公开(公告)号：US07876452B2

公开(公告)日：2011-01-25

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/02

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US20080291464A1

公开(公告)日：2008-11-27

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/14

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US5908720A

公开(公告)日：1999-06-01

申请号：US730317

申请日：1996-10-11

申请人： Kiyoshi Uchikawa ,  Masaru Shida ,  Junichi Onodera ,  Hiroshi Komano

发明人： Kiyoshi Uchikawa ,  Masaru Shida ,  Junichi Onodera ,  Hiroshi Komano

IPC分类号： G02F1/1335 ,  G03F7/00 ,  G03F9/00

CPC分类号： G03F7/0007 ,  G02F1/133512

摘要： A photosensitive resin composition for forming light shielding films comprising a mixture of; 10 to 60 parts by weight of a high molecular weight polymeric binder; 15 to 50 parts by weight of a photopolymerizable monomer; 0.1 to 30 parts by weight of a photopolymerization initiator; and at least 20 parts by weight of a light shielding pigment comprising carbon black coated with resin for forming black matrices such as CRT displays and liquid crystal panels; a black matrix made from by said photosensitive resin composition; and a method for producing said black matrix comprising the steps of coating said photosensitive resin composition comprising a high molecular weight polymeric binder, a photopolymerizable monomer, a photopolymerization initiator, and a light shielding pigment consisting of carbon black coated with resin on a substrate, selectively radiating an activated beam, and developing the coating using an alkaline aqueous solution to form a pattern. The blackmatrix maintains high image contrast, and excels in electric insulation.

摘要翻译： 一种用于形成遮光膜的感光性树脂组合物，其包含： 10至60重量份的高分子量聚合物粘合剂; 15〜50重量份的光聚合性单体; 0.1〜30重量份的光聚合引发剂; 和至少20重量份的包含用于形成诸如CRT显示器和液晶面板之类的黑色矩阵的树脂的炭黑的遮光颜料; 由所述感光性树脂组合物制成的黑色基体; 以及制造所述黑色矩阵的方法，包括以下步骤：将包含高分子量聚合物粘合剂，可光聚合单体，光聚合引发剂和由基材上涂覆有树脂的炭黑组成的遮光颜料选择性地包括所述感光性树脂组合物 照射激活的光束，并使用碱性水溶液显影涂层以形成图案。 黑色矩阵保持高的图像对比度，并且在电绝缘性方面表现优异。

公开(公告)号：US5636195A

公开(公告)日：1997-06-03

申请号：US472725

申请日：1995-06-07

申请人： Seishiro Saikan ,  Kiyoshi Uchikawa ,  Hisao Ohsawa

发明人： Seishiro Saikan ,  Kiyoshi Uchikawa ,  Hisao Ohsawa

IPC分类号： G11B7/005 ,  G11B7/125 ,  G11B7/13 ,  G11B7/135 ,  G11B7/00

CPC分类号： G11B7/005 ,  G11B7/127 ,  G11B7/128 ,  G11B7/135 ,  G11B7/13

摘要： The recording method and apparatus according to this invention is an "optical recording method utilizing a simulated photon echo" in which information is recorded by irradiating data a.d record excitation lights at the same time or at different times on the same location of a recording medium, and in which the delay time of a record excitation light electric field and a data light electric field is recorded as the information by use of a common incoherent light split into two equal parts: the data light and the record excitation light. In the reproducing method and apparatus according to this invention, reproducing excitation and probe lights are illuminated on the recording medium and the stimulated photon echo light emitted from the medium by illumination of the reproducing excitation light overlaps the probe light. The "stimulated photon echo" reproducing the information is utilized by converting the synthetic light obtained from the overlap into an electrical signal at a photo detector. A common incoherent light is split into two equal parts, the reproducing excitation and the probe lights, whereby the delay time of the reproducing excitation light electric field and the probe light electric field is set to predetermined values, or a first predetermined value is swept to a second predetermined value.

摘要翻译： 根据本发明的记录方法和装置是“利用模拟光子回波的光学记录方法”，其中通过在记录介质的相同位置上同时或不同时间照射数据广告记录激励光来记录信息， 记录激励光电场和数据光电场的延迟时间被记录为信息，通过使用共同的非相干光分成两部分：数据光和记录激励光。 在根据本发明的再现方法和装置中，在记录介质上照射再现激励和探测光，并且通过照射再现激发光从介质发射的受激光子回波光与探测光重叠。 通过将从重叠获得的合成光转换成光电检测器的电信号来利用再现信息的“受激光子回波”。 共同的非相干光被分成两个相等的部分，再现激励和探测光，由此再现激发光电场和探测光电场的延迟时间被设置为预定值，或者将第一预定值扫描到 第二预定值。

