0275 ,  A61M2202/0283 ,  A61M2207/00 ,  C01B21/0422 ,  C01B21/0433 ,  C01B21/045 ,  C01B21/24 ,  C01B2210/0006 ,  C01B2210/001 ,  C01B2210/0045 ,  C01B2210/0062

    摘要： The invention relates to a method for producing an NO/N2 gaseous mixture, comprising the steps of effecting a purification of impure gaseous nitrogen containing impurities at least of the O2 type by putting the impure nitrogen in contact with a catalyst and then with a molecular sieve; mixing the pure nitrogen obtained with nitric oxide (NO), and obtaining a mixture formed from NO and pure nitrogen containing an NO content of less than 20% by volume and a proportion of impurities of the O2 type of less than 5 ppmv and of the H2O type of less than 40 ppmv. The NO/nitrogen mixture may undergo supplementary dilutions with pure nitrogen. Such NO/nitrogen mixtures can be used for treating, by inhalation, pulmonary vasoconstrictions in adults or children, in particular in new-born babies suffering from primitive pulmonary hypertension or in patients undergoing heart surgery.

    摘要翻译： 本发明涉及一种生产NO / N2气体混合物的方法，包括以下步骤：通过将不纯氮与催化剂接触，然后用分子筛来净化至少含有O 2型杂质的不纯气态氮 ; 将得到的纯氮与一氧化氮（NO）混合，得到由NO和NO含量低于20体积％，O 2类型的杂质的比例小于5ppmv的纯氮和 H2O类型小于40 ppmv。 NO /氮混合物可以用纯氮进行补充稀释。 这种NO /氮混合物可用于通过吸入治疗成人或儿童的肺血管收缩，特别是在患有原始肺动脉高压的新生婴儿或患有心脏手术的患者中。

    Thin film depositing method
    7.
    发明授权
    Thin film depositing method 有权
    薄膜沉积法

    公开(公告)号：US08597732B2

    公开(公告)日：2013-12-03

    申请号：US12531260

    申请日：2008-03-14

    申请人： Naoki Shirakawa ,  Yoshiyuki Yoshida ,  Kazuhiko Endo ,  Tetsuya Mino

    发明人： Naoki Shirakawa ,  Yoshiyuki Yoshida ,  Kazuhiko Endo ,  Tetsuya Mino

    IPC分类号： C23C16/06

    CPC分类号： C01B23/0036 ,  B01D53/32 ,  B01D2257/104 ,  C01B21/0433 ,  C01B2210/0031 ,  C01B2210/0034 ,  C01B2210/0045 ,  C01B2210/0062 ,  C23C14/165 ,  C23C14/564 ,  C23C14/5853 ,  C23C16/18 ,  C23C16/4402 ,  C23C16/56

    摘要： A method comprising: supplying a gas whose water concentration has been controlled to become smaller than 1 PPB, whose oxygen partial pressure has been controlled to become lower than 10−21 atm by a water/oxygen molecule discharging apparatus into the interior of a reaction chamber and carrying out a dehydration/deoxidation process in the interior of said reaction chamber so as to control water vapor partial pressure to become lower than 10−10 atm; depositing a metal film on a substrate by supplying a carrier gas or a plasma excitation gas whose water concentration has been controlled to become smaller than 1 PPB, whose oxygen partial pressure has been controlled to become lower than 10−21 atm into the interior of said reaction chamber; forming an insulating film on the wafer by oxidizing the metal film in a low-oxygen atmosphere whose oxygen partial pressure has been controlled to become lower than 10−20 atm.

    摘要翻译： 一种方法，包括：通过水/氧分子排放装置将其浓度被控制成小于1PPB的气体，其氧分压被控制为低于10-21atm，进入反应室内 并在所述反应室的内部进行脱水/脱氧处理，以控制水蒸气分压变得低于10-10atm; 通过将其水浓度被控制为小于1PPB的载气或等离子体激发气体，将其氧分压降低到10-21atm以下，将氧化金属膜沉积在基板上，进入所述 反应室; 在氧分压低于10-20atm的低氧气氛中氧化金属膜，在晶片上形成绝缘膜。

    Use of impure inert gases in the controlled heating and cooling of mixed conducting metal oxide materials
    9.
    发明授权
    Use of impure inert gases in the controlled heating and cooling of mixed conducting metal oxide materials 有权
    在混合导电金属氧化物材料的受控加热和冷却中使用不纯的惰性气体

    公开(公告)号：US08246719B2

    公开(公告)日：2012-08-21

    申请号：US12567167

    申请日：2009-09-25

    申请人： Michael Francis Carolan ,  John Charles Bernhart

    发明人： Michael Francis Carolan ,  John Charles Bernhart

    IPC分类号： B01D53/22

    CPC分类号： B01D71/024 ,  B01D53/228 ,  B01D67/0093 ,  C01B13/0255 ,  C01B2210/0046 ,  C01B2210/005 ,  C01B2210/0051 ,  C01B2210/0062 ,  C01B2210/0075

    摘要： Method for processing an article comprising mixed conducting metal oxide material. The method comprises contacting the article with an oxygen-containing gas and either reducing the temperature of the oxygen-containing gas during a cooling period or increasing the temperature of the oxygen-containing gas during a heating period; during the cooling period, reducing the oxygen activity in the oxygen-containing gas during at least a portion of the cooling period and increasing the rate at which the temperature of the oxygen-containing gas is reduced during at least a portion of the cooling period; and during the heating period, increasing the oxygen activity in the oxygen-containing gas during at least a portion of the heating period and decreasing the rate at which the temperature of the oxygen-containing gas is increased during at least a portion of the heating period.

    摘要翻译： 用于加工包含混合导电金属氧化物材料的制品的方法。 该方法包括使制品与含氧气体接触，并且在冷却期间降低含氧气体的温度或在加热期间增加含氧气体的温度; 在冷却期间，在冷却期间的至少一部分期间降低含氧气体中的氧活度，并且在冷却期间的至少一部分期间提高含氧气体的温度降低的速度; 并且在加热期间，在加热期间的至少一部分期间增加含氧气体中的氧活性，并且在加热期间的至少一部分期间降低含氧气体的温度升高的速率 。