公开(公告)号：US20080291464A1

公开(公告)日：2008-11-27

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/14

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US06842248B1

公开(公告)日：2005-01-11

申请号：US09724146

申请日：2000-11-28

申请人： Mike Binnard ,  Masahiko Okumura

发明人： Mike Binnard ,  Masahiko Okumura

IPC分类号： G01B11/00 ,  G01B11/02 ,  G03B27/38 ,  G03B27/42 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/66 ,  H01L21/68

CPC分类号： G03F7/70775

摘要： A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a device table (48), a stage mover assembly (16), a measurement system (20), and a control system (22). The stage mover assembly (16) moves the device table (48) along an X axis, along a Y axis, and about a Z axis relative to the stage base (12). The measurement system (20) includes a first X mirror (25A) for monitoring the position of the device table (48) in an alignment position (31A) and a second X mirror (25B) for monitoring the position of the device table (48) in an operational position (31B). In one embodiment, the stage assembly (10) includes a first fiducial mark (76) and a second fiducial mark (78) that are secured to the device table (48) to determine the relative position of the X mirrors (25A)(25B). Alternately, in another embodiment, the stage assembly additionally includes a third fiducial mark (80) secured to the device table (48) for determining the relative positions of the X mirrors (25A)(25B). In both embodiments, the control system (22) utilizes the measured position of the fiducial marks relative to the first X mirror (25A) and the second X mirror (25B) to determine the position of the first X mirror (25A) relative to the second X mirror (25B). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).

摘要翻译： 本文提供了用于移动和定位装置（26）的平台组件（10）。 舞台组件（10）包括舞台基座（12），装置台（48），舞台动子组件（16），测量系统（20）和控制系统（22）。 平台移动器组件（16）沿着Y轴沿X轴移动设备台（48），并且相对于台架（12）绕Z轴移动。 测量系统（20）包括用于监视设备台（48）处于对准位置（31A）的位置的第一X镜（25A）和用于监视设备台（48）的位置的第二X镜（25B） ）处于操作位置（31B）。 在一个实施例中，台架组件（10）包括固定到设备台（48）上以确定X反射镜（25A）（25B）的相对位置的第一基准标记（76）和第二基准标记（78） ）。 或者，在另一实施例中，台组件还包括固定到设备台（48）的第三基准标记（80），用于确定X反射镜（25A）（25B）的相对位置。 在两个实施例中，控制系统（22）利用相对于第一X镜（25A）和第二X镜（25B）的基准标记的测量位置来确定第一X镜（25A）相对于 第二台X镜（25B）。 这些特征允许通过平台组件（10）更准确地定位设备（26）并且使台架组件（10）具有更好的性能。

公开(公告)号：US06400445B2

公开(公告)日：2002-06-04

申请号：US09801792

申请日：2001-03-09

申请人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

发明人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7046

摘要： A method and apparatus for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lit, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.

摘要翻译： 一种用于在用于光刻工艺的投影曝光装置中相对于掩模版定位晶片的方法和装置，其能够对晶片进行高速搜索对准，而不会对晶片上的搜索标记的布置施加任何限制。 对于一个点亮的第一个晶片，使用第一对准传感器系统来检测第一和第二搜索标记的位置，并且基于检测结果来定义参考搜索标记的位置的坐标系。 然后，当第一对准传感器系统检测到第一搜索标记时，通过第二对准传感器系统检测街道的位置并存储。 对于批次中的任何第二和稍后的晶片，当第一对准传感器系统检测到第一搜索标记时，由第二对准传感器系统检测街道的位置，并且检测到的位置与 存储的位置用于定义参考搜索标记的坐标系。

公开(公告)号：US06225012B1

公开(公告)日：2001-05-01

申请号：US09500244

申请日：2000-02-08

申请人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

发明人： Kenji Nishi ,  Yoshiki Kida ,  Masahiko Okumura

IPC分类号： G03F900

CPC分类号： G03F7/70691 ,  G03F9/7011 ,  G03F9/7046

摘要： A method for positioning a wafer with respect to a reticle in a projection exposure apparatus for a photolithographic process capable of high speed search alignment of a wafer without any limitation imposed on the arrangement of the search marks on the wafer. For the first wafer in one lot, a first alignment sensor system is used to detect the positions of first and second search marks, and define a coordinate system with reference to the positions of the search marks based on the detection results. Then, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by a second alignment sensor system and stored. For any of the second and later wafers in the lot, while the first search mark is detected by the first alignment sensor system, the position of a street-line is detected by the second alignment sensor system, and the offsets between the detected position and the stored position are used to define a coordinate system which refers to the search marks.