公开(公告)号：US20050236967A1

公开(公告)日：2005-10-27

申请号：US10985941

申请日：2004-11-12

申请人： Yasuaki Sugimoto ,  Kiyoshi Uchikawa

发明人： Yasuaki Sugimoto ,  Kiyoshi Uchikawa

IPC分类号： G03F7/038 ,  G03F7/004 ,  H01J1/62 ,  H01J63/04 ,  H01L27/32 ,  H01L51/00 ,  H01L51/50 ,  H05B33/12 ,  H05B33/14 ,  H05B33/22

CPC分类号： H01L27/3246 ,  H01L27/3283 ,  H01L51/001

摘要： Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used for production of various organic EL displays, and a separator and an EL display device obtained from this resist composition. A composition containing an alkali-soluble resin, an acid generator, a cross-linking agent and a separator pattern shape controlling agent is used as the resist composition for separator formation of an EL display device and the like. The separator pattern shape controlling agent is preferably constituted of a forward taper controlling agent and a reverse taper controlling agent, and these controlling agents can be composed of an amine and an organic acid.

摘要翻译： 提供了一种用于隔膜形成的抗蚀剂组合物，其可用于形成包括前锥形和倒锥形形式的隔板，并且可广泛用于各种有机EL显示器的制造，以及获得的隔膜和EL显示装置 从该抗蚀剂组合物。 使用含有碱溶性树脂，酸产生剂，交联剂和隔片图案形状控制剂的组合物作为EL显示装置等的隔膜形成用抗蚀剂组合物。 隔板图案形状控制剂优选由前锥形控制剂和逆锥形控制剂构成，并且这些控制剂可以由胺和有机酸组成。

公开(公告)号：US5589936A

公开(公告)日：1996-12-31

申请号：US120874

申请日：1993-09-10

申请人： Kiyoshi Uchikawa ,  Takayuki Suga ,  Akira Furusawa

发明人： Kiyoshi Uchikawa ,  Takayuki Suga ,  Akira Furusawa

IPC分类号： G01N21/63 ,  G02B21/00 ,  G01B9/02

CPC分类号： G01N21/636 ,  G02B21/002

摘要： The present invention relates to an optical measuring apparatus for measuring physicochemical properties of specimen, utilizing the optical echo which is a nonlinear optical phenomenon. Light emitted from a laser beam source in the optical measuring apparatus of the present invention is split into two beams, one of which is optically delayed by an optical delay unit and the other of which is phase-modulated at a predetermined frequency by a phase modulator. An optical mixer mixes the two beams outgoing from the optical delay unit and from the phase modulator, and the mixed beam is guided onto a specimen to form a light spot thereon. Light from the specimen is detected by a photodetector, and a modulation component even times larger than the modulation frequency of phase modulator is extracted from the output signal from the photodetector. The physicochemical properties of specimen can be measured by detecting an intensity of optical echo depending upon the optical delay time set by the optical delay unit.

摘要翻译： 本发明涉及利用作为非线性光学现象的光学回波来测量样品的物理化学性质的光学测量装置。 在本发明的光学测量装置中从激光束源发射的光被分成两个光束，其中一个光被光学延迟单元光延迟，另一个被相位调制器以预定的频率进行相位调制 。 光学混合器混合从光学延迟单元和相位调制器输出的两个光束，并将混合光束引导到样本上以在其上形成光斑。 从光检测器检测来自样本的光，并且从光电检测器的输出信号中提取出比相位调制器的调制频率更大的调制分量。 可以通过根据由光学延迟单元设置的光学延迟时间检测光学回波的强度来测量样品的物理化学性质。

公开(公告)号：US08111378B2

公开(公告)日：2012-02-07

申请号：US10588730

申请日：2005-02-10

申请人： Kiyoshi Uchikawa

发明人： Kiyoshi Uchikawa

IPC分类号： G03B27/54 ,  G03B27/68 ,  G03B27/52

CPC分类号： G03F7/70883

摘要： Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection optical system is irradiated with a light beam having a wavelength range different from that of the exposure beam through a space waveguide mechanism, to correct an imaging characteristic of the projection optical system.

