Method of preparing a dielectric ceramic composition for producing a
dielectric resonator or filter for microwave applications
    22.
    发明授权
    Method of preparing a dielectric ceramic composition for producing a dielectric resonator or filter for microwave applications 失效
    制备用于微波应用的介电谐振器或滤波器的介电陶瓷组合物的制备方法

    公开(公告)号:US5378663A

    公开(公告)日:1995-01-03

    申请号:US204970

    申请日:1994-03-02

    CPC classification number: C04B35/49 C04B35/465 Y10T29/49002

    Abstract: A dielectric ceramic composition is disclosed which includes: a main ceramic composition of barium oxide and titanium oxide, or barium oxide, titanium oxide and at least one of strontium oxide, calcium oxide, zirconia and zinc oxide, which composition is represented by (1-a-b)BaO.multidot.aSrO.multidot.bCaO.multidot.x[(1-c)TiO.sub.2 .multidot.cZrO.sub.2 ].multidot.yZnO, where 3.1.ltoreq.x .ltoreq.5.4, 0.ltoreq.y.ltoreq.2.9, 0.ltoreq.a+b.ltoreq.0.4, 0.ltoreq.c.ltoreq.0.2; and a secondary component at least a part of which consists of a B.sub.2 O.sub.3 material or a glass material containing B.sub.2 O.sub.3 as one of glass components, the secondary component being added to the main ceramic composition, in an amount of 0.1-7.5 parts by weight of B.sub.2 O.sub.3 per 100 parts by weight of the main ceramic composition. Also disclosed are a method of preparing such a dielectric ceramic composition, a dielectric resonator for microwave application which uses the dielectric ceramic composition, or a dielectric filter having a plurality of such dielectric resonators, and a method of producing the dielectric resonator or dielectric filter.

    Abstract translation: 公开了一种电介质陶瓷组合物,其包括:氧化钡和氧化钛的主要陶瓷组合物,或氧化钡,氧化钛和氧化锶,氧化钙,氧化锆和氧化锌中的至少一种,该组成由(1- ab)BaOxaSrOxbCaOxx [(1-c)TiO 2 x CZrO 2] xyZnO,其中3.1

    Information processing system and method for processing document by
using structured keywords
    23.
    发明授权
    Information processing system and method for processing document by using structured keywords 失效
    信息处理系统和使用结构化关键词处理文档的方法

    公开(公告)号:US5307266A

    公开(公告)日:1994-04-26

    申请号:US741760

    申请日:1991-08-07

    CPC classification number: G06F17/30011

    Abstract: A document processing system for processing documents by using structured keywords comprises an output system and a receiver system. The output system includes a first storage for storing a structured keyword dictionary containing structured keywords among which relations are systematically structured, and linkage unit providing linkage information for establishing correspondences between constituent parts of an input document and corresponding ones of the keywords. The receiver system is coupled to the output system and includes a second storage for storing structured keywords among which relations are systematically structured, and retrieving unit having inputs supplied with the document and the linkage information for retrieving the document to thereby form data of a predetermined edition format by using the structured keyword read out from the second storage. Data transfer between the output system and the receiver systems can be performed either on-line or off-line.

    Abstract translation: 通过使用结构化关键词处理文档的文档处理系统包括输出系统和接收器系统。 输出系统包括:第一存储器,用于存储包含结构化关键字的结构化关键字字典,其中系统地构造关系;以及链接单元,提供用于建立输入文档的组成部分与对应关键字之间的对应关系的链接信息。 接收机系统耦合到输出系统,并且包括用于存储结构化关键字的第二存储器,其中系统地构造关系,以及具有提供有文档的输入的检索单元和用于检索文档的链接信息,从而形成预定版本的数据 通过使用从第二个存储器读出的结构化关键字的格式。 输出系统和接收机系统之间的数据传输可以在线还是离线进行。

    Method of controlling metal thin film formation conditions
    25.
    发明授权
    Method of controlling metal thin film formation conditions 失效
    控制金属薄膜形成条件的方法

    公开(公告)号:US5175115A

    公开(公告)日:1992-12-29

    申请号:US654488

    申请日:1991-02-13

    CPC classification number: H01L21/4846

    Abstract: Measurement of temperature - internal stress characteristics of an Al thin film formed on an Si substrate is performed. The amount of an impurity or impurities mixed in the thin f ilm can be obtained in accordance with the measured characteristics. A migration start temperature of Al atoms in the thin film in the characteristics obtained when the temperature is increased is fed back as information to the thin film formation step, thereby controlling an impurity amount in an atmosphere for forming the thin film.

    Abstract translation: 进行在Si衬底上形成的Al薄膜的温度 - 内部应力特性的测量。 可以根据测量的特性获得混合在薄膜中的杂质或杂质的量。 当温度升高时获得的特性中,薄膜中Al原子的迁移开始温度作为信息反馈到薄膜形成步骤,从而控制用于形成薄膜的气氛中的杂质量。

    Sputtering chamber structure for high-frequency bias sputtering process
    29.
    发明授权
    Sputtering chamber structure for high-frequency bias sputtering process 失效
    用于高频偏压溅射工艺的溅射室结构

    公开(公告)号:US4897172A

    公开(公告)日:1990-01-30

    申请号:US236384

    申请日:1988-08-24

    CPC classification number: C23C14/345 C23C14/564 H01J37/3402

    Abstract: A sputtering chamber structure is used to effect a high-frequency bias sputtering process and includes target and semiconductor electrodes, a metal protection plate formed to surround said target and having a first opening facing the front surface of the target, and a vacuum chamber for receiving the electrodes and the protection plate in a reduced-pressure condition during the high-frequency bias sputtering process. In the sputtering chamber structure, the protection plate further has a second opening which is formed separately from the first opening to decentralize target power in the inner space defined by the protection plate when the high-frequency bias sputtering process is effected such that the first opening is closed by the substrate electrode.

Patent Agency Ranking