摘要翻译： 一种用于在用于光刻工艺的投影曝光装置中相对于掩模版定位晶片的方法，该方法能够对晶片进行高速搜索对准，而不会对晶片上的搜索标记的布置施加任何限制。 对于一批中的第一个晶片，使用第一对准传感器系统来检测第一和第二搜索标记的位置，并且基于检测结果来定义参考搜索标记的位置的坐标系。 然后，当第一对准传感器系统检测到第一搜索标记时，通过第二对准传感器系统检测街道的位置并存储。 对于批次中的任何第二和稍后的晶片，当第一对准传感器系统检测到第一搜索标记时，由第二对准传感器系统检测街道的位置，并且检测到的位置与 存储的位置用于定义参考搜索标记的坐标系。

公开(公告)号：US5654553A

公开(公告)日：1997-08-05

申请号：US630852

申请日：1996-04-11

申请人： Masaharu Kawakubo ,  Masahiko Okumura

发明人： Masaharu Kawakubo ,  Masahiko Okumura

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01N21/86 ,  G11B7/00 ,  G11B11/03 ,  G03B27/53

CPC分类号： G03F7/70066 ,  G03F7/70241 ,  G03F9/70

摘要： A projection exposure apparatus according to the present invention comprises a projection optical system for projecting a pattern of a mask onto each of exposure areas on a photosensitive substrate, and a mark detection system of off-axis type spaced apart from the projection optical system by a predetermined distance. According to one aspect of the present invention, the projection exposure apparatus includes a calculating means for determining an offset amount of an imaging position of the projection optical system and an offset amount of a best focus position of the mark detection system of off-axis type on the basis of the amount of change of an environmental condition to which the projection optical system and the mark detection system are subjected. The detection of a positioning mark on the substrate is performed after a surface of the substrate at a position of the mark detection system is aligned with the best focus position, in consideration of the offset amounts. According to another aspect of the present invention, the projection exposure apparatus includes an inclination amount measuring means for determining an inclination amount of the surface of the substrate. The detection of the positioning mark on the substrate is performed after the inclination is eliminated or after the surface of the substrate at the position of the mark detection system is aligned with the best focus position in consideration of the inclination amount.

摘要翻译： 根据本发明的投影曝光装置包括：投影光学系统，用于将光敏图案的图案投影到感光基板上的每个曝光区域;以及偏离轴类型的标记检测系统，其与投影光学系统间隔开 预定距离。 根据本发明的一个方面，投影曝光装置包括：计算装置，用于确定投影光学系统的成像位置的偏移量和离轴型的标记检测系统的最佳聚焦位置的偏移量 基于投影光学系统和标记检测系统所经受的环境条件的变化量。 考虑到偏移量，在标记检测系统的位置处的基板的表面与最佳聚焦位置对准之后，执行基板上的定位标记的检测。 根据本发明的另一方面，投影曝光装置包括用于确定基板的表面的倾斜量的倾斜量测量装置。 在消除了倾斜之后或在标记检测系统的位置处的基板的表面考虑到倾斜量与最佳聚焦位置对准之后，执行基板上的定位标记的检测。

公开(公告)号：US08654306B2

公开(公告)日：2014-02-18

申请号：US12385506

申请日：2009-04-09

申请人： Kenichi Shiraishi ,  Yosuke Shirata ,  Masahiko Okumura

发明人： Kenichi Shiraishi ,  Yosuke Shirata ,  Masahiko Okumura

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70925

摘要： An exposure apparatus exposes a substrate with exposure light that passes through an exposure liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a first supply port, which supplies the exposure liquid; a liquid immersion member, which is capable of forming an immersion space so that an optical path of the exposure light that emerges from the optical member is filled with the exposure liquid; a second supply port, which supplies a cleaning liquid so that it contacts the liquid immersion member; and a preventive apparatus, which prevents the cleaning liquid and the optical member from contacting one another.