摘要翻译： 公开了一种曝光方法，其利用曝光光照射第一物体并且通过第一物体曝光第二物体和投影光学系统，其中第一物体和投影光学系统中的至少一部分为 通过空间波导机构照射具有与曝光光束不同的波长范围的光束，以校正投影光学系统的成像特性。

公开(公告)号：US20080166657A1

公开(公告)日：2008-07-10

申请号：US12073521

申请日：2008-03-06

申请人： Yasuaki Sugimoto ,  Kiyoshi Uchikawa

发明人： Yasuaki Sugimoto ,  Kiyoshi Uchikawa

IPC分类号： G03F7/004

CPC分类号： H01L27/3246 ,  H01L27/3283 ,  H01L51/001

摘要： Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used for production of various organic EL displays, and a separator and an EL display device obtained from this resist composition. A composition containing an alkali-soluble resin, an acid generator, a cross-linking agent and a separator pattern shape controlling agent is used as the resist composition for separator formation of an EL display device and the like. The separator pattern shape controlling agent is preferably constituted of a forward taper controlling agent and a reverse taper controlling agent, and these controlling agents can be composed of an amine and an organic acid.

摘要翻译： 提供了一种用于隔膜形成的抗蚀剂组合物，其可用于形成包括前锥形和倒锥形形式的隔板，并且可广泛用于各种有机EL显示器的制造，以及获得的隔膜和EL显示装置 从该抗蚀剂组合物。 使用含有碱溶性树脂，酸产生剂，交联剂和隔片图案形状控制剂的组合物作为EL显示装置等的隔膜形成用抗蚀剂组合物。 隔板图案形状控制剂优选由前锥形控制剂和逆锥形控制剂构成，并且这些控制剂可以由胺和有机酸组成。

公开(公告)号：US06485870B1

公开(公告)日：2002-11-26

申请号：US09666730

申请日：2000-09-20

申请人： Kiyoshi Uchikawa

发明人： Kiyoshi Uchikawa

IPC分类号： G03F900

CPC分类号： G03F1/20 ,  G03F1/84

摘要： Methods are disclosed for manufacturing masks (reticles) as used in charged-particle-beam (CPB) microlithography. The methods can include inspecting the masks for defects, and repairing the defects. First, a “parent” mask is prepared from circuit-design data. The resulting pattern elements on the parent mask are inspected and compared with the circuit-design data to determine whether the data have been converted accurately into corresponding pattern elements on the parent mask. This inspection can be performed using an optical microscope. Detected mismatches and defects are corrected as required. The parent mask is used as a microlithography mask in the preparation, by “reduction” optical microlithography, a “progeny” mask. The pattern defined by the progeny mask is imaged and the image is digitized for comparison with a digitized image of the parent mask. The digitized images are compared using a computer. Any detected repairable defects are repaired, thereby completing fabrication of the CPB microlithography mask.

摘要翻译： 公开了用于制造在带电粒子束（CPB）微光刻中使用的掩模（掩模版）的方法。 这些方法可以包括检查掩模的缺陷和修复缺陷。 首先，从电路设计数据准备“父”掩码。 检查父屏蔽上产生的图案元素，并与电路设计数据进行比较，以确定数据是否已经精确转换为父掩码上的相应图案元素。 该检查可以使用光学显微镜进行。 根据需要校正检测到的不匹配和缺陷。 母体掩模在制备过程中用作微光刻掩模，通过“还原”光学微光学法，“后代”掩模。 对后代掩模定义的图案进行成像，并将图像数字化以便与母版掩模的数字化图像进行比较。 使用计算机比较数字化图像。 修复任何检测到的可修复缺陷，从而完成CPB微光刻掩模的制造。

公开(公告)号：US5714286A

公开(公告)日：1998-02-03

申请号：US759716

申请日：1996-12-06

申请人： Kiyoshi Uchikawa ,  Masaru Shida ,  Hiroshi Komano

发明人： Kiyoshi Uchikawa ,  Masaru Shida ,  Hiroshi Komano

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/032 ,  G03F7/038 ,  G03F7/40 ,  H01J9/227 ,  H01J11/22 ,  H01J11/34 ,  H01J11/44 ,  H01J17/04 ,  G03F9/00

CPC分类号： H01J9/205 ,  G02F1/133512 ,  G03F7/0047 ,  H01J2211/444

摘要： A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.

摘要翻译： 用于形成遮光膜的感光性树脂组合物在形成用于CRT显示器，液晶面板，等离子体显示器等的显示元件的黑色矩阵中是特别有用的。 感光性树脂组合物由光聚合性化合物，光聚合引发剂和由铜的氧化物和选自铁，锰，铬，钴和镍中的至少一种金属的氧化物或氧化物构成的遮光材料构成。 这样获得的黑色矩阵有利于高耐热性，大大的光屏蔽和清晰的图像对比度以及优异的绝缘电阻。 特别是在等离子体显示器中使用时，通过在给定的基材上涂布感光性树脂组合物，然后将涂层暴露于活性光线的选择性照射以在其中形成图案，并随后燃烧 模式。