摘要翻译： 曝光装置通过曝光液体的曝光光使基板曝光。 曝光装置包括：光学构件，其具有从曝光光出射的出射表面; 供给曝光液的第一供给口; 液浸部件，其能够形成浸没空间，使得从光学部件露出的曝光光的光路填充有曝光液体; 第二供给口，其供给清洗液使其与液浸部件接触; 以及防止清洗液和光学构件相互接触的防止装置。

公开(公告)号：US08040489B2

公开(公告)日：2011-10-18

申请号：US11666165

申请日：2005-10-25

申请人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

发明人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

IPC分类号： G03B27/52

CPC分类号： G03F7/2041 ,  G03F7/38 ,  G03F7/70341 ,  G03F7/70925

摘要： A substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.

摘要翻译： 一种基板处理方法，其包括曝光步骤，其中在基板上形成第一液体的浸渍区域，并且通过经由第一液体的曝光光照射基板而暴露基板;以及浸渍步骤，其中将基板浸入 第二液体在曝光步骤之前。 通过这种方法，可以减少始终涉及浸渍曝光的附着标记引起的问题的发生。

公开(公告)号：US07876452B2

公开(公告)日：2011-01-25

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/02

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US20090316120A1

公开(公告)日：2009-12-24

申请号：US12385506

申请日：2009-04-09

申请人： Kenichi Shiraishi ,  Yosuke Shirata ,  Masahiko Okumura

发明人： Kenichi Shiraishi ,  Yosuke Shirata ,  Masahiko Okumura

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70925

摘要： An exposure apparatus exposes a substrate with exposure light that passes through an exposure liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a first supply port, which supplies the exposure liquid; a liquid immersion member, which is capable of forming an immersion space so that an optical path of the exposure light that emerges from the optical member is filled with the exposure liquid; a second supply port, which supplies a cleaning liquid so that it contacts the liquid immersion member; and a preventive apparatus, which prevents the cleaning liquid and the optical member from contacting one another.

摘要翻译： 曝光装置通过曝光液体的曝光光使基板曝光。 曝光装置包括：光学构件，其具有从曝光光出射的出射表面; 供给曝光液的第一供给口; 液浸部件，其能够形成浸没空间，使得从光学部件露出的曝光光的光路被曝光液体填充; 第二供给口，其供给清洗液使其与液浸部件接触; 以及防止清洗液和光学构件相互接触的防止装置。

公开(公告)号：US20090056615A1

公开(公告)日：2009-03-05

申请号：US11896233

申请日：2007-08-30

申请人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

发明人： Junji Yamauchi ,  Yasuhito Hanaki ,  Kuniharu Iwamoto ,  Toshiaki Matsuno ,  Masahiko Okumura ,  Henry J. Kelm

IPC分类号： G01P3/00

CPC分类号： G01L19/08 ,  G01F22/02 ,  G01F23/161

摘要： An indicator includes a case mountable in a gas filling passage of a pressure container; a valve element which is urged toward one side of the case connectable to the pressure container, the valve element being movable in the case to a position balanced with gas pressure in the pressure container; an O-ring serving as a seal member for ensuring gas tightness between the valve element and the case; and an indicating member slidable relative to the case between a position protruding outside the case and a position not protruding. The O-ring is arranged on the valve element so that the O-ring is in contact with the case to ensure gas tightness when the valve element is in a first balanced position while a gas pressure in the pressure container is e.g. 7 MPa or higher and the O-ring is out of contact with the case not to ensure gas tightness when the valve element is in a second balanced position while the gas pressure is less than e.g. 7 MPa.

摘要翻译： 指示器包括可安装在压力容器的气体填充通道中的壳体; 阀元件，其被推向与壳体连接的壳体的一侧，阀元件可在壳体中移动到与压力容器中的气体压力平衡的位置; 用作密封构件的O形环，用于确保阀元件和壳体之间的气密性; 以及指示构件，其能够相对于所述壳体在突出到所述壳体外部的位置与未突出的位置之间滑动。 O形圈布置在阀元件上，使得O形环与壳体接触以确保当阀元件处于第一平衡位置时的气密性，而压力容器中的气体压力为例如压力容器。 7MPa或更高，并且O形环与壳体不接触，以在阀元件处于第二平衡位置时保持气密性，而气体压力小于例如。 7 MPa。